Substrate holder for vertical galvanic metal deposition

US10407793B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10407793-B2
Application numberUS-201515533712-A
CountryUS
Kind codeB2
Filing dateDec 16, 2015
Priority dateDec 19, 2014
Publication dateSep 10, 2019
Grant dateSep 10, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate holder for vertical galvanic metal deposition on a substrate, comprising a first substrate holder part and a second substrate holder part, wherein both said parts comprise an inner metal comprising part and an outer non-metallic part in which the substrate holder further comprises a hanging element in each substrate holder part, a first sealing element in each substrate holder part, a second sealing element between the inner metal comprising part and the outer non-metallic part of the substrate holder, a fastening system for detachably fastening both substrate holder parts to each other, a first contact element in each substrate holder part for forwarding current from an outer source through the hanging element to the at least second contact element, and a second contact element in each substrate holder part for forwarding current from the at least first contact element to the substrate to be treated.

First claim

Opening claim text (preview).

The invention claimed is: 1. Substrate holder for vertical galvanic metal deposition on a substrate to be treated comprising a first substrate holder part and a second substrate holder part, wherein both substrate holder parts comprise an inner metal comprising part and an outer non-metallic part characterized in that the substrate holder further comprises i) At least one hanging element in each substrate holder part for mechanically connecting the substrate holder to a treatment container; ii) At least one first sealing element in each substrate holder part arranged between the substrate to be treated and the respective substrate holder part; iii) At least one second sealing element in each substrate holder part arranged between the inner metal comprising part of each substrate holder and the outer non-metallic part of each substrate holder; iv) At least one fastening system for detachably fastening both substrate holder parts to each other for holding the substrate to be treated, wherein the fastening system comprises a first recess element in the first substrate holder part and a first fastening element in the second substrate holder part, wherein said first fastening element is in conjunction with the first recess element for fastening both substrate holder parts; v) At least one first contact element in each substrate holder part for forwarding current from an outer source through the hanging element to at least one second contact element; and vi) wherein the at least one second contact element in each substrate holder part is configured for forwarding current from the at least one first contact element to the substrate to be treated; vii) wherein the fastening system further comprises at least a plurality of second fastening elements, and third, fourth and fifth fastening elements, and a plurality of third recess elements in the first substrate holder part; at least a plurality of sixth fastening elements, and seventh, eighth, ninth, tenth, eleventh and twelfth fastening elements, and a plurality of fourth recess elements in the second substrate holder part; wherein the plurality of second fastening elements of the first substrate holder part are in conjunction with the plurality of fourth recess elements of the second substrate holder part; wherein the plurality of sixth fastening elements of the second substrate holder part are in conjunction with the plurality of third recess elements of the first substrate holder part; wherein the plurality of second and sixth fastening elements are permanently fixed elements, which are unmovable in their position; wherein the third, fourth, and fifth fastening elements are part of a metallic chain; wherein the fifth fastening element is a circular or rectangular metallic element running around the site of the first substrate holder part, which is adapted to receive the substrate to be treated; wherein the third and the fourth fastening elements are two separated metallic elements running both linearly from said fifth fastening element to the upper side of the first substrate holder part; wherein the third and the fourth fastening element are each interconnected to the fifth circular or rectangular metallic element; wherein all the metallic elements in the first substrate holder part comprises a plurality of consecutive oblong holes, which comprise the plurality of third recess elements; wherein the seventh, eighth, ninth and twelfth fastening element are part of a metallic chain; wherein the ninth fastening element is a circular or rectangular metallic element running around the site of the second substrate holder part, which is adapted to receive the substrate to be treated; wherein the eighth and seventh fastening elements are two separated metallic elements running both linearly from said ninth fastening element to the upper side of the second substrate holder part; wherein the seventh and the eighth fastening element are each interconnected to the ninth circular or rectangular metallic element by the twelfth fastening element; wherein all the metallic elements in the second substrate holder part comprises a plurality of consecutive oblong holes, which comprise the plurality of fourth recess elements; and wherein the tenth and the eleventh fastening elements open and close the substrate holder by pushing or pressing the respective fastening element. 2. Substrate holder according to claim 1 characterized in that the substrate holder further comprises at least one third sealing element in each substrate holder part arranged between the inner metal comprising part of each substrate holder and the outer non-metallic part of each substrate holder, wherein said third sealing element is more exterior than the second sealing element. 3. Substrate holder according to claim 1 characterized in that the substrate holder further comprises at least two first positioning elements in one substrate holder part for accurate central positioning of the at least one substrate to be treated. 4. Substrate holder according to claim 1 characterized in that the substrate holder further comprises at least two second positioning elements at the exterior opposite ends of each hanging element for accurate mechanically positioning of the substrate holder in the treatment container. 5. Substrate holder according to claim 1 characterized in that the at least one second contact element in each substrate holder part is formed in multiple parts. 6. Substrate holder according to claim 1 characterized in that the at least one second contact element in each substrate holder part comprises a plurality of contact finger elements. 7. Substrate holder according to claim 6 characterized in that the at least one second contact element in each substrate holder part is formed in multiple parts, wherein each part of the second contact element comprises at least one said contact finger elements. 8. Substrate holder according to claim 1 characterized in that the first contact element in one substrate holder part comprises at both exterior opposite ends directed to the outer current source a second recess element, while the first contact element in the other substrate holder part is a flat edge. 9. Substrate holder according to claim 1 characterized in that the first sealing element in each substrate holder part comprise a double lip sealing element, wherein both lips are arranged in such a manner that both lips can contact the surface of the substrate to be treated if inserted. 10. Substrate holder according to claim 2 characterized in that the second sealing element and/or the third sealing element in each substrate holder part comprise each a double lip sealing element, wherein both lips are arranged between both substrate holder parts in such a manner that both lips are directed toward the outside of the substrate holder. 11. Substrate holder according to claim 2 characterized in that the second sealing element and/or the third sealing element in each substrate holder part comprise each a modified double lip sealing element, wherein two lips are arranged between both substrate holder parts in a direction toward the outside of the substrate holder and wherein simultaneously two lips are directed toward both substrate holder parts. 12. Substrate holder according to claim 2 characterized in that the substrate holder further comprises at least two first positioning elements in one substrate holder part for accurate central positioning of the at least one substrate to be treated. 13. Substrate holder according to claim 6 characterized in that the at least one second contact element in each substrate holder part is formed in multip

Assignees

Inventors

Classifications

  • Electrolytic deposition, i.e. electroplating; Electroless plating · CPC title

  • characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

  • characterised by a coating, a hardness or a material · CPC title

  • characterised by edge clamping, e.g. clamping ring · CPC title

  • Apparatus for sealing, encapsulating, glassing, decapsulating or the like · CPC title

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What does patent US10407793B2 cover?
A substrate holder for vertical galvanic metal deposition on a substrate, comprising a first substrate holder part and a second substrate holder part, wherein both said parts comprise an inner metal comprising part and an outer non-metallic part in which the substrate holder further comprises a hanging element in each substrate holder part, a first sealing element in each substrate holder part,…
Who is the assignee on this patent?
Atotech Deutschland Gmbh
What technology area does this patent fall under?
Primary CPC classification C25D17/001. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 10 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).