Fabrication of thermally stable nanocavities and particle-in-cavity nanostructures

Patent metadata

Field	Value
Publication number	US-10400322-B2
Application number	US-201615781359-A
Country	US
Kind code	B2
Filing date	Dec 2, 2016
Priority date	Dec 4, 2015
Publication date	Sep 3, 2019
Grant date	Sep 3, 2019

Abstract

Various examples related to fabrication of thermally stable ultra-high density particle-in-cavity (PIC) nanostructures. In one example, a method includes disposing an anodized aluminum oxide (AAO) template onto a surface of a substrate; removing, from the AAO template, a support layer disposed on a side of the AAO template opposite the surface of the substrate; etching nanocavities into the surface of the substrate using the AAO template as an etch mask; and removing the AAO template from the surface of the substrate. The method can include fabricating the AAO template on an aluminum substrate by anodization of an aluminum film and removing the AAO template from the aluminum substrate after formation of the support layer on the AAO template.

First claim

Therefore, at least the following is claimed:

1. A method, comprising:
disposing an anodized aluminum oxide (AAO) template onto a surface of a substrate, the AAO template comprising a support layer disposed on a side of the AAO template opposite the surface of the substrate;
removing the support layer from the AAO template;
etching nanocavities into the surface of the substrate using the AAO template as an etch mask; and
removing the AAO template from the surface of the substrate.

2. The method of claim 1 , comprising inserting nanoparticles into the nanocavities.

3. The method of claim 2 , wherein the nanoparticles are deposited into the nanocavities by sputtering and annealing.

4. The method of claim 2 , wherein the nanoparticles are deposited into the nanocavities by spin coating a nanoparticle solution on the surface of the substrate.

5. The method of claim 2 , wherein the nanoparticles are deposited into the nanocavities by e-beam evaporation.

6. The method of claim 2 , wherein a plurality of nanoparticles are deposited in individual nanocavities.

7. The method of claim 1 , wherein the support layer is a polystyrene (PS) support layer.

8. The method of claim 1 , comprising forming the support layer on the side of the AAO template.

9. The method of claim 8 , comprising:
fabricating the AAO template on an aluminum substrate by anodization of an aluminum film; and
removing the AAO template from the aluminum substrate after formation of the support layer on the AAO template.

10. The method of claim 9 , comprising transferring the AAO template to the substrate in a liquid.

11. The method of claim 1 , wherein the support layer is removed by oxygen plasma.

12. The method of claim 1 , wherein the nanocavities are etched into the surface of the substrate using reactive ion etching (RIE).

13. The method of claim 12 , wherein geometries of the nanocavities are based at least in part upon a gas used for the RIE and a material of the substrate.

14. The method of claim 1 , wherein isotropic etching forms a nano-dimpled surface on the substrate.

15. The method of claim 1 , wherein anisotropic etching forms a nano-porous surface on the substrate.

16. The method of claim 1 , wherein the substrate is a silicon substrate, a glass substrate, or an indium tin oxide (ITO)-coated substrate.

17. The method of claim 1 , wherein the AAO template includes pores having a pore diameter of about 60 nm or less.

18. The method of claim 17 , wherein the pore diameter is about 30 nm or less.

19. The method of claim 17 , wherein the pores have an interpore distance of about 100 nm or less.

20. The method of claim 1 , wherein the AAO template has a thickness of about 200 nm or less.

Assignees

• Univ Florida
• The Univ Of Florida Research Foundation Inc

Inventors

• Xu Cheng
• Li Luping
• Zhao Yang
• Ziegler Kirk Jeremy
• Wong Justin C

Classifications

• C23C16/45514

  Mixing in close vicinity to the substrate · CPC title

• C23C16/45574

  Nozzles for more than one gas · CPC title

• C23C14/5806

  Thermal treatment · CPC title

• C23C16/45512

  Premixing before introduction in the reaction chamber · CPC title

• C23C16/0272

  Deposition of sub-layers, e.g. to promote the adhesion of the main coating · CPC title