Analyte sensors and sensing methods featuring low-potential detection
US-2024402120-A1 · Dec 5, 2024 · US
US10420494B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10420494-B2 |
| Application number | US-201815877682-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 23, 2018 |
| Priority date | Jul 2, 2009 |
| Publication date | Sep 24, 2019 |
| Grant date | Sep 24, 2019 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Devices and methods are provided for continuous measurement of an analyte concentration. The device can include a sensor having a plurality of sensor elements, each having at least one characteristic that is different from other sensor(s) of the device. In some embodiments, the plurality of sensor elements are each tuned to measure a different range of analyte concentration, thereby providing the device with the capability of achieving a substantially consistent level of measurement accuracy across a physiologically relevant range. In other embodiments, the device includes a plurality of sensor elements each tuned to measure during different time periods after insertion or implantation, thereby providing the sensor with the capability to continuously and accurately measure analyte concentrations across a wide range of time periods. For example, a sensor system 180 is provided having a first working electrode 150 comprising a first sensor element 102 and a second working electrode 160 comprising a second sensor element 104, and a reference electrode 108 for providing a reference value for measuring the working electrode potential of the sensor elements 102, 104.
Opening claim text (preview).
What is claimed is: 1. A sensor system for continuous measurement of a glucose concentration in a host, the sensor system comprising: a first continuous glucose sensor configured to measure glucose concentrations over a first time period of in vivo implantation and produce first sensor data, wherein the first sensor is configured to have a run-in time between 0.1 and 6 hours; a second continuous glucose sensor configured to measure glucose concentrations over a second time period of in vivo implantation and produce second sensor data, wherein the second continuous glucose sensor is an optical sensor, wherein the first time period and the second time period are different, wherein the second time period begins after the first time period begins, wherein the first time period and the second time period overlap partially, but not completely; and sensor electronics configured to determine glucose concentration values based on the first sensor data and the second sensor data, wherein the sensor electronics are configured to determine the glucose concentration values by integrating signals from the first sensor data and signals from the second sensor data, wherein the sensor electronics are configured to integrate signals from the first sensor data and signals from the second sensor data by according first weights to signals from the first sensor data and according second weights to signals from the second sensor data, and wherein magnitudes of the first weight and magnitudes of the second weights are dependent on a time period of a sensor session. 2. The sensor system of claim 1 , wherein the first time period corresponds to an initial period of in vivo implantation, wherein the second time period corresponds to a second time period of in vivo implantation, and wherein the second period begins after the initial period of in vivo implantation has begun. 3. The sensor system of claim 2 , wherein the first time period begins before less than 3 hours post-implantation, and wherein the second time period begins after more than 3 hours post-implantation. 4. The sensor system of claim 2 , wherein the first time period begins before less than 6 hours post-implantation, and wherein the second time period begins after more than 6 hours post-implantation. 5. The sensor system of claim 1 , wherein the sensor system is configured for transcutaneous placement through a skin of a host. 6. The sensor system of claim 1 , wherein the sensor system is configured for fluid communication with a vascular system of a host. 7. The sensor system of claim 1 , wherein the first sensor is an optical sensor. 8. The sensor system of claim 1 , wherein the second sensor is an electrochemical sensor.
Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor · CPC title
Using laser · CPC title
Devices involving rotation of the workpiece · CPC title
by exposure to radiation (B05D3/02 takes precedence {; plasma treatment B05D3/141}) · CPC title
performed by dipping · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.