Low noise electret microphone
US-2015358709-A1 · Dec 10, 2015 · US
Electret element, microphone having electret element mounted therein and electret element manufacturing method
US10405103B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10405103-B2 |
| Application number | US-201816129836-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 13, 2018 |
| Priority date | Oct 22, 2014 |
| Publication date | Sep 3, 2019 |
| Grant date | Sep 3, 2019 |
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- Title
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Abstract
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An electret element includes: an electret film that contains silicon oxide; and a protective film formed over the electret film and constituted of aluminum oxide deposited through an atomic layer deposition method.
First claim
Opening claim text (preview).
The invention claimed is: 1. An electret element manufacturing method, comprising the steps of: performing a first processing to form a silicon oxide film containing alkali ions on a substrate, performing a second processing to deposit an aluminum oxide film through an atomic layer deposition method onto the silicon oxide film; and after having carried out the second processing, performing a third processing to induce electric polarization by causing the alkali ions to move in the silicon oxide film through a voltage application while heating the substrate. 2. The electret element manufacturing method according to claim 1 , wherein: the substrate includes first comb teeth and second comb teeth; and in the third processing, the electric polarization is induced by applying a voltage between the first comb teeth and the second comb teeth so as to cause the alkali ions to move while the substrate is heated.
Assignees
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Classifications
- H04R19/016Primary
for microphones · CPC title
Interconnection of transducer parts (of diaphragm and outer suspension by moulding H04R31/003) · CPC title
using semiconductor materials · CPC title
characterised by the chemical nature of one of its constituents · CPC title
having a heterogeneous dielectric · CPC title
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Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US10405103B2 cover?
- An electret element includes: an electret film that contains silicon oxide; and a protective film formed over the electret film and constituted of aluminum oxide deposited through an atomic layer deposition method.
- Who is the assignee on this patent?
- Univ Shizuoka Nat Univ Corp, Saginomiya Seisakusho Inc
- What technology area does this patent fall under?
- Primary CPC classification H04R19/016. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Sep 03 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).