Substrate for surfaced enhanced raman scattering, fabrication method for the same and analyzing method using the same

US10422752B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10422752-B2
Application numberUS-201514947960-A
CountryUS
Kind codeB2
Filing dateNov 20, 2015
Priority dateNov 21, 2014
Publication dateSep 24, 2019
Grant dateSep 24, 2019

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present disclosure relates to a substrate for surface enhanced Raman scattering, a fabricating method for the same and an analyzing method using the same. The present disclosure may provide a substrate for surface enhanced Raman scattering having excellent surface enhanced Raman scattering effects by randomly stacking of Ag nanowires in a simple way by utilizing a substrate having a filtering function, and a method for efficiently analyzing a material to be analyzed using the same.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate for surface enhanced Raman scattering comprising: a filter substrate comprising a plurality of pores; and metal-containing nanowires configured not to pass through the pores but to be stacked on the substrate, wherein the metal-containing nanowires form nanogaps configured to induce surface plasmon resonance with adjacent metal-containing nanowires, wherein each metal-containing nanowire is stacked in irregular directions on the filter substrate to form a plurality of cross points, wherein hot spots at which plasmon resonance occurs are formed near the cross points, wherein a coating material is present on the surface of the metal-containing nanowires and the nanogaps are adjusted using the coating material, and wherein each metal-containing nanowire is stacked in a pre-determined thickness or above, and the pre-determined thickness is determined based on a thickness where increase in the Raman intensity of the substrate for surface enhanced Raman scattering becomes saturated. 2. The substrate for surface enhanced Raman scattering of claim 1 , further comprising: an insulating film formed on the metal-containing nanowires; and metal-containing nanoparticles formed on the insulating film and configured to form nanogaps inducing plasmon resonance by being spaced apart from each other. 3. The substrate for surface enhanced Raman scattering of claim 2 , wherein the nanogaps inducing surface plasmon resonance are formed between the metal-containing nanoparticles and the metal-containing nanowires. 4. The substrate for surface enhanced Raman scattering of claim 1 , wherein the substrate is selected one from the group consisting of glass fiber, alumina, Teflon (polytetrafluoroethylene, PTFE), polycarbonate (PC), cellulose and paper. 5. The substrate for surface enhanced Raman scattering of claim 1 , wherein the metal-containing nanowires is formed on the substrate by filtering a solution including metal-containing nanowires through the substrate to be stacked on the substrate using vacuum filtration. 6. The substrate for surface enhanced Raman scattering of claim 1 , wherein the metal is selected from the group consisting of Ag, Al, Au, Co, Cu, Fe, Li, Ni, Pd, Pt, Rh, Ru and an alloy thereof. 7. The substrate for surface enhanced Raman scattering of claim 1 , wherein the substrate is dried using heat treatment to eliminate materials, except the metal-containing nanowire, remaining on the substrate. 8. The substrate for surface enhanced Raman scattering of claim 1 , wherein a thickness of the metal-containing nanowires to be stacked is adjusted using a concentration of the metal-containing nanowires in the solution and a filtration volume of a solution. 9. The substrate for surface enhanced Raman scattering of claim 5 , wherein a density of the metal-containing nanowires to be stacked is adjusted using a concentration of the metal-containing nanowires in the solution and a filtration volume of the solution. 10. The substrate for surface enhanced Raman scattering of claim 5 , wherein a wavelength of the surface plasmon resonance is adjusted using at least one selected from the group consisting of a material, a diameter, and a length of the metal-containing nanowires. 11. The substrate for surface enhanced Raman scattering of claim 2 , wherein the insulating film is one selected from the group consisting of alumina, metal oxide, metal sulfide, metal halide, silica, zirconium oxide and iron oxide. 12. The substrate for surface enhanced Raman scattering of claim 2 , wherein the insulating film is formed using one selected from the group consisting of vacuum deposition and solution processing. 13. The substrate for surface enhanced Raman scattering of claim 2 , wherein the metal-containing nanoparticles are formed through vacuum deposition with a Raman active material. 14. The substrate for surface enhanced Raman scattering of claim 13 , wherein the vacuum deposition is performed using one selected from the group consisting of sputtering, evaporation and chemical vapor deposition. 15. A Raman scattering apparatus comprising the substrate for surface enhanced Raman scattering of claim 1 . 16. A method for fabricating the substrate for surface enhanced Raman scattering, the method comprising: preparing a filter substrate comprising a plurality of pores; filtering a solution comprising metal-containing nanowires to stack the metal-containing nanowires in irregular directions on the filter substrate to form a plurality of cross points; drying the filter substrate; wherein the metal-containing nanowires do not pass through the pores and form nanogaps configured to induce surface plasmon resonance with adjacent metal-containing nanowires; wherein hot spots at which plasmon resonance occurs are formed near the cross points; wherein a coating material is present on the surface of the metal-containing nanowires and the nanogaps are adjusted using the coating material; and wherein each metal-containing nanowire is stacked in a pre-determined thickness or above, and the pre-determined thickness is determined based on a thickness where increase in the Raman intensity of the substrate for surface enhanced Raman scattering becomes saturated. 17. An analyzing method using a substrate for surface enhanced Raman scattering comprising: preparing a substrate for surface enhanced Raman scattering of claim 1 ; filtrating a material to be analyzed to the substrate; and detecting a Raman signal by light irradiation into the material to be analyzed.

Assignees

Inventors

Classifications

  • Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title

  • Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors · CPC title

  • Nanooptics, e.g. quantum optics or photonic crystals · CPC title

  • G01N21/658Primary

    enhancement Raman, e.g. surface plasmons · CPC title

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What does patent US10422752B2 cover?
The present disclosure relates to a substrate for surface enhanced Raman scattering, a fabricating method for the same and an analyzing method using the same. The present disclosure may provide a substrate for surface enhanced Raman scattering having excellent surface enhanced Raman scattering effects by randomly stacking of Ag nanowires in a simple way by utilizing a substrate having a filteri…
Who is the assignee on this patent?
Korea Inst Mach & Materials
What technology area does this patent fall under?
Primary CPC classification G01N21/658. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 24 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).