Exposure method, exposure apparatus, and method of manufacturing article

Patent metadata

Field	Value
Publication number	US-10394134-B2
Application number	US-201816050203-A
Country	US
Kind code	B2
Filing date	Jul 31, 2018
Priority date	Aug 3, 2017
Publication date	Aug 27, 2019
Grant date	Aug 27, 2019

Abstract

The present invention provides an exposure method for repeatedly performing an exposure process for exposing a substrate via a projection optical system, the method comprising a first exposure process for measuring optical characteristics of the projection optical system, and exposing the substrate while correcting the optical characteristics based on a result of the measurement; a second exposure process for exposing the substrate while correcting the optical characteristics based on a result of estimating the optical characteristics by a prediction formula, wherein the first exposure process is repeatedly performed, and the second exposure process is started after the first exposure process where it is judged that the determined coefficient of the prediction formula has converged.

First claim

What is claimed is:

1. An exposure method for repeatedly performing an exposure process for exposing a substrate via a projection optical system, the method comprising:
a first exposure process for measuring optical characteristics of the projection optical system, and exposing the substrate while correcting the optical characteristics based on a result of the measurement;
a second exposure process for exposing the substrate while correcting the optical characteristics based on a result of estimating the optical characteristics by a prediction formula,
wherein the first exposure process includes determining a coefficient of the prediction formula from a result of measuring the optical characteristics up until the present, and judging whether the determined coefficient of the prediction formula has converged, and
wherein in the exposure method, the first exposure process is repeatedly performed, and the second exposure process is started after the first exposure process where it is judged that the determined coefficient of the prediction formula has converged.

2. The exposure method according to claim 1 , wherein the judging is performed based on a comparison between the coefficient determined in the present first exposure process and the coefficient determined in the past first exposure process.

3. The exposure method according to claim 1 , wherein the judging is performed based on a difference between the coefficient obtained in the present first exposure process and the coefficient obtained in the past first exposure process.

4. The exposure method according to claim 1 , wherein the judging is performed based on a difference between a moving average value of the coefficients obtained in the multiple first exposure processes not including the present first exposure process, and a moving average value of the coefficients obtained in the multiple first exposure process including the present first exposure process.

5. The exposure method according to claim 1 , wherein
the optical characteristic includes a plurality of indexes whose time constants are different from each other, and
the plurality of indexes include at least one of an image shift, a focus, a magnification, a distortion aberration, an astigmatism aberration, a spherical aberration, and a coma aberration.

6. The exposure method according to claim 5 , wherein, in the determining, the coefficient of the prediction formula is determined for each index.

7. The exposure method according to claim 5 , wherein
in the determining, the coefficient of the prediction formula is determined for each index, and
the judging is performed based on a difference between a total value of the coefficients obtained for each index in the present first exposure process and a total value of the coefficients obtained for each index in the past first exposure process.

8. The exposure method according to claim 5 , wherein
in the determining, the coefficient of the prediction formula is determined for each index, and
the judging is performed based on a difference between a total value for a moving average value for the coefficients obtained for each index in the multiple first exposure processes not including the present first exposure process, and a total value for a moving average value for the coefficients obtained for each index in the multiple first exposure processes including the present first exposure process.

9. The exposure method according to claim 1 , wherein the second exposure process does not include measuring the optical characteristics, the determining, and the judging.

10. The exposure method according to claim 1 , wherein, in the second exposure process, a substrate is exposed while correcting the optical characteristics based on a result of predicting the optical characteristics using the latest coefficient for when it is judged that the determined coefficient of the prediction formula has converged.

11. An exposure apparatus which repeatedly performs an exposure process for exposing a substrate via a projection optical system, the apparatus comprising:
a measurement device configured to measure optical characteristics of the projection optical system; and
a controller configured to, after repeatedly performing a first exposure process for exposing the substrate while correcting the optical characteristics based on a result of causing the measurement device to measure the optical characteristics, start a second exposure process for exposing the substrate while correcting the optical characteristics based on a result of predicting the optical characteristics in accordance with a prediction formula,
wherein the first exposure process includes determining a coefficient of the prediction formula from a result of measuring the optical characteristics up until the present, and judging whether the determined coefficient of the prediction formula has converged, and
wherein the controller is configured to start the second exposure process after the first exposure process where it is judged that the determined coefficient of the prediction formula converged.

12. A method of manufacturing an article, the method comprising:
exposing a substrate using an exposure method;
developing the exposed substrate; and
processing the developed substrate to manufacture the article,
wherein the exposure method repeatedly performs an exposure process for exposing a substrate via a projection optical system, and includes:
a first exposure process for measuring optical characteristics of the projection optical system, and exposing the substrate while correcting the optical characteristics based on a result of the measurement;
a second exposure process for exposing the substrate while correcting the optical characteristics based on a result of estimating the optical characteristics by a prediction formula,

wherein the first exposure process includes determining a coefficient of the prediction formula from a result of measuring the optical characteristics up until the present, and judging whether the determined coefficient of the prediction formula has converged, and
wherein in the exposure method, the first exposure process is repeatedly performed, and the second exposure process is started after the first exposure process where it is judged that the determined coefficient of the prediction formula has converged.

Assignees

• Canon Kk

Inventors

• Koizumi Ryo
• Nakamura Tadao

Classifications

• G03F7/70483

  Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring · CPC title

• G03F7/70891

  Temperature · CPC title

• G03F7/706

  Aberration measurement · CPC title

• G03F7/705

  Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions · CPC title

• G03F7/70591 Primary

  Testing optical components · CPC title