Composition for forming a silica based layer, silica based layer, and electronic device

US10427944B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10427944-B2
Application numberUS-201514839642-A
CountryUS
Kind codeB2
Filing dateAug 28, 2015
Priority dateDec 19, 2014
Publication dateOct 1, 2019
Grant dateOct 1, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A composition for forming a silica based layer, the composition including a silicon-containing polymer having polydispersity ranging from about 3.0 to about 30 and a solvent, and having viscosity ranging from about 1.30 centipoise (cps) to about 1.80 cps at 25° C. Also, a silica based layer is formed of the composition, and an electronic device includes the silica based layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A composition for forming a silica based layer, the composition comprising polysilazane having polydispersity ranging from about 7.0 to about 13.6 and a solvent, and having viscosity ranging from about 1.35 centipoise (cps) to about 1.60 cps when measured at a measurement temperature of 25° C. 2. The composition of claim 1 , wherein the polysilazane has a weight average molecular weight of about 4,000 to about 160,000. 3. The composition of claim 1 , wherein the polysilazane has a weight average molecular weight of about 20,000 to about 160,000. 4. The composition of claim 1 , wherein the solvent comprises at least one selected from benzene, toluene, xylene, ethylbenzene, diethylbenzene, trimethylbenzene, triethylbenzene, cyclohexane, cyclohexene, decahydro naphthalene, dipentene, pentane, hexane, heptane, octane, nonane, decane, ethylcyclohexane, methylcyclohexane, cyclohexane, cyclohexene, p-menthane, dipropylether, dibutylether, anisole, butyl acetate, amyl acetate, methylisobutylketone, and a combination thereof. 5. The composition of claim 1 , wherein an amount of the polysilazane is about 0.1 to about 30 wt % based on the total amount of the composition. 6. The composition of claim 1 , wherein the polysilazane comprises hydrogenated polysilazane. 7. A silica based layer manufactured from the composition of claim 1 . 8. An electronic device comprising the silica based layer of claim 7 . 9. A method of manufacturing a silica based layer, the method comprising: coating the composition of claim 1 on a substrate; drying the coated substrate with the composition to produce a resultant; and curing the resultant. 10. The method of claim 9 , wherein the polysilazane has a weight average molecular weight of about 4,000 to about 160,000. 11. The method of claim 9 , wherein the polysilazane has a weight average molecular weight of about 20,000 to about 160,000. 12. The method of claim 9 , wherein the solvent comprises at least one selected from benzene, toluene, xylene, ethylbenzene, diethylbenzene, trimethylbenzene, triethylbenzene, cyclohexane, cyclohexene, decahydro naphthalene, dipentene, pentane, hexane, heptane, octane, nonane, decane, ethylcyclohexane, methylcyclohexane, cyclohexane, cyclohexene, p-menthane, dipropylether, dibutylether, anisole, butyl acetate, amyl acetate, methylisobutylketone, and a combination thereof. 13. The method of claim 9 , wherein an amount of the polysilazane is about 0.1 to about 30 wt % based on the total amount of the composition. 14. The method of claim 9 , wherein the polysilazane comprises hydrogenated polysilazane. 15. An electronic device comprising a silica based layer manufactured according to the method of claim 9 . 16. An electronic device comprising a silica based layer, the silica based layer being a derivative of the composition of claim 1 .

Assignees

Inventors

Classifications

  • the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC · CPC title

  • the compound being a silazane · CPC title

  • Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title

  • Nitrogen atoms · CPC title

  • silicones · CPC title

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Frequently asked questions

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What does patent US10427944B2 cover?
A composition for forming a silica based layer, the composition including a silicon-containing polymer having polydispersity ranging from about 3.0 to about 30 and a solvent, and having viscosity ranging from about 1.30 centipoise (cps) to about 1.80 cps at 25° C. Also, a silica based layer is formed of the composition, and an electronic device includes the silica based layer.
Who is the assignee on this patent?
Samsung Sdi Co Ltd
What technology area does this patent fall under?
Primary CPC classification C01B33/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 01 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).