Composition and method of producing siliceous film

Patent metadata

Field	Value
Publication number	US-10364372-B2
Application number	US-201715856659-A
Country	US
Kind code	B2
Filing date	Dec 28, 2017
Priority date	Jan 13, 2017
Publication date	Jul 30, 2019
Grant date	Jul 30, 2019

Abstract

A composition capable of stably providing a high-quality siliceous film even under relatively low-temperature heating conditions, and a method of using the composition for forming a siliceous film. The composition includes a polysilazane and an imidazole group-containing compound represented by Formula (B).

First claim

What is claimed is:

1. A composition comprising:
a polysilazane (A); and
an imidazole group-containing compound (B) represented by Formula (B):

wherein Ar is an optionally substituted aromatic group; R b1 is a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonate group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, or an organic group; Y is an imidazole ring represented by Formula (B-y) or a hydrogen atom; Z is an imidazole ring represented by Formula (B-y) or a group represented by —OR b3 ; Y or Z is the imidazole ring; and
is a single bond when Y is the imidazole ring and is a carbon-carbon double bond when Z is the imidazole ring, and R b3 is a hydrogen atom or an organic group,

wherein the symbol * represents a bond that binds to a carbon atom adjacent to Y or Z in Formula (B); R b2 s are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonate group, a phosphino group, a phosphinyl group, a phosphonate group, or an organic group.

2. The composition according to claim 1 , wherein the imidazole group-containing compound (B) is a compound represented by Formula (B1-1):

wherein R b1 and R b2 are synonymous with those in Formula (B); R b4 to R b7 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonate group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, an amino group, an ammonio group, or an organic group; and R b8 is a hydrogen atom or an organic group.

3. The composition according to claim 1 , wherein the polysilazane (A) includes a structural unit represented by Formula (A1) in the structure

4. The composition according to claim 1 , further comprising an organic phosphorus compound (C).

5. A method of producing a siliceous film, comprising:
preparing a substrate and a composition according to claim 1 ;
applying the composition onto the substrate; and
heating the substrate applied with the composition.

6. The method of producing a siliceous film according to claim 5 , wherein the substrate is heated at 100° C. or more and 700° C. or less.

7. The method of producing a siliceous film according to claim 5 , wherein the siliceous film comprises an insulating film, a passivation film, a planarizing film, or a hard mask.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Fujii Yasushi
• Noda Kunihiro
• Chisaka Hiroki
• Someya Kazuya
• Misumi Koichi
• Shiota Dai

Classifications

• H10P14/6689

  the compound being a silazane · CPC title

• H10P14/6529

  by exposure to a gas or vapour · CPC title

• H10P14/6522

  introduced into a nitride material, e.g. changing SiN to SiON · CPC title

• H10P14/6516

  of treatments performed after formation of the materials · CPC title

• H10P14/6342

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title