Method for manufacturing COA array substrate and COA array substrate
US-10114262-B2 · Oct 30, 2018 · US
Array substrate and manufacturing method thereof
US10371999B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10371999-B2 |
| Application number | US-201815989158-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 24, 2018 |
| Priority date | Sep 24, 2015 |
| Publication date | Aug 6, 2019 |
| Grant date | Aug 6, 2019 |
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- Title
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Abstract
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A manufacturing method of an array substrate includes the steps of providing a base plate and forming a thin-film transistor (TFT) layer on the base plate; forming a quantum dot layer on the TFT layer; and forming a protective filter layer on the quantum dot layer to provide protection to the quantum dot layer. The protective filter layer also provides an effect of light filtering in order to prevent ultraviolet light or blue light from transmitting therethrough.
First claim
Opening claim text (preview).
What is claimed is: 1. An array substrate manufacturing method, comprising the following steps: (1) providing a base plate and forming a thin-film transistor (TFT) layer on the base plate; (2) forming a quantum dot layer on the TFT layer; and (3) forming a protective filter layer on the quantum dot layer, wherein the protective filter layer provides an effect of light filtering so as to prevent ultraviolet light or blue light within a predetermined waveband from transmitting therethrough, and further comprising the following step: (4) forming a color filter layer on the protective layer. 2. The array substrate manufacturing method as claimed in claim 1 , wherein Step 2 is specifically performed by applying a vapor deposition process to form a quantum dot film on the TFT layer so as to form the quantum dot layer. 3. The array substrate manufacturing method as claimed in claim 1 , wherein Step 2 is specifically performed by providing a quantum dot material and a dissolving medium, dissolving and dispersing the quantum dot material in the dissolving medium and uniformly mixed to form a quantum dot paste, and applying the quantum dot paste to form a film on the TFT layer and drying and curing to obtain the quantum dot layer. 4. The array substrate manufacturing method as claimed in claim 3 , wherein in Step 2, the quantum dot material is oil soluble or water soluble; the quantum dots are in the form of spheres, bars, or fibrous forms; the dissolving medium is silica series or epoxy series; and in Step 2 the quantum dot paste is applied to the TFT layer to form the film by means of spray coating, spin coating, printing, or slot-die coating.
Assignees
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Classifications
Protective arrangements · CPC title
Illumination with ultraviolet light; Luminescent elements or materials associated to the cell · CPC title
- G02F1/1362Primary
Active matrix addressed cells {(G02F1/134336, G02F1/134363 take precedence)} · CPC title
in which the switching element is a three-electrode device {(G02F1/136277 takes precedence)} · CPC title
UV absorbing · CPC title
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- What does patent US10371999B2 cover?
- A manufacturing method of an array substrate includes the steps of providing a base plate and forming a thin-film transistor (TFT) layer on the base plate; forming a quantum dot layer on the TFT layer; and forming a protective filter layer on the quantum dot layer to provide protection to the quantum dot layer. The protective filter layer also provides an effect of light filtering in order to p…
- Who is the assignee on this patent?
- Shenzhen China Star Optoelect
- What technology area does this patent fall under?
- Primary CPC classification G02F1/1362. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 06 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).