Method of forming ceramic material containing aluminum particles
US-10000421-B2 · Jun 19, 2018 · US
US10364192B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10364192-B2 |
| Application number | US-201815917127-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 9, 2018 |
| Priority date | Mar 18, 2016 |
| Publication date | Jul 30, 2019 |
| Grant date | Jul 30, 2019 |
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A Ca—SiAlON ceramic with enhanced mechanical properties and a method employing micron-sized and submicron precursors to form the Ca—SiAlON ceramic. The Ca—SiAlON ceramic comprises not more than 42 wt % silicon, relative to the total weight of the Ca—SiAlON ceramic. The method employs submicron particles and also allows for substituting a portion of aluminum nitride with aluminum to form the Ca—SiAlON ceramic with enhanced mechanical properties.
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The invention claimed is: 1. A process for forming a sintered Ca-SiAlON ceramic containing aluminum particles, comprising: mixing calcium oxide; silicon nitride; alumina; aluminum nitride; and 1.8 wt % to 10 wt % of aluminum particles to form a powder mixture, wherein wt % is based on the total weight of the powder mixture; spark plasma sintering the powder mixture under a uniaxial pressure of from 20 to 55 MPa to form the sintered Ca-SiAlON ceramic; and cooling the sintered Ca-SiAlON ceramic to a temperature ranging from 20-40° C. 2. The process of claim 1 , wherein the spark plasma sintering is performed in an atmosphere consisting essentially of nitrogen gas. 3. The process of claim 1 , wherein the mixing is at least one of sonication and ball milling. 4. The process of claim 1 , wherein the mixing proceeds for 10-30 minutes. 5. The process of claim 1 , wherein the calcium oxide is in the form of particles with a diameter ranging from 1-200 nm. 6. The process of claim 1 , wherein an amount of the silicon nitride ranges from 40 wt % to less than 80 wt % relative to a total weight of the powder mixture. 7. The process of claim 1 , wherein the silicon nitride is α-Si 3 N 4 and in the form of particles with a diameter ranging from 1-200 nm. 8. The process of claim 1 , wherein the silicon nitride is amorphous and in the form of particles with a diameter ranging from 1-100 nm. 9. The process of claim 1 , wherein the alumina is in the form of particles with a diameter ranging from 1-200 nm. 10. The process of claim 1 , wherein the aluminum nitride is in the form of particles with a diameter ranging from 1-200 nm. 11. The process of claim 1 , wherein the aluminum particles have a diameter ranging from 10-100 μm. 12. The process of claim 1 , wherein the spark plasma sintering is performed at a temperature ranging from 1400-1600° C. 13. The process of claim 1 , wherein the spark plasma sintering comprises heating the powder mixture at a rate ranging from 5-600° C./min. 14. The process of claim 1 , wherein the spark plasma sintering comprises heating the powder mixture at a rate ranging from 90-110° C./min.
nanometer sized, i.e. below 100 nm · CPC title
Heating rate · CPC title
Hexagonal symmetry, e.g. beta-Si3N4, beta-Sialon, alpha-SiC or hexa-ferrites · CPC title
Alpha silicon nitrides · CPC title
Pressure sintering · CPC title
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