Position measuring method of an alignment target

Patent metadata

Field	Value
Publication number	US-10416577-B2
Application number	US-201615777162-A
Country	US
Kind code	B2
Filing date	Nov 29, 2016
Priority date	Dec 3, 2015
Publication date	Sep 17, 2019
Grant date	Sep 17, 2019

Abstract

A method of measuring a position of an alignment target on a substrate using an optical system. The method includes measuring a sub-segmented target by illuminating the sub-segmented target with radiation and detecting radiation diffracted by the sub-segmented target using a detector system to obtain signals containing positional information of the one sub-segmented target. The sub-segmented target has structures arranged periodically in at least a first direction, at least some of the structures including smaller sub-structures, and each sub-segmented target is formed with a positional offset between the structures and the sub-structures that is a combination of both known and unknown components. The signals, together with information on differences between known offsets of the sub-segmented target are used to calculate a measured position of an alignment target which is corrected for the unknown component of the positional offset.

First claim

The invention claimed is:

1. A method comprising:
measuring a sub-segmented target by illuminating the sub-segmented target with radiation and detecting radiation diffracted by the sub-segmented target using a detector system to obtain signals containing positional information of the sub-segmented target, the measuring performed on the sub-segmented target when the sub-segmented target is still in resist, the sub-segmented target comprising structures arranged periodically in at least a first direction, at least some of the structures comprising smaller sub-structures, and the sub-segmented target formed with a positional offset between the structures and the sub-structures that is a combination of both known and unknown components; and
using the signals, together with information on the known component of the positional offset of the sub-segmented target, to calculate a measured position of an alignment target on a substrate which is corrected for the unknown component of the positional offset.

2. The method as claimed in claim 1 , comprising determining a measure of asymmetry in the sub-segmented target and using this measure of asymmetry to correct for the unknown component of the positional offset when calculating the measured position of the alignment target.

3. The method as claimed in claim 1 , wherein the signals containing position information include a set of signals that are obtained for the sub-segmented target, wherein each signal of the set is obtained using radiation having a different characteristic.

4. The method as claimed in claim 3 , wherein the calculation of the measured position is based at least partly on an assumption that a relationship between the position information contained in a signal and the positional offset of a target has the same mathematical form for each signal of the set of signals.

5. The method as claimed in claim 3 , wherein the radiation having different characteristics includes radiation having different wavelengths, polarizations and/or illumination profiles.

6. The method as claimed in claim 1 , wherein the sub-segmented target comprises at least two segments having different known components of the positional offset between the structures forming the target and the sub-structures within the structures, the two or more segments formed in close proximity so as to form a composite target.

7. The method as claimed in claim 1 , wherein the signals are further used to determine corrections for subsequent substrates, the corrections for reducing the magnitude of the unknown component of the positional offset in the subsequent substrates.

8. The method as claimed in claim 1 , wherein the detecting is performed using an inspection apparatus configured for a measurement other than, or in addition to, an alignment measurement.

9. The method as claimed in claim 8 , further comprising determining a correction for the calculation of a measured position of the alignment target, the calculation further using measurements of the alignment target performed during positioning of a substrate in a lithographic apparatus.

10. The method as claimed in claim 8 , wherein the calculating a measured position of the alignment target comprises calculating a measured position of a target other than the sub-segmented target.

11. The method as claimed in claim 10 , wherein the sub-segmented target comprises structural characteristics compatible with the inspection apparatus.

12. The method as claimed in claim 10 , wherein the alignment target comprises a non-differential alignment target and the method further comprises performing a process calibration step to determine a sensitivity of the unknown component of the positional offset to overlaid structures having been formed overlaying the alignment target; and using the sensitivity to make a correction as part of the calculation of a measured position of the alignment target.

13. The method as claimed in claim 12 , wherein the process calibration step comprises:
forming a test sub-segmented alignment target on a test substrate;
forming an overlaid structure, corresponding to the overlaid structures which will have been formed prior to the calculation of a measured position of the alignment target during production, overlaying the test sub-segmented alignment target on the substrate;
performing a calibration measurement of the test sub-segmented alignment target; and
determining the sensitivity from the calibration measurement.

14. A non-transitory computer program product comprising machine-readable instructions therein, the instructions, when executed by a processing device system, are configured to cause the processing device system to at least:
obtain signals containing positional information of a sub-segmented target, the signals obtained by measurement of the sub-segmented target by illumination of the sub-segmented target with radiation and detection of radiation diffracted by the sub-segmented target using a detector system, the measurement performed on the sub-segmented target when the sub-segmented target is still in resist, the sub-segmented target comprising structures arranged periodically in at least a first direction, at least some of the structures comprising smaller sub-structures, and the sub-segmented target formed with a positional offset between the structures and the sub-structures that is a combination of both known and unknown components; and
use the signals, together with information on the known component of the positional offset of the sub-segmented target, to calculate a measured position of an alignment target on a substrate which is corrected for the unknown component of the positional offset.

15. The product as claimed in claim 14 , further comprising instructions configured to cause the processing device system to control a lithographic apparatus to apply a pattern to the substrate at a position defined by reference to the calculated position of the alignment target.

16. The method according to claim 1 , wherein fewer sub-segmented targets are measured than there are alignment targets for which a corrected measured position is calculated, such that corrected measured positions of a plurality of the alignment targets are corrected using signals from a same sub-segmented target.

17. The method according to claim 1 , wherein the detecting is performed using a lithographic apparatus.

18. A method of manufacturing devices, wherein a device pattern is applied to a substrate using a lithographic process, the method including positioning the applied pattern by reference to a measured position of an alignment target formed on the substrate, the measured position obtained by the method according to claim 1 .

19. The method according to claim 18 , comprising exposing a first layer comprising the sub-segmented target and the alignment target, either separately or as a single target.

20. A lithographic apparatus comprising:
a patterning subsystem configured to transfer a pattern to a substrate; and
a measuring subsystem configured to measure positions of the substrate in relation to the patterning subsystem,
wherein the patterning subsystem is arranged to use the positions measured by the measuring subsystem to apply the pattern at a desired position on the substrate,
wherein the measuring subsystem is arranged to position the applied pattern by reference to a measured position of an alignment target provided on the substrate, and wherein the measuring subsystem is arranged to calculate the measured position of the alignment target by t

Assignees

• Asml Netherlands Bv
• Asml Holding Nv

Inventors

• Brinkhof Ralph
• Mathijssen Simon Gijsbert Josephus
• Goosen Maikel Robert
• Demergis Vassili
• Rijpers Bartolomeus Petrus

Classifications

• G03F9/7088 Primary

  Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection · CPC title

• G03F9/7046 Primary

  Strategy, e.g. mark, sensor or wavelength selection · CPC title

• G03F9/7076

  Mark details, e.g. phase grating mark, temporary mark · CPC title

• G03F9/7092

  Signal processing · CPC title

• G03F7/70141

  Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system · CPC title