Additive deposition system and method

US10434703B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10434703-B2
Application numberUS-201615001452-A
CountryUS
Kind codeB2
Filing dateJan 20, 2016
Priority dateJan 20, 2016
Publication dateOct 8, 2019
Grant dateOct 8, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An additive deposition system and method, the system including generating an aerosol of additive material that is charged and deposited onto a selectively charged substrate. Selectively charging the substrate includes uniformly charging a surface of the substrate, selectively removing charged from the substrate to create charged and neutral regions of the substrate surface. The charged regions of the substrate having a polarity opposite a polarity of the charged aerosol. The charged aerosol of additive material deposited onto the selectively charged portions of the substrate surface due to the potential difference between the charged substrate and charged aerosol. The system and method further including repeating the additive deposition process to create a multi-layer matrix of additive material.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of additive deposition, comprising: generating an aerosol of additive material by an aerosol generation apparatus; electrostatically charging a substrate layer to an electrostatic charge of a first polarity with a substrate charging apparatus; selectively altering the electrostatic charge of the substrate layer surface by depositing ions onto the substrate layer using an ion deposition apparatus external to the substrate; electrostatically charging the generated aerosol of the additive material to a second polarity by an aerosol charging apparatus; selectively depositing the electrostatically charged generated aerosol of the additive material onto the substrate layer surface due to an electrostatic force caused by an electrostatic potential between the electrostatically charged aerosol of the additive material and the selectively electrostatically charge altered substrate surface layer to form a layer of deposited additive material; depositing a support material onto the substrate surface layer around regions of the deposited additive material such that a combination of deposited additive material and the support material form a new substrate layer; and repeating the generating, electrostatically charging the substrate layer, selectively altering, electrostatically charging the generated aerosol, selectively depositing the additive material, and depositing the support material, for each subsequent layer of the additive material to form a solid three-dimensional object of additive material. 2. The additive deposition method of claim 1 , further including smoothing the deposited support material using a doctor blade. 3. The additive deposition method of claim 1 , wherein the aerosol generation apparatus is a filament extension atomizer. 4. The additive deposition method of claim 1 , wherein the ion deposition apparatus is an ionographic print head. 5. The additive deposition method of claim 1 , wherein the substrate charging apparatus is one of a corotron, scorotron or a coronal discharge device. 6. The additive deposition method of claim 1 , further including guiding the charged generated aerosol of additive material nearby a deposition passage positioned proximate the substrate surface layer and including an opening disposed therein to allow the electrostatic force to selectively deposit the charged aerosol of additive material onto the substrate surface layer. 7. The additive deposition method of claim 1 , further including excluding generated aerosol based on a physical parameter including at least one of size and weight. 8. The additive deposition method of claim 7 , further including recycling the excluded generated aerosol. 9. A method of additive deposition, comprising: generating an aerosol of additive material by an aerosol generation apparatus; selectively altering an electrostatic charge of a substrate layer surface by depositing ions using an ion deposition apparatus external to the substrate layer; electrostatically charging the generated aerosol of the additive material to a first polarity by an aerosol charging apparatus; selectively depositing the electrostatically charged generated aerosol of the additive material onto the substrate layer surface due to an electrostatic force caused by an electrostatic potential between the electrostatically charged aerosol of the additive material and the selectively electrostatically charge altered substrate surface layer; depositing a support material onto the substrate surface layer around regions of the selectively deposited additive material; repeating the generating, electrostatically charging the substrate surface layer, selectively altering, electrostatically charging the generated aerosol, selectively depositing the additive material, and depositing the support material, for each subsequent layer of the additive material to form a solid three-dimensional object of additive material; and removing the support material from the additive material when the process of additive deposition is completed.

Assignees

Inventors

Classifications

  • Heads; Nozzles · CPC title

  • Apparatus for additive manufacturing; Details thereof or accessories therefor · CPC title

  • Auxiliary operations or equipment, e.g. for material handling · CPC title

  • Imagewise charging, i.e. laying-down a charge in the configuration of an original image using a modulated stream of charged particles, e.g. of corona ions, modulated by a photoconductive control screen bearing a charge pattern or by optically activated charging means · CPC title

  • having particular electrical or magnetic properties, e.g. piezoelectric · CPC title

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What does patent US10434703B2 cover?
An additive deposition system and method, the system including generating an aerosol of additive material that is charged and deposited onto a selectively charged substrate. Selectively charging the substrate includes uniformly charging a surface of the substrate, selectively removing charged from the substrate to create charged and neutral regions of the substrate surface. The charged regions …
Who is the assignee on this patent?
Palo Alto Res Ct Inc
What technology area does this patent fall under?
Primary CPC classification B33Y10/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 08 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).