Capacitive sensor

Patent metadata

Field	Value
Publication number	US-10372280-B2
Application number	US-201715642459-A
Country	US
Kind code	B2
Filing date	Jul 6, 2017
Priority date	Jan 16, 2015
Publication date	Aug 6, 2019
Grant date	Aug 6, 2019

Abstract

A capacitive sensor includes a base material provided with a pattern of a light-transmissive conductive film. The light-transmissive conductive film contains metal nanowires. The pattern includes a detection pattern formed of a plurality of detection electrodes arranged with intervals and a plurality of lead-out wirings linearly extending in a first direction from the corresponding ones of the plurality of the detection electrodes. At least one of the detection electrodes of the detection pattern includes a current path-setting section for elongating the linear path length of the current from the detection electrode toward the lead-out wiring.

First claim

What is claimed is:

1. A capacitive sensor comprising:
a base material provided with a pattern of a light-transmissive conductive film, wherein
the light-transmissive conductive film has a structure in which metal nanowires are dispersed in a binder; and
the pattern includes:
a detection pattern of a plurality of detection electrodes arranged with intervals; and
a plurality of lead-out wirings linearly extending in a first direction from corresponding ones of the plurality of the detection electrodes, wherein
at least one of the detection electrodes of the detection pattern includes a current path-setting section for elongating a linear path length of a current from the detection electrode toward the lead-out wiring;
the current path-setting section includes a slit pattern disposed to obstruct the linear path length of the current;
the current path-setting section includes a plurality of slit patterns having a length of a half or more of the length of the detection electrode and restricting the current path;
the plurality of the slit patterns are disposed parallel to each other;

at least a part of the plurality of the slit patterns inward extends from the end of the detection electrode; and
adjacent ones of the slit patterns restrict the current path at positions different from each other;
the current path-setting section includes a wiring path that allows the path of current flowing from the detection electrode toward the lead-out wiring to meander;
at least one of the detection electrodes including the current path-setting section and the lead-out wiring extending therefrom have a structure in which the metal nanowires are dispersed in a binder and are formed in a detection region;
the plurality of the detection electrodes are arranged in the first direction;
a plurality of pair of one of the detection electrodes and one of the lead-out wirings extending from corresponding one of the detection electrodes are formed so as to be separated from each other;
the plurality of the lead-out wirings in the detection region include an equal-interval region where the lead-out wirings are arrayed with a constant first pitch in a second direction orthogonal to the first direction;
the plurality of the slit patterns have widths equal to the intervals of the plurality of the lead-out wirings; and
the pitch of the plurality of the slit patterns is equal to the first pitch.

2. The capacitive sensor according to claim 1 , wherein
the first direction is a direction toward an external terminal region from the detection pattern; and
the current path-setting section is at least disposed to the detection electrode closest to the external terminal region.

3. The capacitive sensor according to claim 2 , wherein the current path-setting section is disposed to each of the plurality of the detection electrodes.

4. The capacitive sensor according to claim 3 , wherein the metal nanowires include silver nanowires.

5. The capacitive sensor according to claim 2 , wherein the metal nanowires include silver nanowires.

6. The capacitive sensor according to claim 1 , wherein the current path-setting section is disposed to each of the plurality of the detection electrodes.

7. The capacitive sensor according to claim 6 , wherein the metal nanowires include silver nanowires.

8. The capacitive sensor according to claim 1 , wherein the metal nanowires include silver nanowires.

9. A capacitive sensor comprising:
a base material provided with a pattern of a light-transmissive conductive film, wherein
the light-transmissive conductive film contains metal nanowires; and
the pattern includes:
a detection pattern of a plurality of detection electrodes arranged with intervals; and
a plurality of lead-out wirings linearly extending in a first direction from corresponding ones of the plurality of the detection electrodes, wherein
at least one of the detection electrodes of the detection pattern includes a current path-setting section for elongating a linear path length of a current from the detection electrode toward the lead-out wiring;
the current path-setting section includes a slit pattern disposed for obstructing the linear path length of the current; and
the current path-setting section includes a plurality of slit patterns having a length of a half or more of the length of the detection electrode and restricting the current path;

the plurality of the slit patterns are disposed parallel to each other;
at least a part of the plurality of the slit patterns inward extends from the end of the detection electrode;

adjacent ones of the slit patterns restrict the current path at positions different from each other;
the current path-setting section includes a wiring path that allows the path of current flowing from the detection electrode toward the lead-out wiring to meander;
the plurality of the detection electrodes are arranged in the first direction;
a plurality of pair of one of the detection electrodes and one of the lead-out wirings extending from corresponding one of the detection electrodes are formed so as to be separated from each other,
the plurality of the lead-out wirings in the detection region include an equal-interval region where the lead-out wirings are arrayed with a constant first pitch in a second direction orthogonal to the first direction;
the plurality of the slit patterns have widths equal to the intervals of the plurality of the lead-out wirings; and
the pitch of the plurality of the slit patterns is equal to the first pitch.

Assignees

• Alps Alpine Co Ltd

Inventors

• Yamai Tomoyuki
• Bito Mitsuo
• Kitamura Yasuyuki
• Hiraki Yuta
• Ishibashi Setsuo
• Yazawa Manabu

Classifications

• B32B15/02

  Layer formed of wires, e.g. mesh · CPC title

• G06F2203/04112

  Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material · CPC title

• B32B2307/202

  Conductive · CPC title

• H01B7/00

  Insulated conductors or cables characterised by their form · CPC title

• B32B2307/412

  Transparent · CPC title