Photoimageable polyolefin compositions containing photobase generators

US10409160B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10409160-B2
Application numberUS-201815918604-A
CountryUS
Kind codeB2
Filing dateMar 12, 2018
Priority dateFeb 18, 2015
Publication dateSep 10, 2019
Grant dateSep 10, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Embodiments in accordance with the present invention encompass self-imagable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

First claim

Opening claim text (preview).

What is claimed is: 1. A photoimagable composition comprising: a) a polymer consisting of one or more first repeating units represented by formula (IA), said first repeating unit is derived from a monomer of formula (I): wherein: m is an integer 0, 1 or 2; R 1 , R 2 , R 3 and R 4 are the same or different and each independently selected from the group consisting of hydrogen, halogen, linear or branched (C 1 -C 12 )alkyl, linear or branched hydroxy(C 1 -C 12 )alkyl, linear or branched perfluoro(C 1 -C 12 )alkyl, (C 3 -C 12 )cycloalkyl, (C 6 -C 12 )bicycloalkyl, (C 7 -C 14 )tricycloalkyl, (C 6 -C 10 )aryl, (C 6 -C 10 )aryl(C 1 -C 6 )alkyl, perfluoro(C 6 -C 10 )aryl, perfluoro(C 6 -C 10 )aryl(C 1 -C 3 )alkyl, (C 5 -C 10 )heteroaryl, (C 5 -C 10 )heteroaryl(C 1 -C 3 )alkyl, hydroxy, (C 1 -C 12 )alkoxy, (C 3 -C 12 )cycloalkoxy, (C 6 -C 12 )bicycloalkoxy, (C 7 -C 14 )tricycloalkoxy, (C 6 -C 10 )aryloxy(C 1 -C 3 )alkyl, (C 5 -C 10 )heteroaryloxy(C 1 -C 3 )alkyl, (C 6 -C 10 )aryloxy, (C 5 -C 10 )heteroaryloxy, (C 1 -C 6 )acyloxy, —(CH 2 ) a —C(CF 3 ) 2 OR, —(CH 2 ) a —CO 2 R, a group of formula (A): —(CH 2 ) b —(OCH 2 —CH 2 ) c —OR  (A); and a group of formula (B): wherein: a is an integer from 0 to 4 b is an integer from 0 to 10; c is an integer 0, 1, 2, 3 or 4; and R is selected from the group consisting of hydrogen, linear or branched (C 1 -C 6 )alkyl, (C 5 -C 8 )cycloalkyl, (C 6 -C 10 )aryl and (C 7 -C 12 )aralkyl; a second repeating unit represented by formula (IIA), said second repeating unit is derived from a monomer of formula (II): wherein R 8 , R 9 , R 10 and R 11 are the same or different and each independently of one another is selected from the group consisting of hydrogen, linear or branched (C 1 -C 6 )alkyl, (C 5 -C 8 )cycloalkyl, (C 6 -C 10 )aryl and (C 7 -C 12 )aralkyl; and a third repeating unit selected from the group consisting of a repeating unit of formula (IIIA) and a repeating unit of formula (IIIB), said third repeating unit is derived from a monomer of formula (III): wherein: Z is O or N—R 12 wherein R 12 is selected from the group consisting of hydrogen, linear or branched (C 1 -C 9 )alkyl, (C 3 -C 7 )cycloalkyl and (C 6 -C 12 )aryl; R 5 , R 6 and R 7 are each independently of one another selected from the group consisting of hydrogen, linear or branched (C 1 -C 9 )alkyl, fluorinated or perfluorinated(C 1 -C 9 )alkyl, (C 6 -C 12 )aryl and (C 6 -C 12 )aryl(C 1 -C 12 )alkyl; and wherein each of aforementioned groups, where valence is permissible, is optionally substituted with one or more groups selected from the group consisting of linear or branched (C 1 -C 6 )alkyl, (C 3 -C 7 )cycloalkyl, (C 1 -C 6 )perfluoroalkyl, (C 1 -C 6 )alkoxy, (C 3 -C 7 )cycloalkoxy, (C 1 -C 6 )perfluoroalkoxy, halogen, hydroxy, linear or branched hydroxy(C 1 -C 6 )alkyl, acetoxy, phenyl, hydroxyphenyl and acetoxyphenyl; b) a photobase generator selected from the group consisting of: a compound of formula (IV): a compound of formula (V): a compound of formula (VI): a compound of formula (VIIA): a compound of formula (VIIB):  and a compound of formula (VIIC): wherein R 13 and R 14 each independently of each other selected from the group consisting of hydrogen, linear or branched (C 1 -C 8 )alkyl and (C 6 -C 10 )aryl; or R 13 and R 14 taken together with the nitrogen atom to which they are attached form a 5 to 7 membered monocyclic ring or 6 to 12 membered bicyclic ring, said rings optionally containing one or more heteroatoms selected from O and N, and said rings optionally substituted with a group selected from the group consisting of linear or branched (C 1 -C 8 )alkyl, (C 6 -C 10 )aryl, halogen, hydroxy, linear or branched (C 1 -C 8 )alkoxy and (C 6 -C 10 )aryloxy; and R 15 , R 16 and R 17 are the same or different and each independently of one another selected from the group consisting of hydrogen, linear or branched (C 1 -C 16 )alkyl, (C 6 -C 10 )aryl, (C 6 -C 10 )aryl(C 1 -C 3 )alkyl, hydroxy, halogen, linear or branched (C 1 -C 12 )alkoxy and (C 6 -C 10 )aryloxy; and c) a carrier solvent. 2. The composition of claim 1 , wherein the polymer consists of: one or more first repeat units derived from the corresponding monomers selected from the group consisting of: bicyclo[2.2.1]hept-2-ene; 5-decylbicyclo[2.2.1]hept-2-ene; norbornenyl-2-trifluoromethyl-3,3,3-trifluoropropan-2-ol; 5-phenethylbicyclo[2.2.1]hept-2-ene; and norbornenylpropanoic acid; one or more second repeat units derived from the corresponding monomers selected from the group consisting of: styrene; and □-methylstyrene; and one or more third repeat units derived from the corresponding monomers selected from the group consisting of: maleic anhydride; and 2-methyl-maleic anhydride. 3. A photoimagable composition comprising: a) a copolymer containing repeating units derived from styrene and ring opened maleic anhydride repeat units which is ring opened with n-butylamine; b) a photobase generator selected from the group consisting of: a compound of formula (IV): a compound of formula (V): a compound of formula (VI): a compound of formula (VIIA): a compound of formula (VIIB):  and a compound of formula (VIIC): wherein R 13 and R 14 each independently of each other selected from the group consisting of hydrogen, linear or branched (C 1 -C 8 )alkyl and (C 6 -C 10 )aryl; or R 13 and R 14 taken together with the nitrogen atom to which they are attached form a 5 to 7 membered monocyclic ring or 6 to 12 membered bicyclic ring, said rings optionally containing one or more heteroatoms selected from O and N, and sa

Assignees

Inventors

Classifications

  • with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

  • G03F7/038Primary

    Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

  • G03F7/0045Primary

    with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

  • the macromolecular compound having an alicyclic moiety in a side chain · CPC title

  • the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10409160B2 cover?
Embodiments in accordance with the present invention encompass self-imagable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored …
Who is the assignee on this patent?
Promerus Llc
What technology area does this patent fall under?
Primary CPC classification G03F7/038. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 10 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).