Magnetoresistance effect element

Patent metadata

Field	Value
Publication number	US-10355202-B2
Application number	US-201715712661-A
Country	US
Kind code	B2
Filing date	Sep 22, 2017
Priority date	Sep 29, 2016
Publication date	Jul 16, 2019
Grant date	Jul 16, 2019

Abstract

A magnetoresistance effect element configured to produce magnetoresistance (MR) ratio higher than that of tunnel magneto resistance (TMR) element using tunnel barrier in the related art under a high bias voltage is provided. A magnetoresistance effect element which includes a laminate in which: an underlayer; a first ferromagnetic metal layer; tunnel barrier layer; and second ferromagnetic metal layer are laminated in this order, wherein the underlayer is made of VN, TaN, or mixed crystals thereof, and the tunnel barrier layer is made of compound which has a spinel structure in which the arrangement of cations is disordered and is represented by the following composition formula (1) is provided: (1) AxB2Oy, where A represents divalent cations of two or more types of non-magnetic element, B represents an aluminum ion, x represents number which satisfies 0<x≤2, and y represents a number which satisfies 0<y≤4.

First claim

What is claimed is:

1. A magnetoresistance effect element comprising a laminate in which:
an underlayer;
a first ferromagnetic metal layer; a tunnel barrier layer; and
a second ferromagnetic metal layer are laminated in this order, wherein the underlayer is made of VN, TiN, or mixed crystals thereof, and
the tunnel barrier layer is made of a compound which has a spinel structure in which the arrangement of cations is disordered and is represented by a following composition formula (1):
A x B2O y   (1)

where A represents divalent cations of two or more types of non-magnetic element,
B represents an aluminum ion,
x represents a number which satisfies 0<x≤2, and y represents a number which satisfies 0<y≤4,
wherein the tunnel barrier layer comprises: a lattice-matched portion which lattice-matches with both of the first ferromagnetic metal layer and the second ferromagnetic metal layer;
and a lattice-mismatched portion which is free of a lattice-matching with at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer, and wherein, when viewed as an inverse Fourier transform image in a stacking direction of a cross-section TEM image of the interface between the tunnel barrier layer and the first and/or the second ferromagnetic metal layer, a lattice-matched portion is made up of a plurality of sequential, continuously-connected lattice lines, and a lattice-mismatched portion is made up of a plurality of sequential, non-continuously-connected lattice lines and/or no lattice lines.

2. The magnetoresistance effect element according to claim 1 , wherein a size of the lattice-matched portion of the tunnel barrier layer in a direction parallel to a film surface is 30 nm or less.

3. The magnetoresistance effect element according to claim 1 , wherein an element having a largest ionic radius among elements contained in divalent cations of the non-magnetic elements is contained in a proportion of 12.5 to 90% in the divalent cations of the non-magnetic elements.

4. The magnetoresistance effect element according to claim 1 , wherein the tunnel barrier layer has a cubic crystal structure as a basic structure.

5. The magnetoresistance effect element according to claim 1 , wherein each of the divalent cations of the non-magnetic elements is a cation of any element selected from the group consisting of Mg, Zn, Cd, Ag, Pt, and Pb.

6. The magnetoresistance effect element according to claim 1 , wherein coercivity of the second ferromagnetic metal layer is larger than coercivity of the first ferromagnetic metal layer.

7. The magnetoresistance effect element according to claim 1 , wherein at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer has magnetic anisotropy which is perpendicular to a lamination direction.

8. The magnetoresistance effect element according to claim 1 , wherein at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer is Co 2 Mn 1−a Fe a Al b Si 1−b (0≤a≤1 and 0≤b≤1).

9. The magnetoresistance effect element according to claim 1 , wherein a film thickness of the tunnel barrier layer is 1.7 nm or more and 3.0 nm or less.

10. The magnetoresistance effect element according to claim 1 , wherein a film thickness of the underlayer is 1.0 nm or more and 20.0 nm or less.

11. The magnetoresistance effect element according to claim 1 , wherein each of the divalent cations of the non-magnetic elements is a cation of any element selected from the group consisting of Mg, Zn, Cd, Ag, Pt, and Pb.

12. The magnetoresistance effect element according to claim 2 , wherein each of the divalent cations of the non-magnetic elements is a cation of any element selected from the group consisting of Mg, Zn, Cd, Ag, Pt, and Pb.

13. The magnetoresistance effect element according to claim 3 , wherein each of the divalent cations of the non-magnetic elements is a cation of any element selected from the group consisting of Mg, Zn, Cd, Ag, Pt, and Pb.

14. The magnetoresistance effect element according to claim 4 , wherein each of the divalent cations of the non-magnetic elements is a cation of any element selected from the group consisting of Mg, Zn, Cd, Ag, Pt, and Pb.

15. The magnetoresistance effect element according to claim 1 , wherein a film thickness of the underlayer is 1.0 nm or more and 20.0 nm or less.

16. The magnetoresistance effect element according to claim 2 , wherein a film thickness of the underlayer is 1.0 nm or more and 20.0 nm or less.

17. The magnetoresistance effect element according to claim 5 , wherein a film thickness of the underlayer is 1.0 nm or more and 20.0 nm or less.

18. The magnetoresistance effect element according to claim 11 , wherein a film thickness of the underlayer is 1.0 nm or more and 20.0 nm or less.

19. The magnetoresistance effect element according to claim 12 , wherein a film thickness of the underlayer is 1.0 nm or more and 20.0 nm or less.

Assignees

• Tdk Corp

Inventors

• Sasaki Tomoyuki

Classifications

• H01L43/02

  Electricity · mapped topic

• H01L27/222

  Electricity · mapped topic

• H01L43/08

  Electricity · mapped topic

• H01L45/06

  Electricity · mapped topic

• H01L43/10 Primary

  Electricity · mapped topic