UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby

US10414925B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10414925-B2
Application numberUS-201515501398-A
CountryUS
Kind codeB2
Filing dateSep 30, 2015
Priority dateSep 26, 2014
Publication dateSep 17, 2019
Grant dateSep 17, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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The present invention relates to a UV-curable ink composition, a method for producing a bezel pattern of a display substrate using same, and a bezel pattern produced thereby, the UV-curable ink composition comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, and a surfactant comprising a polar functional group, wherein the content ratio of the epoxy compound to the oxetane compound is 1:0.5-1:6, an adhesion to a glass substrate after curing is 4B or higher according to the ASTM D3359 standard, a contact angle to the glass substrate is less than 10°, and an adhesion with a substrate coated with an adhesive layer after curing is 100-5,000 gf/25 mm.

First claim

Opening claim text (preview).

The invention claimed is: 1. A UV-curable ink composition for forming a bezel pattern comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, a surfactant comprising a polar functional group, and an adhesion promoter, wherein a content ratio of the epoxy compound to the oxetane compound is 1:2.58 to 1:6, an adhesive force to a glass base material after curing is 4B or higher according to the ASTM D3359 standard, a contact angle with respect to a glass base material is less than 10°, and an upper portion attaching force after curing is 100 to 5,000 gf/25 mm, and wherein the adhesion promoter is one or more silane-based compounds selected from the group consisting of amino silane-based compounds, alkoxy silane-based compounds, epoxy silane-based compounds, aminophenyl silane-based compounds, amino silane-based compounds, mercapto silane-based compounds, and vinyl silane-based compounds. 2. The UV-curable ink composition of claim 1 , further comprising one or more selected from the group consisting of a colorant, and a photosensitizer. 3. The UV-curable composition of claim 1 , wherein the surfactant comprising the polar functional group comprises one functional group selected from the group consisting of a carboxyl group, a hydroxy group, a phosphoric acid group, and a sulfonic acid group. 4. The UV-curable composition of claim 3 , wherein the surfactant is a polymer-type or oligomer-type fluorine-based surfactant, and the surfactant is not dissolved in a solvent having a solubility parameter value of less than 15 (MPa) 0.5 , is not dissolved in an amount of 0.1 wt % or more in a solvent having a solubility parameter value of 45 (MPa) 0.5 or more, and is dissolved in an amount of 1 wt % or more in a solvent having a solubility parameter value of 15 to 21 (MPa) 0.5 and shows no phase separation. 5. The UV-curable composition of claim 4 , wherein the solvent having a solubility parameter value of less than 15 (MPa) 0.5 is hexane, the solvent having a solubility parameter value of 45 (MPa) 0.5 or more is water, and the solvent having a solubility parameter value of 15 to 21 (MPa) 0.5 is propylene glycol monomethyl ether (PGME) or toluene. 6. The UV-curable composition of claim 3 , wherein the surfactant is a surfactant comprising a reactive hydroxy group as a silicone-based additive. 7. The UV-curable composition of claim 3 , wherein the surfactant is a non-silicone-based surfactant which does not comprise a fluorine component. 8. The UV-curable composition of claim 3 , wherein the surfactant comprising the polar functional group is comprised in an amount of 0.1 to 5.0 wt % with respect to a total weight of the UV-curable ink composition. 9. The UV-curable composition of claim 1 , wherein the oxetane compound comprises an oxetane compound having one oxetane ring and an oxetane compound having two oxetane rings. 10. The UV-curable composition of claim 9 , wherein a content ratio of the oxetane compound having one oxetane ring to the oxetane compound having two oxetane rings is 1:16 to 1:3. 11. The UV-curable composition of claim 1 , wherein a content of the epoxy compound is 5 to 50 wt % with respect to the total weight of the UV-curable ink composition. 12. The UV-curable composition of claim 1 , wherein a content of the oxetane compound is 15 to 75 wt % with respect to the total weight of the UV-curable ink composition. 13. The UV-curable composition of claim 1 , wherein the photopolymerization initiator is an iodonium salt or a sulfonium salt. 14. The UV-curable composition of claim 1 , wherein a content of the photopolymerization initiator is 1 to 15 wt % with respect to the total weight of the UV-curable ink composition. 15. The UV-curable composition of claim 1 , wherein a content of the colorant is 1 to 15 wt % with respect to the total weight of the UV-curable ink composition. 16. The UV-curable composition of claim 2 , wherein a content of the colorant is 0 to 30 wt % with respect to the total weight of the UV-curable ink composition. 17. The UV-curable composition of claim 2 , wherein the photosensitizer is comprised in an amount of 1 to 200 parts by weight with respect to 100 parts by weight of the photopolymerization initiator. 18. The UV-curable composition of claim 1 , wherein the adhesion promoter is comprised in an amount of 0.1 to 15 wt % with respect to the total weight of the UV-curable ink composition. 19. The UV-curable composition of claim 1 , wherein a dose for curing the UV-curable ink composition is 1 to 10,000 mJ/cm 2 . 20. The UV-curable composition of claim 1 , wherein the UV-curable ink composition has a viscosity of 1 cp to 50 cp at 25° C. 21. The UV-curable composition of claim 1 , wherein the UV-curable ink composition has a taper angle of 0° to 30° after being cured. 22. The UV-curable composition of claim 1 , wherein the UV-curable ink composition is for forming a bezel pattern. 23. A method for producing a bezel pattern for a display substrate, comprising: a) forming a bezel pattern on a substrate by using the UV-curable ink composition of claim 1 ; and b) curing the bezel pattern. 24. The method of claim 23 , wherein the method of forming the bezel pattern on the substrate in Step a) is a method selected from an inkjet printing, a gravure coating, and a reverse offset coating. 25. A bezel pattern for a display substrate, which is formed on a substrate by curing the UV-curable ink composition of claim 1 .

Assignees

Inventors

Classifications

  • Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements (in which the variable information is permanently attached to a movable support G09F11/00; abacus G06C1/00; slide-rules G06G1/00) · CPC title

  • by other printing techniques, e.g. letterpress printing, intaglio printing, lithographic printing, offset printing · CPC title

  • characterised by the pigment · CPC title

  • by ultraviolet or visible light · CPC title

  • Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain (based on polyacetals C09D159/00; based on epoxy resins C09D163/00; based on polythioether-ethers C09D181/02; based on polyethersulfones C09D181/06); Coating compositions based on derivatives of such polymers · CPC title

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What does patent US10414925B2 cover?
The present invention relates to a UV-curable ink composition, a method for producing a bezel pattern of a display substrate using same, and a bezel pattern produced thereby, the UV-curable ink composition comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, and a surfactant comprising a polar functional group, wherein the content ratio of the epoxy co…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C09D11/101. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 17 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).