Sacrificial shorting straps for superconducting qubits
US-2016343934-A1 · Nov 24, 2016 · US
US10355193B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10355193-B2 |
| Application number | US-201715823675-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 28, 2017 |
| Priority date | Nov 28, 2017 |
| Publication date | Jul 16, 2019 |
| Grant date | Jul 16, 2019 |
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A quantum bit (qubit) flip chip assembly may be formed when a qubit it formed on a first chip and an optically transmissive path is formed on a second chip. The two chips may be bonded using solder bumps. The optically transmissive path may provide optical access to the qubit on the first chip.
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What is claimed is: 1. A method for forming a quantum bit (qubit) flip-chip assembly, the method comprising: forming a qubit on a first chip; forming an optically transmissive path in a second chip; and bonding the first chip to the second chip; and wherein the optically transmissive path is located above the qubit. 2. The method of claim 1 , wherein the path has an aperture with a diameter large enough to allow for treatment of the qubit. 3. The method of claim 1 , wherein the optically transmissive path has an aperture of 100 microns or less. 4. The method of claim 1 , further comprising laser annealing the qubit by applying a laser through a surface of the qubit chip that is opposite the second chip. 5. The method of claim 1 , further comprising ion etching the qubit. 6. The method of claim 1 , wherein the forming the optically transmissive path comprises drilling, using a high-power laser beam, the second chip to form a through-hole in the second chip. 7. The method of claim 6 , wherein the etching comprises deep-reactive ion etching. 8. The method of claim 6 , wherein the etching comprises a chemical etch, and wherein the chemical etch is a tetramethylammonium hydroxide (TMAH) etch. 9. The method of claim 1 , wherein the forming the optically transmissive path comprises etching a through-hole in the second chip. 10. The method of claim 1 , wherein the second chip comprises a transparent substrate. 11. The method of claim 10 , wherein the transparent substrate is Magnesiumoxide (MgO). 12. A flip chip apparatus comprising: a first chip comprising a qubit; a second chip bonded to the first chip, wherein the first chip and the second chip are bonded by a plurality of solder bumps; and wherein an optically transmissive path in the second chip provides for optical access to the qubit on the first chip. 13. The apparatus of claim 12 , wherein the second chip comprises a transparent substrate. 14. The apparatus of claim 13 , wherein the transparent substrate is sapphire. 15. The apparatus of claim 12 , wherein the optically transmissive path has a diameter large enough to allow for treatment of one or more of the plurality of qubits. 16. The apparatus of claim 12 , wherein the qubit is accessible for laser annealing via the optically transmissive path. 17. The apparatus of claim 12 , wherein the optically transmissive path of the second chip is aligned with the qubit on the first chip. 18. The apparatus of claim 12 , wherein the optically transmissive path is formed with a chemical etch. 19. The apparatus of claim 12 , wherein the optically transmissive path is formed using a high-power laser beam. 20. The apparatus of claim 12 , wherein the first chip is comprised of a transparent substrate.
between stacked chips · CPC title
characterised by the through-semiconductor vias [TSVs] in the stacked chips · CPC title
optical coupling · CPC title
Soldering or alloying · CPC title
Compression bonding, e.g. thermocompression bonding · CPC title
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