System for detecting counterfeit goods and method of operating the same
US-2016327660-A1 · Nov 10, 2016 · US
Radiographic and computed tomography inspection anti-counterfeit security
US10354768B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10354768-B2 |
| Application number | US-201715402577-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 10, 2017 |
| Priority date | Jan 10, 2017 |
| Publication date | Jul 16, 2019 |
| Grant date | Jul 16, 2019 |
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Abstract
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A structure for preventing a scan by a beam is provided. The structure includes a primary material forming the structure. The primary material includes a first mass attenuation coefficient enabling the primary material to be penetrated by the beam. The structure also includes a matrix of dense particles within the primary material. The dense particles include secondary materials different than the primary material. The secondary materials comprise a subsequent mass attenuation coefficient that is greater than the first mass attenuation coefficient of the primary material. The subsequent mass attenuation coefficient enables the dense particles to attenuate the beam to distort the scan.
First claim
Opening claim text (preview).
What is claimed is: 1. A structure for preventing a scan by a beam, the structure comprising: a primary material forming the structure, the primary material comprising a first mass attenuation coefficient enabling the primary material to be penetrated by the beam; and a matrix of particles within the primary material to provide scattering or attenuating of the beam to distort the scan, wherein the particles comprise one or more secondary materials different than the primary material, wherein the one or more secondary materials comprises a plurality of crystal particles distributed in three-dimensional modified matrix with a varying number of the plurality of crystal particles located in offset positions and with a varying number of grouped particles, a subset of the plurality of crystal particles comprising oblong shaped crystal particles, and a second subset of the plurality of crystal particles comprises round sphered crystal particles, wherein the one or more secondary materials comprises at least one subsequent mass attenuation coefficient that is greater than the first mass attenuation coefficient of the primary material, and wherein the at least one subsequent mass attenuation coefficient enables the particles to scatter or attenuate the beam to distort the scan comprising the varying number of the grouped particles being positioned within the structure to prevent a view of a design feature or internal component to the structure by the scan, wherein the matrix of particles comprises one or more gaps to enable geometric dimensioning and tolerancing measurements and inspection of critical areas of the structure, one or more vacant areas that include no particles to reveal a view of a first design feature of the structure, one or more secondary materials located in at least one cluster implemented to distort a view of a second design feature of the structure, and one or more vacant areas that include no particles to mislead a scan and analysis of the view of the first and second design features. 2. The structure of claim 1 , wherein the primary material comprises aluminum and the one or more secondary materials comprises tungsten, copper, nickel, or iron. 3. The structure of claim 1 , wherein the matrix of particles is uniform. 4. The structure of claim 1 , wherein the matrix of particles comprises one or more secondary materials located in offset positions. 5. The structure of claim 1 comprises a component, a part, or a tool utilized in an electro-mechanical system of an aircraft. 6. The structure of claim 1 , wherein the primary material is layered via additive manufacturing technologies to form the structure. 7. The structure of claim 1 , wherein the primary material is produced via casting technologies to form the structure.
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- What does patent US10354768B2 cover?
- A structure for preventing a scan by a beam is provided. The structure includes a primary material forming the structure. The primary material includes a first mass attenuation coefficient enabling the primary material to be penetrated by the beam. The structure also includes a matrix of dense particles within the primary material. The dense particles include secondary materials different than …
- Who is the assignee on this patent?
- Hamilton Sundstrand Corp, Hamilton Sunstrand Corp
- What technology area does this patent fall under?
- Primary CPC classification G21F3/00. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jul 16 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).