UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby

Patent metadata

Field	Value
Publication number	US-10358565-B2
Application number	US-201515514419-A
Country	US
Kind code	B2
Filing date	Sep 30, 2015
Priority date	Sep 26, 2014
Publication date	Jul 23, 2019
Grant date	Jul 23, 2019

Abstract

The present invention relates to a UV-curable ink composition, a method for producing a bezel pattern of a display substrate using same, and a bezel pattern produced thereby, the UV-curable ink composition comprising a colorant, an epoxy compound, an oxetane compound and a photopolymerization initiator, wherein the content ratio of the epoxy compound to the oxetane compound is 1:0.5-1:6.

First claim

The invention claimed is:

1. A UV-curable ink composition for forming a bezel pattern comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, and a surfactant,
wherein a content ratio of the epoxy compound to the oxetane compound is 1:3.45 to 1:6,
wherein the oxetane compound comprises an oxetane compound having one oxetane ring and an oxetane compound having two oxetane rings,
wherein a content ratio of the oxetane compound having one oxetane ring to the oxetane compound having two oxetane rings is 1:5.9 to 1:16, and
wherein the UV-curable ink composition has a taper angle of 0° to 10° after being cured.

2. The UV-curable ink composition of claim 1 , further comprising one or more selected from the group consisting of an adhesion promoter, a diluent, and a photosensitizer.

3. The UV-curable composition of claim 2 , wherein a content of the diluent is 0 to 30 wt % based on the total weight of the UV-curable ink composition.

4. The UV-curable composition of claim 2 , wherein the photosensitizer is contained in an amount of 1 to 200 parts by weight based on 100 parts by weight of the photopolymerization initiator.

5. The UV-curable composition of claim 2 , wherein the adhesion promoter is a epoxy silane-based compound.

6. The UV-curable composition of claim 2 , wherein the adhesion promoter is contained in an amount of 0.1 to 15 wt % based on the total weight of the UV-curable ink composition.

7. The UV-curable composition of claim 1 , wherein a content of the epoxy compound is 5 to 60 wt % with respect to the total weight of the UV-curable ink composition.

8. The UV-curable composition of claim 1 , wherein a content of the oxetane compound is 15 to 80 wt % with respect to the total weight of the UV-curable ink composition.

9. The UV-curable composition of claim 1 , wherein the photopolymerization initiator is an iodonium salt or a sulfonium salt.

10. The UV-curable composition of claim 1 , wherein a content of the photopolymerization initiator is 1 to 15 wt % based on the total weight of the UV-curable ink composition.

11. The UV-curable composition of claim 1 , wherein a content of the colorant is 1 to 15 wt % based on the total weight of the UV-curable ink composition.

12. The UV-curable composition of claim 1 , wherein the surfactant is a silicone-based, fluorine-based or acrylic surfactant.

13. The UV-curable composition of claim 1 , wherein a content of the surfactant is 0.1 to 5.0 wt % based on the total weight of the UV-curable ink composition.

14. The UV-curable composition of claim 1 , wherein a dose for curing the UV-curable ink composition is 1 to 10,000 mJ/cm 2 .

15. The UV-curable composition of claim 1 , wherein the UV-curable ink composition has a viscosity of 1 cp to 50 cp at 25° C.

16. The UV-curable composition of claim 15 , wherein the UV-curable ink composition has a viscosity of 3 cp to 45 cp at 25° C.

17. The UV-curable composition of claim 1 , which the ultraviolet-curable ink composition is able to be cured by absorbing radiation in the wavelength range of 250 nm to 450 nm.

18. The UV-curable composition of claim 17 , which the ultraviolet-curable ink composition is able to be cured by absorbing radiation in the wavelength range of 360 nm to 410 nm.

19. A method for producing a bezel pattern for a display substrate, comprising:
a) forming a bezel pattern on a substrate by using the UV-curable ink composition of claim 1 ; and
b) curing the bezel pattern.

20. The method of claim 19 , further comprising cleaning and drying the substrate prior to a) the forming of the bezel pattern.

21. The method of claim 20 , wherein the cleaning and drying of the substrate is carried out by one or more treatments selected from the group consisting of a wet surface treatment, a UV ozone treatment, and a normal pressure plasma treatment.

22. The method of claim 19 , wherein the method of forming the bezel pattern on the substrate in Step a) is a method selected from an inkjet printing, a gravure coating, and a reverse offset coating.

23. The method of claim 19 , wherein Step a) is carried out at a process temperature of 10° C. to 100° C.

24. The method of claim 23 , wherein Step a) is carried out at a process temperature of 20° C. to 70° C.

25. The method of claim 19 , wherein the bezel pattern in Step b) is cured by absorbing radiation in the wavelength range of 250 nm to 450.

26. The method of claim 25 , wherein the bezel pattern in Step b) is cured by absorbing radiation in the wavelength range of 360 nm to 410.

27. The method of claim 19 , wherein the bezel pattern has a thickness of 0.1 μm to 20 μm.

28. The method of claim 27 , wherein the bezel pattern has a thickness of 0.5 μm to 5 μm.

29. The method of claim 19 , wherein the bezel pattern has a taper angle of 0° to 30°.

30. The method of claim 29 , wherein the bezel pattern has a taper angle of 0° to 10°.

31. The method of claim 19 , wherein the bezel pattern has an OD value of 0.05 to 2.5 per a film thickness of 1.0 μm.

32. A bezel pattern for a display substrate, which is formed on a substrate by curing the UV-curable ink composition of claim 1 .

33. The bezel pattern of claim 32 , wherein the bezel pattern has a thickness of 0.1 μm to 20 μm.

34. The bezel pattern of claim 33 , wherein the bezel pattern has a thickness of 0.5 μm to 5 μm.

35. The bezel pattern of claim 32 , wherein the bezel pattern has a taper angle of 0° to 30°.

36. The bezel pattern of claim 35 , wherein the bezel pattern has a taper angle of 0° to 10°.

37. The bezel pattern of claim 32 , wherein the bezel pattern has an OD value of 0.05 to 2.5 per a film thickness of 1.0 μm.

Assignees

• Lg Chemical Ltd

Inventors

• Park Sung-Eun
• Goo Yong-Sung
• Back Seung-A
• Kim Joon-Hyung

Classifications

• C09D11/037

  characterised by the pigment · CPC title

• H05K2203/0534

  Offset printing, i.e. transfer of a pattern from a carrier onto the substrate by using an intermediate member · CPC title

• C09D11/324

  containing carbon black · CPC title

• G09F9/00

  Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements (in which the variable information is permanently attached to a movable support G09F11/00; abacus G06C1/00; slide-rules G06G1/00) · CPC title

• B41F17/006

  for printing on curved surfaces not otherwise provided for · CPC title