UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby

Patent metadata

Field	Value
Publication number	US-10414926-B2
Application number	US-201515514312-A
Country	US
Kind code	B2
Filing date	Sep 30, 2015
Priority date	Sep 26, 2014
Publication date	Sep 17, 2019
Grant date	Sep 17, 2019

Abstract

The present invention relates to a UV-curable ink composition, a method for producing a bezel pattern of a display substrate using same, and a bezel pattern produced thereby, the UV-curable ink composition comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, and an adhesion promoter, wherein the content ratio of the epoxy compound to the oxetane compound is 1:0.5-1:6, and an adhesion to a glass substrate after curing is 4B or higher according to the ASTM D3359 standard.

First claim

The invention claimed is:

1. A UV-curable ink composition for forming a bezel pattern comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, a surfactant and an adhesion promoter,
wherein a content ratio of the epoxy compound to the oxetane compound is 1:1.7 to 1:6, the adhesion promoter is one or more epoxy silane-based compounds, the adhesion promoter is contained in an amount of 2 to 8 wt % with respect to the total weight of the UV-curable ink composition, and adhesive force to a glass base material after curing is 4B or higher according to the ASTM D3359 standard.

2. The UV-curable ink composition of claim 1 , further comprising one or more selected from the group consisting of a diluent, and a photosensitizer.

3. The UV-curable ink composition of claim 1 , wherein the oxetane compound comprises an oxetane compound having one oxetane ring and an oxetane compound having two oxetane rings.

4. The UV-curable ink composition of claim 1 , wherein a content of the epoxy compound is 5 to 60 wt % with respect to the total weight of the UV-curable ink composition.

5. The UV-curable ink composition of claim 1 , wherein a content of the oxetane compound is 15 to 80 wt % with respect to the total weight of the UV-curable ink composition.

6. The UV-curable ink composition of claim 1 , wherein the photopolymerization initiator is an iodonium salt or a sulfonium salt.

7. The UV-curable ink composition of claim 1 , wherein a content of the photopolymerization initiator is 1 to 15 wt % with respect to the total weight of the UV-curable ink composition.

8. The UV-curable ink composition of claim 1 , wherein a content of the colorant is 1 to 15 wt % with respect to the total weight of the UV-curable ink composition.

9. The UV-curable ink composition of claim 2 , wherein a content of the diluent is 0 to 30 wt % with respect to the total weight of the UV-curable ink composition.

10. The UV-curable ink composition of claim 2 , wherein the surfactant is a fluorine-based surfactant.

11. The UV-curable ink composition of claim 2 , wherein the surfactant is contained in an amount of 0.1 to 5.0 wt % with respect to the total weight of the UV-curable in composition.

12. The UV-curable ink composition of claim 2 , wherein the photosensitizer is contained in an amount of 1 to 200 parts by weight with respect to 100 parts by weight of the photopolymerization initiator.

13. The UV-curable ink composition of claim 1 , wherein a dose for curing the UV-curable ink composition is 1 to 10,000 mJ/cm 2 .

14. The UV-curable ink composition of claim 1 , wherein the UV-curable ink composition has a viscosity of 1 cP to 50 cP at 25° C.

15. The UV-curable ink composition of claim 14 , wherein the UV-curable ink composition has a viscosity of 3 cP to 45 cP at 25° C.

16. The UV-curable ink composition of claim 1 , wherein the UV-curable ink composition has a taper angle of 0° to 30° after being cured.

17. The UV-curable ink composition of claim 16 , wherein the taper angle is 0° to 10°.

18. The UV-curable ink composition of claim 1 , wherein the UV-curable ink composition is for forming a bezel pattern.

19. A method for producing a bezel pattern for a display substrate, comprising:
a) forming a bezel pattern on a substrate by using the UV-curable ink composition of claim 1 ; and
b) curing the bezel pattern.

20. The method of claim 19 , further comprising cleaning and drying the substrate prior to a) the forming of the bezel pattern.

21. The method of claim 20 , wherein the cleaning and drying of the substrate is carried out by one or more treatments selected from the group consisting of a wet surface treatment, a UV ozone treatment, and a normal pressure plasma treatment.

22. The method of claim 19 , wherein the method of forming the bezel pattern on the substrate in Step a) is a method selected from an inkjet printing, a gravure coating, and a reverse offset coating.

23. The method of claim 19 , wherein Step a) is carried out at a process temperature of 10° C. to 100° C.

24. The method of claim 23 , wherein Step a) is carried out at a process temperature of 20° C. to 70° C.

25. The method of claim 19 , wherein the bezel pattern has a thickness of 0.1 μm to 20 μm.

26. The method of claim 25 , wherein the bezel pattern has a thickness of 0.5 μm to 5 μm.

27. The method of claim 19 , wherein the bezel pattern has a taper angle of 0° to 30°.

28. The method of claim 27 , wherein the bezel pattern has a taper angle of 0° to 10°.

29. The method of claim 19 , wherein the bezel pattern has an OD value of 0.05 to 2.5 per a film thickness of 1.0 μm.

30. A bezel pattern for a display substrate, which is formed on a substrate by curing the UV-curable ink composition of claim 1 .

31. The bezel pattern of claim 30 , wherein the bezel pattern has a thickness of 0.1 μm to 20 μm.

32. The bezel pattern of claim 31 , wherein the bezel pattern has a thickness of 0.5 μm to 5 μm.

33. The bezel pattern of claim 30 , wherein the bezel pattern has a taper angle of 0° to 30°.

34. The bezel pattern of claim 33 , wherein the bezel pattern has a taper angle of 0° to 10°.

35. The bezel pattern of claim 30 , wherein the bezel pattern has an OD value of 0.05 to 2.5 per a film thickness of 1.0 μm.

Assignees

• Lg Chemical Ltd

Inventors

• Park Sung-Eun
• Goo Yong-Sung
• Back Seung-A
• Kim Joon-Hyung

Classifications

• C09D11/101 Primary

  Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing · CPC title

• H05K2203/0534

  Offset printing, i.e. transfer of a pattern from a carrier onto the substrate by using an intermediate member · CPC title

• C09D11/03

  characterised by features other than the chemical nature of the binder · CPC title

• H05K3/12

  using {thick film techniques, e.g.} printing techniques to apply the conductive material {or similar techniques for applying conductive paste or ink patterns} · CPC title

• C09D11/102

  containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds · CPC title