Ozone abatement system for semiconductor manufacturing system

US10369510B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10369510-B2
Application numberUS-201615216063-A
CountryUS
Kind codeB2
Filing dateJul 21, 2016
Priority dateJan 14, 2014
Publication dateAug 6, 2019
Grant dateAug 6, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus and method for abating ozone and reducing sulfuric acid from an exhaust stream. In a semiconductor manufacturing plant the processing of wafers involves the cleaning and etching of wafers, the resultant processing may produce gasses which must be abated. The apparatus and method utilizes UV light in high doses to convert ozone (O3) to oxygen (O2). By ensuring laminar flow through the UV light chambers, the efficiency of the system is sufficient to allow for the remaining impurities in the exhaust air to be removed through the use of an RTO.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus comprising: a first ozone abatement chamber comprising inner surfaces coated with a reflective material and a first series of laminar flow plates to ensure laminar flow through the first ozone abatement chamber; a second ozone abatement chamber connected in series with the first ozone abatement chamber, the second ozone abatement chamber comprising inner surfaces coated with the reflective material and a second series of laminar flow plates to ensure laminar flow through the second ozone abatement chamber; an inlet connected to the first ozone abatement chamber and adapted to accept exhaust air from an exhaust duct; a third series of laminar flow plates positioned between the first ozone abatement chamber and the second ozone abatement chamber to maintain laminar flow of the exhaust air between the first ozone abatement chamber and the second ozone abatement chamber; a fourth series of laminar flow plates positioned between the inlet and the first ozone abatement chamber to further ensure laminar flow of the exhaust air as it enters the first ozone abatement chamber; and an air port connected to the exhaust duct for adding bleed air to dilute the exhaust air, wherein at least the first series of laminar flow plates and the second series of laminar flow plates are coated with the reflective material, wherein the first, the second, the third and the fourth series of laminar flow plates are all positioned perpendicular to a flow direction of the exhaust air. 2. The apparatus of claim 1 , wherein the first series of laminar flow plates, the second series of laminar flow plates, the third series of laminar flow plates, and the fourth series of laminar flow plates are perforated with a plurality of equidistant holes. 3. The apparatus of claim 1 , wherein each of the first ozone abatement chamber and the second ozone abatement chamber further comprise one or more UV lamps outside the flow of the exhaust air, wherein the one or more UV lamps produce at least 400 watts of UV light per ozone abatement chamber. 4. The apparatus of claim 1 , wherein the first series of laminar flow plates, the second series of laminar flow plates, the third series of laminar flow plates, and the fourth series of laminar flow plates are each at least 0.625 inches thick with a plurality of equidistant holes. 5. The apparatus of claim 1 , wherein the reflective material is polytetrafluoroethylene. 6. The apparatus of claim 1 , further comprising: a plurality of dampers to direct the flow of the exhaust air through, only the first ozone abatement chamber and not the second ozone abatement chamber, through only the second ozone abatement chamber and not the first ozone abatement chamber, or through both the first ozone abatement chamber and the second ozone abatement chamber. 7. An apparatus comprising: a first ozone abatement chamber comprising a first central chamber through which exhaust air passes and one or more UV lamps housed in one or more doors, inner surfaces of both the first central chamber and the one or more doors are coated with a reflective material, the one or more doors are situated exterior to the first central chamber and outside a flow path of the exhaust air through the first central chamber, the first central chamber comprising a first series of laminar flow plates to ensure laminar flow through the first central chamber; a second ozone abatement chamber comprising a second central chamber through which the exhaust air passes and one or more UV lamps housed in one or more doors, inner surfaces of both the second central chamber and the one or more doors are coated with the reflective material, the one or more doors are situated exterior to the second central chamber and outside the flow path of the exhaust air through the second central chamber, the second central chamber comprising a second series of laminar flow plates to ensure laminar flow through the second central chamber, wherein at least the first series of laminar flow plates and the second series of laminar flow plates are coated with the reflective material; an inlet connected to the first ozone abatement chamber and adapted to accept the exhaust air from an exhaust duct; a third series of laminar flow plates positioned between the first ozone abatement chamber and the second ozone abatement chamber to maintain laminar flow of the exhaust air between the first ozone abatement chamber and the second ozone abatement chamber; and a fourth series of laminar flow plates positioned between the inlet and the first ozone abatement chamber to further ensure laminar flow of the exhaust air as it enters the first ozone abatement chamber; and an air port connected to the exhaust duct for adding bleed air to dilute the exhaust air, wherein the first series of laminar flow plates, the second series of laminar flow plates, the third series of laminar flow plates and the fourth series of laminar flow plates are all positioned perpendicular to a flow direction of the exhaust air. 8. The apparatus of claim 7 , wherein the first series of laminar flow plates, the second series of laminar flow plates, the third series of laminar flow plates, and the fourth series of laminar flow plates are at least 0.625 inches thick and are perforated with a plurality of equidistant holes. 9. The apparatus of claim 7 , wherein the one or more UV lamps produce at least 400 watts of UV light per ozone abatement chamber. 10. The apparatus of claim 7 , wherein the reflective material is polytetrafluoroethylene. 11. The apparatus of claim 7 , further comprising: a plurality of dampers to direct the flow of the exhaust air through, only the first ozone abatement chamber and not the second ozone abatement chamber, through only the second ozone abatement chamber and not the first ozone abatement chamber, or through both the first ozone abatement chamber and the second ozone abatement chamber. 12. The apparatus of claim 7 , further comprising: a regenerative thermal oxidizer connected in series with the first ozone abatement chamber and the second ozone abatement chamber such that the exhaust air exiting the second ozone abatement chamber directly enters the regenerative thermal oxidizer. 13. An apparatus comprising: an ozone abatement chamber comprising a central chamber through which exhaust air passes and one or more UV lamps housed in one or more doors, inner surfaces of both the central chamber and the one or more doors are coated with a reflective material, the one or more doors are situated exterior to the central chamber and outside the flow of the exhaust air through the central chamber, the central chamber comprising a first series of laminar flow plates to ensure laminar flow through the central chamber, wherein at least the first series of laminar flow plates are coated with the reflective material; an inlet connected to the ozone abatement chamber and adapted to accept the exhaust air from an exhaust duct; a second series of laminar flow plates positioned between the inlet and the ozone abatement chamber to further ensure laminar flow of the exhaust air as it enters the ozone abatement chamber, wherein the first series of laminar flow plates and the second series of laminar flow plates are positioned perpendicular to a flow direction of the exhaust air; and a regenerative thermal oxidizer connected in series with the ozone abatement chamber such that the exhaust air exiting the ozone abatement chamber directly enters the regenerative thermal oxidizer; and an air port connected to the exhaust duct for adding bleed air to dilute the exhaust air. 14. The apparatus of

Assignees

Inventors

Classifications

  • Flow affected by fluid contact, energy field or coanda effect [e.g., pure fluid device or system] · CPC title

  • Ozone · CPC title

  • B01D53/007Primary

    by irradiation · CPC title

  • using regenerative heat recovery means · CPC title

  • from CVD treatment or semi-conductor manufacturing · CPC title

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What does patent US10369510B2 cover?
An apparatus and method for abating ozone and reducing sulfuric acid from an exhaust stream. In a semiconductor manufacturing plant the processing of wafers involves the cleaning and etching of wafers, the resultant processing may produce gasses which must be abated. The apparatus and method utilizes UV light in high doses to convert ozone (O3) to oxygen (O2). By ensuring laminar flow through t…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification B01D53/007. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 06 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).