Tantalum based alloy that is resistant to aqueous corrosion

US10422025B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10422025-B2
Application numberUS-201815928187-A
CountryUS
Kind codeB2
Filing dateMar 22, 2018
Priority dateApr 27, 2007
Publication dateSep 24, 2019
Grant dateSep 24, 2019

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A tantalum or tantalum alloy which contains pure or substantially pure tantalum and at least one metal element selected from the group consisting of Ru, Rh, Pd, Os, Ir, Pt, Mo, W and Re to form a tantalum alloy that is resistant to aqueous corrosion. The invention also relates to the process of preparing the tantalum alloy.

First claim

Opening claim text (preview).

We claim: 1. A method of producing a tantalum alloy, the method comprising microalloying pure or substantially pure tantalum and one or more metal elements selected from the group consisting of Ru, Pd, and Pt, wherein (i) the microalloying is performed to produce the tantalum alloy via laser additive manufacturing (LAM), vacuum arc remelting (VAR), electron beam melting (EBM), or plasma arc melting (PAM), and (ii) each of the one or more metal elements is present, in the tantalum alloy, in an amount of at most 2,000 ppm. 2. The method of claim 1 , wherein the one or more metal elements is Ru. 3. The method of claim 1 , wherein the one or more metal elements is Pd. 4. The method of claim 1 , wherein the one or more metal elements is Pt. 5. The method of claim 1 , wherein the one or more metal elements are Pt and Pd. 6. The method of claim 1 , wherein the one or more metal elements are Pt and Ru. 7. The method of claim 1 , wherein each of the one or more metal elements is present in an amount of at least 250 ppm in the tantalum alloy. 8. The method of claim 1 , wherein (i) substantially pure tantalum is microalloyed with the one or more metal elements, and (ii) the substantially pure tantalum comprises Ta-3W. 9. The method of claim 1 , wherein the microalloying is performed via laser additive manufacturing (LAM). 10. The method of claim 1 , wherein the microalloying is performed via vacuum arc remelting (VAR). 11. The method of claim 1 , wherein the microalloying is performed via electron beam melting (EBM). 12. The method of claim 1 , wherein the microalloying is performed via plasma arc melting (PAM). 13. The method of claim 1 , wherein, after the microalloying, the tantalum alloy consists essentially of pure tantalum and the one or more metal elements. 14. The method of claim 1 , wherein, after the microalloying, the tantalum alloy consists of pure tantalum and the one or more metal elements. 15. The method of claim 1 , wherein, after the microalloying, the tantalum alloy consists of substantially pure tantalum and the one or more metal elements, the substantially pure tantalum containing no more than 11% by weight of non-tantalum components. 16. The method of claim 1 , further comprising forming one or more plates, sheets, and/or tubes using the tantalum alloy.

Assignees

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Classifications

  • Arc remelting · CPC title

  • with heating by wave energy or particle radiation {(by acoustic waves C22B9/026)} · CPC title

  • Obtaining niobium or tantalum · CPC title

  • C22C27/02Primary

    Alloys based on vanadium, niobium, or tantalum · CPC title

  • Process efficiency · CPC title

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What does patent US10422025B2 cover?
A tantalum or tantalum alloy which contains pure or substantially pure tantalum and at least one metal element selected from the group consisting of Ru, Rh, Pd, Os, Ir, Pt, Mo, W and Re to form a tantalum alloy that is resistant to aqueous corrosion. The invention also relates to the process of preparing the tantalum alloy.
Who is the assignee on this patent?
Aimone Paul R, Hinshaw Evan, Starck H C Inc
What technology area does this patent fall under?
Primary CPC classification C22C27/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 24 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).