Current-collector metal foil, current collector, and current-collector-metal-foil manufacturing method

US10418636B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10418636-B2
Application numberUS-201515316086-A
CountryUS
Kind codeB2
Filing dateJun 3, 2015
Priority dateJun 6, 2014
Publication dateSep 17, 2019
Grant dateSep 17, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A current-collector metal foil has at least at least one roughened surface and numerous recessed parts are present on the roughened surface. Each recessed part has an edge part that surrounds a bottom-surface part and is raised above the bottom-surface part. The average Feret diameter Lave of the recessed parts is 0.5-50 μm. The current-collector metal foil is suitable for use, e.g., as an electrode current collector for a lithium-ion secondary battery, a sodium secondary battery, an electric double-layer capacitor, or a lithium-ion capacitor.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for shaping a metal foil for use as a current collector of a battery, comprising: forming a roughened surface on at least a first roll, plating a chrome-plate film on the roughened surface of the first roll, flattening peak parts of protruding parts on the chrome-plated film to form flat surfaces on the protruding parts, and passing the metal foil between a pair of rolls, at least one of which is the first roll, to transfer a contour of the first roll to a first surface of the metal foil, thereby forming recesses in the first surface of the metal foil, wherein the protruding parts having the flat surfaces on the first roll are configured such that: (i) after passing the metal foil between the pair of rolls, the recesses in the first surface of the metal foil have an average Feret diameter L ave of 0.5 μm or more and 50 μm or less, and (ii) a maximum depth of the recesses in the first surface of the metal foil is 2.5 μm or less and is less than the average Feret diameter L ave of the recesses in the first surface of the metal foil. 2. The method according to claim 1 , wherein: the roughened surface is formed by one of a mechanical method, a chemical method, or a physical method, after plating the chrome-plate film and before flattening, the peak parts each have a substantially spherical shape, and the substantially spherical shapes of the peak parts are flattened to form the flat surfaces by rolling the first roll with a load applied, thereby smashing the substantially spherical shapes. 3. The method according to claim 1 , wherein the protruding parts having the flat surfaces on the first roll are configured such that, after passing the metal foil between the pair of rolls, 90% or more of the recesses in the first surface of the metal foil have a depth of 0.5 μm or more. 4. The method according to claim 1 , further comprising: forming a roughened surface on a second roll, plating a chrome-plate film on the roughened surface of the second roll, and flattening peak parts of protruding parts on the chrome-plated film of the second roll to form flat surfaces on the protruding parts, wherein the metal foil is passed between the first and second rolls to transfer the contour of the first roll to the first surface of the metal foil and to transfer a contour of the second roll to a second surface of the metal foil, thereby forming recesses in the first and second surfaces of the metal foil, and the protruding parts having the flat surfaces on the second roll are configured such that, after passing the metal foil between the first and second rolls, the recesses in the second surface of the metal foil also have an average Feret diameter L ave of 0.5 μm or more and 50 μm or less and a maximum depth of 2.5 μm or less. 5. The method according to claim 1 , wherein the metal foil has a thickness of 5-35 μm. 6. The method according to claim 1 , wherein the metal foil has a thickness of 8-18 μm. 7. The method according to claim 1 , wherein the metal foil is composed of copper or a copper alloy. 8. The method according to claim 1 , wherein the metal foil is composed of aluminum or an aluminum alloy. 9. The method according to claim 1 , wherein the protruding parts having the flat surfaces on the first roll are configured such that, after passing the metal foil between the pair of rolls, 30-90% of a surface area of the metal foil is occupied by bottom surfaces of the recesses in the first surface of the metal foil. 10. The method according to claim 1 , further comprising: after passing the metal foil between the pair of rolls, applying an active material to at least the first surface of the metal foil, the active material having an average aggregated particle size d ave of 0.5 μm or more and 50 μm or less. 11. The method according to claim 10 , wherein the average aggregated particle size d ave of the active material is equal to or greater than the average Feret diameter L ave of the recesses in the first surface of the metal foil. 12. The method according to claim 11 , wherein the active material is composed of a material selected from the group consisting of silicon, tin, germanium, and oxides or alloys thereof; a carbon material; and lithium titanate. 13. The method according to claim 11 , wherein the active material is composed of a material selected from the group consisting of LiCoO 2 , LiMn 2 O 4 , LiMnO 2 , LiNiO 2 , LiCo 1/3 Ni 1/3 Mn 1/3 , and LiFePO 4 . 14. The method according to claim 4 , wherein the protruding parts having the flat surfaces on the first roll and on the second roll are configured such that, after passing the metal foil between the first and second rolls: 30-90% of a surface area of the metal foil is occupied by bottom surfaces of the recesses in the first and second surfaces of the metal foil. 15. The method according to claim 14 , wherein: the metal foil has a thickness of 8-18 μm; and the metal foil is composed of copper, a copper alloy, aluminum or an aluminum alloy.

Assignees

Inventors

Classifications

  • characterised by shape or form · CPC title

  • H01M4/64Primary

    Carriers or collectors · CPC title

  • Deposition of black chromium {, e.g. hexavalent chromium, CrVI} · CPC title

  • Wires; Strips; Foils · CPC title

  • Presses characterised by the use of rotary pressing members, e.g. rollers, rings, discs · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10418636B2 cover?
A current-collector metal foil has at least at least one roughened surface and numerous recessed parts are present on the roughened surface. Each recessed part has an edge part that surrounds a bottom-surface part and is raised above the bottom-surface part. The average Feret diameter Lave of the recessed parts is 0.5-50 μm. The current-collector metal foil is suitable for use, e.g., as an elec…
Who is the assignee on this patent?
Uacj Corp
What technology area does this patent fall under?
Primary CPC classification H01M4/64. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 17 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).