Calibration of an RF processing system

US10433376B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10433376-B2
Application numberUS-201414892744-A
CountryUS
Kind codeB2
Filing dateMay 21, 2014
Priority dateMay 21, 2013
Publication dateOct 1, 2019
Grant dateOct 1, 2019

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Apparatuses and methods are provided for processing an object in a cavity. The apparatuses include at least one radio frequency (RF) energy supply component configured to supply RF energy for application to one or more radiating elements configured to emit RF radiation in response to the applied RF energy. In some embodiments, a provided apparatus also includes a memory storing a set of coefficients associated with the RF energy supply component; and a processor configured to receive feedback in response to emission of RF radiation by the one or more radiating elements and control application of RF energy to one or more of the radiating elements based on the feedback and the set of coefficients.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for processing an object in an energy application zone by radio frequency (RF) radiation emitted by one or more radiating elements configured to emit the RF radiation in response to RF energy applied thereto, the apparatus comprising: an RF energy supply component configured to supply RF energy to the one or more radiating elements; an RF energy measuring device configured to detect, measure, or sense RF energy received by the one or more radiating elements from the energy application zone and produce measured response values; a memory storing a set of coefficients associated with the RF energy supply component, said set of coefficients being utilized to transform the measured response values; and a processor configured to receive feedback from the RF energy measuring device in response to emission of RF radiation by the one or more radiating elements and control application of RF energy to the one or more radiating elements based on the feedback and the set of coefficients. 2. The apparatus of claim 1 , wherein the set of coefficients associated with the RF energy supply component includes values of network parameters of the RF energy supply component. 3. The apparatus of claim 1 , wherein the set of coefficients associated with the RF energy supply component includes error correction coefficients configured to correct systematic errors in the functioning of the RF energy supply component. 4. The apparatus of claim 1 , wherein one or more coefficients from the set of coefficients are indicative of an electrical response of the RF energy supply component to an electrical signal. 5. The apparatus of claim 1 , wherein the RF energy supply component includes a dual directional coupler having directivity below 30 dB. 6. The apparatus according to claim 1 , wherein the processor comprises: a first processing unit, configured to receive the feedback, and correct the received feedback based on the set of coefficients; and a second processing unit, configured to control the application of the RF energy based on the corrected feedback. 7. The apparatus according to claim 1 , wherein the processor is configured to: correct the received feedback based on the set of coefficients; and control the application of the RF energy based on the corrected feedback. 8. The apparatus according to claim 1 , wherein the RF energy supply component includes an RF energy source. 9. The apparatus according to claim 1 wherein the RF energy supply component includes an RF energy transmission line. 10. The apparatus according to claim 1 , comprising at least two RF energy supply components and wherein the memory is configured to store at least two sets of coefficients, each set of coefficients being associated with a respective RF energy supply component. 11. The apparatus according to claim 1 , wherein the processor is configured to receive the feedback during a scanning stage and to control the application of the RF energy during a processing stage based on feedback received during the scanning stage. 12. The apparatus according to claim 1 , wherein the processor is configured to receive the feedback during a scanning stage, within which RF radiation is emitted from the one or more radiating elements for determining one or more absorption characteristics of the object without substantially processing the object. 13. The apparatus according to claim 1 , wherein the received feedback includes information for each of a plurality of frequencies of RF radiation emitted from the one or more radiating elements. 14. The apparatus according to claim 1 , wherein the received feedback includes information associated with each of the one or more radiating elements. 15. The apparatus according to claim 1 , wherein the received feedback includes one or more network parameter values depending on a response of the energy application zone to the emission of the RF radiation. 16. The apparatus according to claim 1 , wherein the processor is configured to determine a corrected electrical characteristic of the object based on the received feedback and the set of coefficients stored in the memory. 17. The apparatus according to claim 1 , wherein the set of coefficients comprises at least one coefficient per frequency of the emitted RF radiation. 18. The apparatus according to claim 1 , wherein one or more coefficients of the set of coefficients are indicative of network parameter values of the RF energy supply component that can be determined using a network analyzer. 19. The apparatus according to claim 18 , wherein the network parameter values are indicative of a ratio between a reflected signal voltage and an incident signal voltage in the RF energy supply component. 20. The apparatus according to claim 18 , wherein the network parameter values are indicative of a ratio between a transmitted signal voltage and an incident signal voltage in the RF energy supply component. 21. An apparatus for processing an object in an energy application zone by radio frequency (RF) radiation emitted by one or more radiating elements configured to emit the RF radiation in response to RF energy supplied thereto, the apparatus comprising: an RF energy supply component configured to supply RF energy to the one or more radiating elements; an RF energy measuring arrangement configured to detect, measure, or sense RF energy that is: emitted by the one or more radiating elements to the energy application zone; and received by the one or more radiating elements from the energy application zone; said RF energy measuring arrangement being configured to produce measured response values; a memory storing a set of coefficients associated with the RF energy supply component, said set of coefficients being utilized to transform the measured response values; and a processor configured to receive feedback from the RF energy measuring device in response to emission of RF radiation by the one or more radiating elements and control application of RF energy to the energy application zone by the one or more radiating elements based on the feedback and the set of coefficients. 22. An apparatus for processing an object in an energy application zone by radio frequency (RF) radiation emitted by one or more radiating elements configured to emit the RF radiation in response to RF energy supplied thereto, the apparatus comprising: an RF energy supply component configured to supply RF energy to the one or more radiating elements; a measurement arrangement producing measured response values, said measurement arrangement including a detector configured to detect feedback and a sensor configured to measure feedback related values in the energy application zone; a memory storing a set of coefficients associated with the RF energy supply component, said set of coefficients being utilized to transform the measured response values; and a processor configured to receive the feedback from the detector in response to emission of RF radiation by the one or more radiating elements and control application of RF energy to the one or more radiating elements based on the feedback and the set of coefficients.

Assignees

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Classifications

  • the sensors being infrared detectors · CPC title

  • Radiators or antennas · CPC title

  • the sensors being in contact with the heated product · CPC title

  • Aspects related to the power supply of the microwave heating apparatus · CPC title

  • using microwave tuning · CPC title

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What does patent US10433376B2 cover?
Apparatuses and methods are provided for processing an object in a cavity. The apparatuses include at least one radio frequency (RF) energy supply component configured to supply RF energy for application to one or more radiating elements configured to emit RF radiation in response to the applied RF energy. In some embodiments, a provided apparatus also includes a memory storing a set of coeffic…
Who is the assignee on this patent?
Goji Ltd
What technology area does this patent fall under?
Primary CPC classification H05B6/68. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 01 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).