Graphene electronic device having channel layer including graphene islands and method of fabricating the same
US-10079313-B2 · Sep 18, 2018 · US
US10429308B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10429308-B2 |
| Application number | US-201715815811-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 17, 2017 |
| Priority date | Jul 24, 2017 |
| Publication date | Oct 1, 2019 |
| Grant date | Oct 1, 2019 |
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A carrier for Raman spectroscopy comprising: a substrate having a first metal surface; a plurality of graphene islands disposed on the substrate, wherein parts of the neighboring graphene islands are not connected and thereby form a plurality of gaps between the graphene islands; and a plurality of second metal particles disposed at the gaps between the graphene islands.
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What is claimed is: 1. A carrier for Raman spectroscopy comprising: a substrate having a first metal surface; a plurality of graphene islands disposed on the substrate, wherein parts of the neighboring graphene islands are not connected and thereby form a plurality of gaps between the graphene islands; and a plurality of second metal particles disposed at the gaps between the graphene islands. 2. The carrier according to claim 1 , wherein the graphene islands are graphene nano-islands, and the second metal particles are silver nanoparticles or gold nanoparticles. 3. The carrier according to claim 1 , wherein the carrier is a copper substrate, a nickel substrate, a platinum substrate, a palladium substrate, a ruthenium substrate, an iridium substrate, a cobalt substrate, an alloy substrate, a quartz substrate comprising the first metal surface, a glass substrate comprising the first metal surface, a third metal substrate comprising the first metal surface, a silicon substrate comprising the first metal surface, or a silicon dioxide substrate comprising the first metal surface. 4. The carrier according to claim 1 , wherein the first metal is copper, nickel, platinum, palladium, ruthenium, iridium, or cobalt. 5. The carrier according to claim 1 , wherein the gaps between the graphene islands are in a range of 3 nm to 200 nm. 6. The carrier according to claim 1 , wherein the second metal is gold, silver, or a metal with higher chemical inertness than the first metal. 7. A method of manufacturing a carrier for Raman spectroscopy, comprising steps of: (1-A) providing a substrate having a first metal surface; (1-B) forming a plurality of graphene islands on the substrate, wherein parts of the neighboring graphene islands are not connected and thereby form a plurality of gaps between the graphene islands; and (1-C) forming a plurality of second metal particles at the gaps between the graphene islands. 8. The method according to claim 7 , wherein the graphene islands are graphene nano-islands, and the second metal particles are silver nanoparticles or gold nanoparticles. 9. The method according to claim 7 , wherein the substrate in the step (1-A) is a copper substrate, a nickel substrate, a platinum substrate, a palladium substrate, a ruthenium substrate, an iridium substrate, a cobalt substrate, an alloy substrate, a quartz substrate comprising the first metal surface, a glass substrate comprising the first metal surface, a third metal substrate comprising the first metal surface, a silicon substrate comprising the first metal surface, or a silicon dioxide substrate comprising the first metal surface. 10. The method according to claim 7 , wherein the first metal in the step (1-A) is copper, nickel, platinum, palladium, ruthenium, iridium, or cobalt. 11. The method according to claim 7 , wherein the plurality of graphene islands in the step (1-B) are formed by thermal chemical vapor deposition or microwave plasma enhanced chemical vapor deposition. 12. The method according to claim 11 , wherein the plurality of graphene islands in the step (1-B) are formed by thermal chemical deposition, and precursor gases of the thermal chemical deposition are hydrogen and methane. 13. The method according to claim 12 , wherein a flow rate ratio of hydrogen/methane is 0.5-10:2-20 sccm and the temperature is in a range of 800° C.′-1040° C. in the step (1-B). 14. The method according to claim 13 , wherein the hydrogen reacts with the methane for 30 seconds to 3 minutes in the step (1-B). 15. The method according to claim 7 , wherein the gaps between the graphene islands are in a range of 3 nm to 200 nm. 16. The method according to claim 7 , wherein the second metal in the step (1-C) is gold, silver, or a metal with higher chemical inertness than the first metal. 17. The method according to claim 7 , wherein the second metal particles in the step (1-C) are formed by selective deposition with a solution comprising the second metal. 18. The method according to claim 17 , wherein the solution comprising the second metal in the step (1-C) is a silver nitrate or chloroauric acid solution. 19. The method according to claim 18 , wherein the solution comprising the second metal in the step (1-C) is in a range of 1 mM to 10 mM silver nitrate solution or 0.5 mM to 10 mM chloroauric acid solution. 20. The method according to claim 18 , wherein a reaction time in the step (1-C) is in a range of 10 seconds to 150 seconds. 21. The method according to claim 7 , wherein the step (1-B) further comprises step (2-C) of transferring the graphene islands on to a second substrate having the first metal surface. 22. The method according to claim 21 , the second substrate is plastic, paper, aluminum, glass or wood.
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