System for and method of fast pulse gas delivery

US10353408B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10353408-B2
Application numberUS-201213344387-A
CountryUS
Kind codeB2
Filing dateJan 5, 2012
Priority dateFeb 25, 2011
Publication dateJul 16, 2019
Grant dateJul 16, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode. Further, the dedicated controller is configured and arranged to delivery pulses of gas in accordance with anyone of three different types of pulse gas delivery processes: a time based pulse delivery process, a mole based pulse delivery process and a profile based pulse delivery process.

First claim

Opening claim text (preview).

What is claimed is: 1. A system for delivering pulses of a desired mass of gas to a tool as a complete recipe of mass flows, the system comprising: a mass flow controller including a flow sensor, an adjustable control valve and a dedicated controller, wherein, prior to delivery of the complete recipe of mass flows that defines mass flows to be controlled by the adjustable control valve during each of the pulses, the dedicated controller is configured to receive the complete recipe including a sequence of steps for opening and closing the adjustable control valve repeatedly so as to deliver a sequence of gas pulses as a function of the recipe, wherein the complete recipe includes a sequence of a number of pulses of gas delivered for a particular gas at a particular step in a semiconductor fabrication process, and wherein the dedicated controller is operative to, in response to a trigger signal, open and close the adjustable control valve repeatedly and, using feedback control from the flow sensor, tune the flow through the adjustable control valve while the control valve is open and thereby deliver mass flow according to all of the steps of the complete recipe. 2. A system according to claim 1 , further including a host controller, wherein the host controller provides the trigger signal. 3. A system according to claim 2 , wherein the host controller is configured and arranged to upload the recipe to the dedicated controller. 4. A system according to claim 2 , further including a plurality of said mass flow controllers for delivery of a plurality of sets of pulses of gas in response to a plurality of trigger signals, respectively. 5. A system according to claim 4 , wherein the host controller is configured to stagger the trigger signals to a plurality of said mass flow controllers so that the pulse delivery of these devices are in time-multiplexed way. 6. A system according to claim 1 , wherein the mass flow controller operates in one of at least two modes of operation. 7. A system according to claim 6 , wherein in one of the modes the mass flow controller is configured and arranged so as to operate as a traditional mass flow controller (MFC) mode receiving flow set point signals as a part of said recipe so as to control the flow rate of gas delivered to a processing tool. 8. A system according to claim 6 , wherein in one of the modes the mass flow controller is configured and arranged so as to operate in a pulse gas delivery (PGD) mode. 9. A system according to claim 8 , wherein in the PGD mode the mass flow controller is configured and arranged so as to receive a pulse profile and the necessary sequencing of pulses so that the mass flow controller can deliver a gas from a supply to a process tool in accordance with a recipe including a profile and sequence of timed pulses provided by a user. 10. A system according to claim 9 , wherein the dedicated controller is programmed with the profile and sequencing of the pulses in response to information downloaded or configured from a host controller to the dedicated controller. 11. A system according to claim 10 , wherein the information downloaded or configured from the host controller to the dedicated controller allows the mass flow controller to carry out all of the sequencing steps in response to a single trigger signal received from the host controller. 12. A system according to claim 1 , wherein the dedicated controller is configured and arranged so as to carry any one of at least three different types of pulse gas delivery processes. 13. A system according to claim 12 , wherein the three different types of pulse gas delivery processes include a time based delivery process, a mole based delivery process and a profile based delivery process. 14. A system according to claim 1 , wherein when configured to deliver gas in accordance with a time based delivery process, the dedicated controller is configured and arranged by the user to include the following parameters for the time based delivery process: (1) at least one targeted flow set point (Q sp ), (2) at least one time length of the pulse-on period (T on ), (3) at least one time length of each pulse-off period (T off ), and (4) the total number of pulses (N) required to complete the whole pulse gas delivery process. 15. A system according to claim 1 , wherein the dedicated controller is configured and arranged by the user to include the following parameters for a mole based delivery process: (1) at least one mole delivery set point (n sp ), (2) at least one target time length of pulse-on period (T on ), (3) at least one time length of total pulse on and off period (T total ), and (3) the number of pulses (N) to be delivered, so that the dedicated controller is configured and arranged so as to automatically adjust the mole delivery set point and the pulse-on period so as to precisely deliver within the targeted pulse-on period the targeted mole amount of gas based on measurements taken by the flow sensor and the feedback of previous delivery amounts. 16. A system according to claim 1 , wherein the dedicated controller is configured to control flow through the adjustable control valve for mole based delivery wherein gas is delivered in accordance with the following equation: Δ ⁢ ⁢ n = ∫ t ⁢ ⁢ 1 t ⁢ ⁢ 2 ⁢ Q · ⁢ d ⁢ ⁢ t wherein wherein Δn is the number of moles of gas delivered during a pulse-on period (between times t 1 and t 2 ); and Q is the flow rate measured by the flow sensor during the pulse-on period. 17. A system according to claim 1 , wherein when configured to deliver gas in accordance with a profile based delivery process, the dedicated controller is configured and arranged by a user to include a set of parameters for each pulse of the profile based delivery process depending on the type of process being run. 18. A system according to claim 1 , wherein when configured to deliver gas in accordance with a profile based delivery process, the dedicated controller is configured and arranged by a user to include the following parameters for each pulse of the profile based delivery process: (1) the flow set point Q sp1 and a corresponding first pulse on and off period (T on1 T off1 ), (2) the flow set point Q sp2 and a corresponding second pulse on and off period (T on2 T off2 ), . . . (m) the flow set point Q spm. and a corresponding m-th pulse on and off period (T onm T offm ), such that a set of parameters is provided for each pulse of the entire set of pulses

Assignees

Inventors

Classifications

  • Devices for measuring pulsing fluid flows · CPC title

  • Pulsed pressure or control pressure · CPC title

  • G05D7/0635Primary

    by action on throttling means (G05D7/0688, G05D7/0694 take precedence) · CPC title

  • Systems · CPC title

  • Pulsed gas flow or change of composition over time · CPC title

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What does patent US10353408B2 cover?
A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arran…
Who is the assignee on this patent?
Ding Junhua, Lbassi Michael, Lee Tseng Chung, and 1 more
What technology area does this patent fall under?
Primary CPC classification G05D7/0635. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 16 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).