Seed layer for low-e applications
US-2015345005-A1 · Dec 3, 2015 · US
US10358385B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10358385-B2 |
| Application number | US-201414894420-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 28, 2014 |
| Priority date | May 30, 2013 |
| Publication date | Jul 23, 2019 |
| Grant date | Jul 23, 2019 |
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The invention relates to heat treatable solar control glazing showing low-emissivity properties, and possibly also anti-solar properties and methods to manufacture such glazing. They comprise a transparent substrate coated with a stack of thin layers comprising n functional layer(s) reflecting infrared radiation and n+1 dielectric layers, with n≥1, each functional layer being surrounded by dielectric layers. At least one dielectric layer above a functional layer comprises a layer consisting essentially of silicon oxide, preferably deposited by PECVD, and the stack comprises a barrier layer based on zinc oxide above and in direct contact with any functional layer which has a silicon oxide layer in the dielectric layer directly above it.
Opening claim text (preview).
The invention claimed is: 1. A glazing comprising: a transparent substrate coated with a stack of layers comprising n functional layer(s) reflecting infrared radiation and n+1 dielectric layers, with n≥1, each functional layer being surrounded by dielectric layers, wherein at least one dielectric layer above a functional layer comprises a layer consisting essentially of silicon oxide and in that the stack comprises a barrier layer based on zinc oxide above and in direct contact with any functional layer which has a silicon oxide layer in the dielectric layer directly above it, wherein the layer consisting essentially of silicon oxide is obtained by plasma enhanced chemical vapour deposition (PECVD). 2. The glazing according to claim 1 , wherein the layer consisting essentially of silicon oxide has a thickness of more than 10 nm. 3. The glazing according to claim 1 , wherein the stack comprises a barrier layer based on zinc oxide above and in direct contact with each functional layer. 4. The glazing according to claim 1 , wherein the barrier layer(s) consists (consist) of zinc oxide, optionally doped with aluminium. 5. The glazing according to claim 1 , wherein the barrier layer(s) has (have) a thickness of at most 35 nm. 6. The glazing according to claim 1 , wherein the first dielectric layer starting from the substrate comprises a layer of an oxide in direct contact with the substrate. 7. The glazing according to claim 6 , wherein the layer of an oxide which is in direct contact with the substrate is a layer of zinc-tin mixed oxide or a layer of titanium oxide. 8. The glazing according to claim 6 , wherein the layer of an oxide which is in direct contact with the substrate has a thickness of at least 10 nm. 9. The glazing according to claim 1 , wherein the functional layer reflecting infrared radiation is a silver-based layer. 10. The glazing according to claim 1 , wherein each dielectric layer under a functional layer comprises a layer based on zinc oxide, directly in contact with said functional layer. 11. The glazing according to claim 10 , wherein the layer based on zinc oxide has a thickness of at most 15 nm. 12. The glazing according to claim 10 , wherein the layer based on zinc oxide has a thickness of between 1 and 10 nm. 13. The glazing according to claim 1 , wherein at least one dielectric layer above a functional layer comprises, between a barrier layer based on zinc oxide and a layer consisting essentially of silicon oxide, at least one layer of a metal oxide different from the barrier layer and from the layer consisting essentially of silicon oxide. 14. The glazing according to claim 1 , wherein the last dielectric layer comprises, between a barrier layer based on zinc oxide and a layer consisting essentially of silicon oxide, at least one layer of zinc-tin mixed oxide or of titanium oxide. 15. The glazing according to claim 1 , wherein the layer consisting essentially of silicon oxide has an extinction coefficient at a wavelength of 632 nm below 1E-4, a refractive index of at least 1.466 and a carbon content of at most 3%. 16. The glazing according to claim 1 , wherein the barrier layer(s) has (have) a thickness of between 1 and 25 nm. 17. The glazing according to claim 1 , wherein after a heat treatment carried out at 730° C. for 3 min. and 15 seconds, the glazing has a brush test score (AB Brush) of no greater than 2.25 and has a haze test value (AB Haze) of no greater than 0.28. 18. The glazing according to claim 1 , wherein the PECVD utilizes a hollow-cathode source or a microwave source. 19. The glazing according to claim 1 , wherein the PECVD utilizes a hollow-cathode source. 20. The glazing according to claim 1 , wherein n=1 or 2.
Low-emissivity or solar control coatings · CPC title
the metal being silver · CPC title
Multilayers containing at least two functional metal layers · CPC title
Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic · CPC title
the multilayer coating being used in glazing, e.g. windows or windscreens · CPC title
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