Methods for fabricating a chemical-mechanical polishing composition
US-2015376460-A1 · Dec 31, 2015 · US
US10400147B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10400147-B2 |
| Application number | US-201213617453-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 14, 2012 |
| Priority date | Sep 16, 2011 |
| Publication date | Sep 3, 2019 |
| Grant date | Sep 3, 2019 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 μm is 50% or more.
Opening claim text (preview).
The invention claimed is: 1. A method comprising: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components, wherein the active silicic acid solution that is prepared contains an amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm; and filtering the active silicic acid solution through a filter having a removal rate of particles having a primary particle size of 1.0 μm of 50% or more to produce a purified active silicic acid solution in which an amount (%) as measured by a measuring method A of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is reduced relative to an amount (%) as measured by the measuring method A of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm contained in the active silicic acid solution, wherein: the filter is at least one selected from the group consisting of a pleated filter, a depth filter, and a diatomaceous-earth-containing filter; the amount (%) of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the purified active silicic acid solution is in a range of from 0% to 30% as measured by the measuring method A; the measuring method A comprises: observing under a scanning electron microscope at a magnification of 5,000 times a membrane filter through which 30 mL of a solution to be observed has been passed, the solution to be observed having a silica concentration of 4% by mass and a temperature of 25° C., and the membrane filter having a filtration area of 4.90 cm 2 and an absolute pore size of 0.4 μm; measuring as one count a state in which one or more of the plate-like fine particles exist within one visual field area having a length of 15 μm and a width of 20 μm; and determining the presence or absence of the count with respect to each visual field area of 100 non-overlapping visual field areas to measure a total number of counts as the amount (%) of the plate-like fine particles; the solution to be observed in the measuring method A is the purified active silicic acid solution; and the amount (%) as measured by the measuring method A of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the active silicic acid solution is 73% or more. 2. The method according to claim 1 , wherein the removal rate is 60% or more. 3. The method according to claim 1 , wherein the removal rate is 70% or more. 4. The method according to claim 1 , wherein the removal rate is 80% or more. 5. The method according to claim 1 , wherein the removal rate is 90% or more. 6. The method according to claim 1 , wherein the alkaline components of the alkali silicate aqueous solution are at least one selected from the group consisting of a sodium ion, a potassium ion, a lithium ion, a rubidium ion, and a cesium ion. 7. The method according to claim 1 , further comprising: adding the purified active silicic acid solution into an alkaline aqueous solution to obtain a mixture; and heating the mixture to polymerize active silicic acid to produce a silica sol; wherein an amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the silica sol is in a range of from 0% to 30% as measured by the measuring method A in which the solution to be observed is the silica sol. 8. The method according to claim 7 , wherein the alkaline components of the alkaline aqueous solution are at least one selected from the group consisting of an alkali metal ion, an ammonium ion, amine, and a quaternary ammonium ion. 9. The method according to claim 1 , wherein the amount (%) as measured by the measuring method A of the plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the active silicic acid solution is in a range of from 73% to 75%. 10. The method according to claim 1 , wherein the amount (%) as measured by the measuring method A of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm in the purified active silicic acid solution is in a range of from 0% to 17%. 11. The method according to claim 1 , wherein a filtering rate in a range of from 13 L/min to 400 L/min per 1 m 2 of a filtration area of the filter is employed to filter the active silicic acid solution through the filter.
Stabilisation, e.g. prevention of gelling; Purification · CPC title
containing an inorganic acid · CPC title
Aqueous liquid suspensions · CPC title
using ion exchangers · CPC title
by oxidation of silicon in basic medium · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.