Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator

Patent metadata

Field	Value
Publication number	US-10428015-B2
Application number	US-201615747253-A
Country	US
Kind code	B2
Filing date	Jul 22, 2016
Priority date	Jul 24, 2015
Publication date	Oct 1, 2019
Grant date	Oct 1, 2019

Abstract

The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on.

In the formula, four pieces of R 1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

First claim

The invention claimed is:

1. A compound represented by the general formula (A):

wherein four pieces of R 1 each independently represent a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

2. The compound according to claim 1 , wherein, in the general formula (A), two of the eight groups R 3 to R 10 are each a hydrogen atom, and four to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

3. The compound according to claim 1 , wherein, in the general formula (A), R 3 to R 6 are each an alkyl group having 1 to 6 carbon atoms.

4. The compound according to claim 1 , wherein the compound represented by the general formula (A) is a compound represented by the general formula (C-A1), (C-A2) or (C-A3):

wherein four pieces of R 1 and four pieces of R 2 are as described above,

wherein four pieces of R 1 and four pieces of R 2 are as described above,

wherein four pieces of R 1 and four pieces of R 2 are as described above.

5. The compound according to claim 1 , wherein, in the general formula (A), the four pieces of R 1 are each a hydrogen atom or each a fluorine atom, and the four pieces of R 2 are each a fluorine atom.

6. The compound according to claim 1 , wherein, in the general formula (A), the four pieces of R 1 are each a hydrogen atom, and the four pieces of R 2 are each a trifluoromethyl group.

7. The compound according to claim 1 , wherein the compound represented by the general formula (A) is a compound represented by the formula (1), (2), (3), (4) or (5):

8. A base- and/or radical-generating agent comprising the compound according to claim 1 .

9. The base- and/or radical-generating agent according to claim 8 , wherein the base- and/or radical-generating agent generates a base and/or a radical through irradiation with an active energy ray.

10. A base-generating agent comprising the compound according to claim 1 .

11. The base-generating agent according to claim 10 , wherein the base-generating agent generates a base through irradiation with an active energy ray.

12. A base- and/or radical-curable resin composition comprising the compound according to claim 1 , and a base-curable resin raw material and/or a radical-reactive compound.

13. The composition according to claim 12 , wherein the base-curable resin raw material is a mixture of an epoxy compound and a multivalent carboxylic acid.

14. The composition according to claim 12 , wherein the base-curable resin raw material is a mixture of an epoxy compound and a polythiol.

15. A base-curable resin composition comprising the compound according to claim 1 , and a base-curable resin raw material.

Assignees

• Fujifilm Wako Pure Chemical Corp

Inventors

• YANABA Kosuke
• Sakai Nobuhiko
• Imazeki Shigeaki

Classifications

• C09K3/00

  Materials not provided for elsewhere · CPC title

• C08K5/29

  Compounds containing {one or more} carbon-to-nitrogen double bonds · CPC title

• C08G59/686

  containing nitrogen · CPC title

• C08G59/66

  Mercaptans · CPC title

• C07F9/5463

  Compounds of the type "quasi-phosphonium", e.g. (C)a-P-(Y)b wherein a+b=4, b>=1 and Y=heteroatom, generally N or O · CPC title