Gas floated workpiece supporting apparatus and noncontact workpiece support method

Patent metadata

Field	Value
Publication number	US-10418262-B2
Application number	US-201816185902-A
Country	US
Kind code	B2
Filing date	Nov 9, 2018
Priority date	Feb 27, 2015
Publication date	Sep 17, 2019
Grant date	Sep 17, 2019

Abstract

An apparatus for conveying a substrate includes a base along which the substrate is conveyed, a first upward gas ejecting section, a second upward gas ejecting section and a third upward gas ejecting section disposed over the base, the third upward gas ejecting section being disposed between the first and second upward gas ejecting sections, and a first downward gas ejecting section and a second downward gas ejecting section disposed above and facing respective portions of the third upward gas ejecting section. Gas ejected upward from the first, second and third upward gas ejecting sections floats the substrate. The substrate is subjected to pressure by gas ejected downward from the first and second downward gas ejecting sections. The first and second downward gas ejecting sections are spaced to provide a working area therebetween and through which the substrate is irradiated with a laser beam.

First claim

The invention claimed is:

1. An apparatus for conveying a substrate, the apparatus comprising:
a base along which the substrate is conveyed;
a first upward gas ejecting section, a second upward gas ejecting section and a third upward gas ejecting section disposed over the base, the third upward gas ejecting section being disposed between the first and second upward gas ejecting sections; and
a first downward gas ejecting section and a second downward gas ejecting section disposed above and facing respective portions of the third upward gas ejecting section,
wherein:
gas ejected upward from the first, second and third upward gas ejecting sections floats the substrate,
the substrate is subjected to pressure by gas ejected downward from the first and second downward gas ejecting sections,
the first and second downward gas ejecting sections are spaced to provide a working area therebetween and through which the substrate is irradiated with a laser beam, and
the third upward gas ejecting section is arranged in an area directly below the working area so as to overlap with the working area in a plan view.

2. The apparatus according to claim 1 , wherein floating height of the substrate above the third upward gas ejecting section is controlled with higher precision than floating height of the substrate above the first and second upward ejecting sections.

3. The apparatus according to claim 1 , wherein pressures of upward and downward ejected gases are balanced to stabilize the substrate in a vertical direction above the third upward gas ejecting section.

4. The apparatus according to claim 1 , wherein the third upward gas ejecting section has a porous main surface through which gas is ejected upward.

5. The apparatus according to claim 1 , wherein:
the substrate is conveyed in a direction from the first downward gas ejecting section to the second downward gas ejecting section,
a main surface of the first downward gas ejecting section has two end portions,
one of the two end portions is farther from the second downward gas ejecting section than another of the two end portions, and
the one of the two end portions is tapered.

6. The apparatus according to claim 1 , further comprising a height adjusting mechanism configured to move the first and second downward gas ejecting sections in a vertical direction.

7. The apparatus according to claim 1 , further comprising flow control valves disposed to control flow rates and pressures of the upward and the downward ejected gases.

8. The apparatus according to claim 1 , further comprising a height detector configured to detect a floating height of the substrate, wherein a flow rate and a pressure of each of the upward gas and the downward gas are controlled based on the floating height detected by the height detector.

9. The apparatus according to claim 1 , wherein the upward gas is air or nitrogen.

10. The apparatus according to claim 1 , wherein the downward gas is air or nitrogen.

11. The apparatus according to claim 1 , wherein the substrate is comprised of glass.

12. An apparatus for conveying a substrate, the apparatus comprising:
a base along which the substrate is conveyed;
a first upward gas ejecting section, a second upward gas ejecting section and a third upward gas ejecting section disposed over the base, the third upward gas ejecting section being disposed between the first and second upward gas ejecting sections; and
a first downward gas ejecting section and a second downward gas ejecting section disposed above and facing respective portions of the third upward gas ejecting section,
wherein:
gas ejected upward from the first, second and third upward gas ejecting sections floats the substrate,
the substrate is subjected to pressure by gas ejected downward from the first and second downward gas ejecting sections,
the first and second downward gas ejecting sections are spaced to provide a working area therebetween and through which the substrate is irradiated with a laser beam, and
wherein floating height of the substrate above the third upward gas ejecting section is controlled with higher precision than floating height of the substrate above the first and second upward ejecting sections.

13. An apparatus for conveying a substrate, the apparatus comprising:
a base along which the substrate is conveyed;
a first upward gas ejecting section, a second upward gas ejecting section and a third upward gas ejecting section disposed over the base, the third upward gas ejecting section being disposed between the first and second upward gas ejecting sections;
a first downward gas ejecting section and a second downward gas ejecting section disposed above and facing respective portions of the third upward gas ejecting section; and
a height adjusting mechanism configured to move the first and second downward gas ejecting sections in a vertical direction,
wherein:
gas ejected upward from the first, second and third upward gas ejecting sections floats the substrate,
the substrate is subjected to pressure by gas ejected downward from the first and second downward gas ejecting sections, and
the first and second downward gas ejecting sections are spaced to provide a working area therebetween and through which the substrate is irradiated with a laser beam.

Assignees

• Japan Steel Works Ltd

Inventors

• Suzuki Yuki
• Tanigawa Sadao

Classifications

• H10P72/70

  for supporting or gripping · CPC title

• H10P72/30 Primary

  for conveying, e.g. between different workstations · CPC title

• F16C2380/18

  Handling tools for semiconductor devices · CPC title

• F16C32/0614 Primary

  the gas being supplied under pressure, e.g. aerostatic bearings · CPC title

• F16C32/0622

  via nozzles, restrictors · CPC title