Method for producing purified active silicic acid solution and silica sol

US10400147B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10400147-B2
Application numberUS-201213617453-A
CountryUS
Kind codeB2
Filing dateSep 14, 2012
Priority dateSep 16, 2011
Publication dateSep 3, 2019
Grant dateSep 3, 2019

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Abstract

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A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 μm is 50% or more.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method comprising: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components, wherein the active silicic acid solution that is prepared contains an amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm; and filtering the active silicic acid solution through a filter having a removal rate of particles having a primary particle size of 1.0 μm of 50% or more to produce a purified active silicic acid solution in which an amount (%) as measured by a measuring method A of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is reduced relative to an amount (%) as measured by the measuring method A of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm contained in the active silicic acid solution, wherein: the filter is at least one selected from the group consisting of a pleated filter, a depth filter, and a diatomaceous-earth-containing filter; the amount (%) of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the purified active silicic acid solution is in a range of from 0% to 30% as measured by the measuring method A; the measuring method A comprises: observing under a scanning electron microscope at a magnification of 5,000 times a membrane filter through which 30 mL of a solution to be observed has been passed, the solution to be observed having a silica concentration of 4% by mass and a temperature of 25° C., and the membrane filter having a filtration area of 4.90 cm 2 and an absolute pore size of 0.4 μm; measuring as one count a state in which one or more of the plate-like fine particles exist within one visual field area having a length of 15 μm and a width of 20 μm; and determining the presence or absence of the count with respect to each visual field area of 100 non-overlapping visual field areas to measure a total number of counts as the amount (%) of the plate-like fine particles; the solution to be observed in the measuring method A is the purified active silicic acid solution; and the amount (%) as measured by the measuring method A of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the active silicic acid solution is 73% or more. 2. The method according to claim 1 , wherein the removal rate is 60% or more. 3. The method according to claim 1 , wherein the removal rate is 70% or more. 4. The method according to claim 1 , wherein the removal rate is 80% or more. 5. The method according to claim 1 , wherein the removal rate is 90% or more. 6. The method according to claim 1 , wherein the alkaline components of the alkali silicate aqueous solution are at least one selected from the group consisting of a sodium ion, a potassium ion, a lithium ion, a rubidium ion, and a cesium ion. 7. The method according to claim 1 , further comprising: adding the purified active silicic acid solution into an alkaline aqueous solution to obtain a mixture; and heating the mixture to polymerize active silicic acid to produce a silica sol; wherein an amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the silica sol is in a range of from 0% to 30% as measured by the measuring method A in which the solution to be observed is the silica sol. 8. The method according to claim 7 , wherein the alkaline components of the alkaline aqueous solution are at least one selected from the group consisting of an alkali metal ion, an ammonium ion, amine, and a quaternary ammonium ion. 9. The method according to claim 1 , wherein the amount (%) as measured by the measuring method A of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the active silicic acid solution is in a range of from 73% to 75%. 10. The method according to claim 1 , wherein the amount (%) as measured by the measuring method A of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the purified active silicic acid solution is in a range of from 0% to 17%. 11. The method according to claim 1 , wherein a filtering rate in a range of from 13 L/min to 400 L/min per 1 m 2 of a filtration area of the filter is employed to filter the active silicic acid solution through the filter.

Assignees

Inventors

Classifications

  • Stabilisation, e.g. prevention of gelling; Purification · CPC title

  • containing an inorganic acid · CPC title

  • C09K3/1463Primary

    Aqueous liquid suspensions · CPC title

  • using ion exchangers · CPC title

  • by oxidation of silicon in basic medium · CPC title

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What does patent US10400147B2 cover?
A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm i…
Who is the assignee on this patent?
Ema Kiyomi, Takakuma Noriyuki, Nishimura Tohru, and 3 more
What technology area does this patent fall under?
Primary CPC classification C09K3/1463. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 03 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).