Resin composition, resin film, method for producing resin film, method for producing semiconductor device, and semiconductor device

Patent metadata

Field	Value
Publication number	US-10428239-B2
Application number	US-201715477521-A
Country	US
Kind code	B2
Filing date	Apr 3, 2017
Priority date	Apr 27, 2016
Publication date	Oct 1, 2019
Grant date	Oct 1, 2019

Abstract

The present invention provides a resin composition including: (A) a silicone resin containing a constitutional unit shown by the following composition formula (1) and having a weight average molecular weight of 3,000 to 500,000; (B) an epoxy resin-curing agent; and (C) a filler; wherein the mass fraction of the component (C) is 50 to 95% by mass based on the total mass. This can provide a resin composition that can mold a wafer in a lump, has good molding properties particularly to a thin-film wafer having a large diameter, gives low-warping properties, as well as good wafer protection properties, high reliability, and good heat resistance after molding, can perform a molding process favorably, and can be used for wafer level packaging favorably.

First claim

The invention claimed is:

1. A method for producing a resin film comprising:
coating two or more a delamination films with a resin composition to produce two or more resin-formed films each having a resin composition layer on each of the delamination films, and
superimposing the resin composition layers of the two or more resin-formed films with each other; wherein the resin composition comprises:
(A) a silicone resin containing a constitutional unit shown by the following composition formula (1) and having a weight average molecular weight of 3,000 to 500,000,

wherein R 1 to R 4 each independently represent a monovalent hydrocarbon group having 1 to 8 carbon atoms, with the proviso that the both of R 3 and R 4 are not methyl groups at the same time; “m” and “n” are each independently an integer of 0 to 300; the both of “a” and “b” are positive numbers satisfying a+b=1; each of “X” independently represents a divalent linking group shown by the following general formula (2) or a divalent linking group shown by the following general formula (3), with the proviso that part of or all of the “X” in the formula are divalent linking group(s) shown by the following general formula (2), and when the molar number of a unit shown by the following general formula (2) is defined as “c”, and the molar number of a unit shown by the following general formula (3) is defined as “d”, a ratio between the “c” and the “d” is in a range of 0≤d≤1 when the “c” is assumed to be 1;

wherein R 5 represents a hydrogen atom or a methyl group, and “p” is an integer of 0 to 7;

wherein R 6 represents a hydrogen atom or a methyl group, R 7 and R 8 each independently represent a monovalent hydrocarbon group having 1 to 8 carbon atoms, with the proviso that the both of R 7 and R 8 are not methyl groups at the same time, “q” and “r” are each independently an integer of 0 to 300, and “k” is an integer of 0 to 7;
(B) an epoxy resin-curing agent; and (C) a filler;

wherein the mass fraction of the component (C) is 50 to 95% by mass based on the total mass.

2. The method for producing a resin film according to claim 1 , further comprising forming at least one of the resin-formed films having a protective film for protecting the resin composition layer on one of the resin-formed films in such a way that the resin composition layer and the protective film are successively formed on at least one of the delamination films,
wherein the superimposing of the resin composition layers of the resin-formed films is performed such that the protective film or at least one of the delamination films is removed from each of the resin-formed films so as to expose the resin composition layer to be laminated with each other, and the exposed resin composition layers are superimposed with each other.

Assignees

• Shinetsu Chemical Co

Inventors

• Kondo Kazunori
• ICHIOKA Yoichiro

Classifications

• C08G77/42 Primary

  Block-or graft-polymers containing polysiloxane sequences (polymerising aliphatic unsaturated monomers on to a polysiloxane C08F283/12) · CPC title

• C08L83/14

  in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms (C08L83/10 takes precedence) · CPC title

• C08G77/52

  containing aromatic rings · CPC title

• C09D183/14

  in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms (C09D183/10 takes precedence) · CPC title

• H10W74/476

  Organic materials comprising silicon · CPC title