Method of processing nano- and micro-pores

Patent metadata

Field	Value
Publication number	US-10427936-B2
Application number	US-201816221457-A
Country	US
Kind code	B2
Filing date	Dec 15, 2018
Priority date	Dec 15, 2017
Publication date	Oct 1, 2019
Grant date	Oct 1, 2019

Abstract

A method of processing nano- and micro-pores includes washing a substrate and cleaning a surface of the substrate; spin-coating photoresist, exposing the substrate and developing to form the substrate with a pattern; 3. depositing micro-nano metal particles on the surface of the substrate; wherein the micro-nano metal particles are centered on a magnetic core; and the surface of the magnetic core is plated with a metal nano-particle coating composed of a plurality of gold, silver or aluminum nanoparticles; removing the photoresist, and maintaining dot arrays of the micro-nano metal particles; applying laser irradiation and a strong uniform magnetic field on the substrate, so that the substrate is processed to form processed structures; and after the processed structures being formed into nano-/micro-pores with targeted pore size, shape and depth, stopping the laser irradiation and removing the strong uniform magnetic field.

First claim

What is claimed is:

1. A method of processing nano- or micro-pores, comprising:
step 1: washing a substrate with deionized water, and cleaning a surface of the substrate with a plasma cleaner;
step 2: spin-coating photoresist on the substrate, and then exposing the substrate and developing to form the substrate with a pattern;
step 3: depositing micro-nano metal particles on the surface of the substrate; wherein the micro-nano metal particles are centered on a magnetic core, and a surface of the magnetic core is plated with a metal nano-particle coating composed of a plurality of gold, silver or aluminum nanoparticles;
step 4: removing the photoresist and maintaining dot arrays of the micro-nano metal particles deposited on the surface of the substrate;
step 5: exposing the substrate with surface deposited with the micro-nano metal particles using laser irradiation and applying a strong uniform magnetic field in a reaction chamber; wherein the magnetic core in the micro-nano metal particles guided by the strong uniform magnetic field drives the micro-nano metal particles to directionally move on the substrate, so that the substrate is processed to form processed structures;
step 6: after the processed structures being formed with nano- or micro-pores of target pore size, shape and depth, stopping the laser irradiation and removing the strong uniform magnetic field to obtain a finished product.

2. The method of claim 1 , wherein in step 1, the substrate is a plate material of glass or polyethylene terephthalate (PET).

3. The method of claim 1 , wherein in steps 2 and 3, an area on the surface of the substrate where the micro-nano metal particles are deposited is controlled according to an exposed pattern.

4. The method of claim 1 , wherein the magnetic core is any one of spherical iron particles, iron compound particles, nickel particles, nickel compound particles, cobalt particles and cobalt compound particles having a radius of 50-1000 nm; and the metal nano-particle coating is formed by gold nanoparticles having a diameter of 10-50 nm or composite particles of gold nanorods having a length of 10 to 50 nm and a width of 1-10 nm.

5. The method of claim 1 , wherein in step 5, laser in the laser irradiation has a wavelength of 350-2000 nm; and the strong uniform magnetic field is generated by a permanent magnet or an alternating coil.

6. The method of claim 1 , wherein in step 5, when the processed structures are straight holes, the strong uniform magnetic field applied in the reaction chamber is perpendicular to the surface of the substrate.

7. The method of claim 1 , wherein in step 5, when the processed structures are oblique holes, the strong uniform magnetic field applied in the reaction chamber forms an included angle α with the surface of the substrate; and the included angle α is equal to an angle of the oblique holes.

8. The method of claim 1 , wherein in step 5, when the processed structures are channels with axes parallel to the surface of the substrate, the strong uniform magnetic field applied in the reaction chamber is parallel to the surface of the substrate.

9. The method of claim 1 , wherein in step 5, when the processed structures are bent channels, the strong uniform magnetic field with different directions is alternately applied in the reaction chamber.

10. The method of claim 1 , wherein in step 5, a processing speed for the processed structures is 5-50 nm/min.

Assignees

• Univ Guangdong Technology

Inventors

• Chen Yun
• Chen Xin
• Shi Dachuang
• Gao Jian
• Wang Zhengping
• Yang Haidong

Classifications

• H10P50/642 Primary

  Chemical etching · CPC title

• B81C1/00849

  during manufacture · CPC title

• B81C1/00412

  Mask characterised by its behaviour during the etching process, e.g. soluble masks · CPC title

• B81C1/00373 Primary

  Selective deposition, e.g. printing or microcontact printing · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title