Plasma equipment for treating powder

US10418227B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10418227-B2
Application numberUS-201715719128-A
CountryUS
Kind codeB2
Filing dateSep 28, 2017
Priority dateDec 10, 2012
Publication dateSep 17, 2019
Grant dateSep 17, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a circular surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the circular surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the circular surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the circular surface discharge plasma module.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of processing a powder using a powder surface processing apparatus of a rotary cylindrical surface discharge plasma module: the apparatus comprising: a plate-like electrode layer serving as an external surface of the cylindrical surface discharge plasma module; an insulating layer disposed on an internal surface of the plate-like electrode layer; and a plurality of plasma generating electrodes in the form of a bar which are disposed on the insulating layer at intervals, wherein the cylindrical surface discharge plasma module is configured to rotate and the plate-like electrode layer, insulating layer, and plurality of plasma generating electrodes are configured to rotate with the cylindrical surface discharge plasma module, the cylindrical surface discharge plasma module is configured to apply an alternating voltage to the plurality of plasma generating electrodes and the plate-like electrode layer to generate plasma around the plurality of plasma generating electrodes, and the cylindrical surface discharge plasma module is configured to position a powder on the plasma generating electrodes and treat the surface of the powder by the generated plasma, wherein the apparatus comprises a driving unit configured to rotate the cylindrical surface discharge plasma module while the cylindrical surface discharge plasma module is in a horizontal state; and the method comprising: generating a plasma with the plasma generating electrodes of the powder surface processing apparatus; rotating the cylindrical surface discharge plasma module, plate-like electrode layer, insulating layer, and plurality of plasma generating electrodes; and contacting a powder with the plasma generated from the rotating plasma generating electrodes. 2. The method of claim 1 , wherein the plasma is generated from a plasma reaction gas injected into the surface discharge plasma module. 3. The method of claim 2 , wherein the plasma reaction gas comprises an inert gas and a gas containing oxygen, fluorine, or chlorine. 4. The method of claim 3 , wherein the inert gas comprises Ar or N 2 . 5. The method of claim 3 , wherein the gas containing oxygen comprises O 2 or N 2 O. 6. The method of claim 3 , wherein the gas containing fluorine comprises CF 4 or SF 6 . 7. The method of claim 3 , wherein the gas containing chlorine comprises Cl 2 or BCl 3 . 8. The method of claim 1 , wherein a high voltage is applied to the plate-like electrode layer, and the plurality of plasma generating electrodes are ground electrodes. 9. The method of claim 1 , wherein a high voltage is applied to the plurality of plasma generating electrodes, and the plate-like electrode layer is a ground electrode. 10. The method of claim 1 , wherein the plurality of the plasma generating electrodes are arranged on the insulating layer at intervals in the circumferential direction of the surface discharge plasma module, and extend in the longitudinal direction of the surface discharge plasma module. 11. The method of claim 1 , wherein the plurality of the plasma generating electrodes are arranged on the insulating layer at intervals in the longitudinal direction of the surface discharge plasma module, and extend in the circumferential direction of the surface discharge plasma module. 12. The method of claim 1 , wherein the driving unit includes a rotational speed control unit configured to control the speed at which the driving unit rotates the cylindrical surface discharge plasma module.

Assignees

Inventors

Classifications

  • B01J19/088Primary

    giving rise to electric discharges (for heating purposes H05B7/00; for the production of ozone C01B13/11, H01T19/00) · CPC title

  • Solid · CPC title

  • Processes or devices for granulating materials {, e.g. fertilisers} in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic · CPC title

  • Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources (plasma generation in general H05H1/24) · CPC title

  • Relative arrangement or disposition of electrodes; moving means · CPC title

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What does patent US10418227B2 cover?
A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a circular surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the circular surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode laye…
Who is the assignee on this patent?
Korea Basic Science Inst
What technology area does this patent fall under?
Primary CPC classification B01J19/088. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 17 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).