Lithographic reticle system

Patent metadata

Field	Value
Publication number	US-10353284-B2
Application number	US-201815979813-A
Country	US
Kind code	B2
Filing date	May 15, 2018
Priority date	May 15, 2017
Publication date	Jul 16, 2019
Grant date	Jul 16, 2019

Abstract

The present disclosure provides a lithographic reticle system comprising a reticle, a first pellicle membrane mounted in front of the reticle, and a second pellicle membrane mounted in front of the first pellicle membrane, wherein the first pellicle membrane is arranged between the reticle and the second pellicle membrane, and wherein the second pellicle membrane is releasably mounted in relation to the first pellicle membrane and the reticle.

First claim

What is claimed is:

1. A lithographic reticle system comprising:
a reticle;
a first pellicle membrane mounted in front of the reticle;
a second pellicle membrane mounted in front of the first pellicle membrane,
wherein the first pellicle membrane is arranged between the reticle and the second pellicle membrane,
wherein the second pellicle membrane is releasably mounted in relation to the first pellicle membrane and the reticle, and
wherein a sealed space is formed between the first pellicle membrane and the second pellicle membrane;

a first pellicle frame supporting the first pellicle membrane; and
a second pellicle frame supporting the second pellicle membrane,
wherein the second pellicle frame includes a magnetic coupling member adapted to magnetically couple with a magnetic coupling member of the first pellicle frame or of a reticle support adapted to support the reticle.

2. The system according to claim 1 , wherein the first pellicle frame is mounted on the reticle.

3. The system according to claim 1 , wherein the second pellicle frame is releasably mounted in relation to the first pellicle membrane and the reticle.

4. The system according to claim 1 , wherein the second pellicle frame is releasably mounted on and in relation to the reticle support.

5. The system according to claim 1 , wherein the second pellicle frame is releasably mounted on and in relation to the first pellicle frame.

6. The system according to claim 5 , wherein the second pellicle frame is arranged in abutment with an outer sidewall surface of the first pellicle frame.

7. The system according to claim 5 , wherein the second pellicle frame is arranged on a top surface of the first pellicle frame.

8. The system according to claim 1 , wherein the second pellicle frame includes a mechanical coupling member adapted to releasably engage with a mechanical coupling member of the first pellicle frame or of the reticle support.

9. The system according to claim 1 , wherein the first pellicle frame and the second pellicle frame are formed by a gas permeable material, and wherein the gas permeable material comprises silicon, silicon mononitride, silicon dioxide, quartz, metal, plastic, or ceramic materials.

10. The system according to claim 8 , wherein the mechanical coupling member is adapted to form a snap lock arrangement.

11. The system according to claim 1 , wherein an attractive force is generated between the magnetic coupling members by a permanent magnet, an electromagnet, or a ferromagnetic material.

12. The system according to claim 1 , wherein the second pellicle frame includes a gas inlet.

13. The system according to claim 1 , wherein the first pellicle membrane and the second pellicle membrane are separated by a distance.

14. A lithographic exposure tool comprising:
a light source,
a substrate support,
the reticle system according to claim 1 , and
an optical system for directing light from the light source towards the substrate support via the reticle of the reticle system.

15. The lithographic exposure tool according to claim 14 , wherein the light source is an extreme ultraviolet light source.

16. A method for exchanging a pellicle membrane of the lithographic exposure tool according to claim 14 , the method comprising:
unloading the reticle, the first pellicle membrane, and the second pellicle membrane from the lithographic exposure tool;
removing the second pellicle membrane in front of the first pellicle membrane, wherein the first pellicle membrane remains on the reticle;
releasably mounting a third pellicle membrane in front of the first pellicle membrane; and
loading the reticle, the first pellicle membrane, and the third pellicle membrane into the lithographic exposure tool.

17. A method for exchanging a pellicle membrane inside the lithographic exposure tool according to claim 14 , the method comprising:
removing the second pellicle membrane in front of the first pellicle membrane, wherein the first pellicle membrane remains on the reticle; and
releasably mounting a third pellicle membrane in front of the first pellicle membrane.

18. The method according to claim 17 , further comprising:
loading the third pellicle membrane into a load-lock of the lithographic exposure tool prior to releasably mounting the third pellicle membrane; and
transferring the third pellicle membrane to a position in front of the first pellicle membrane.

19. The method according to claim 17 , further comprising:
transferring the second pellicle membrane to a load-lock of the lithographic exposure tool prior to removing the second pellicle membrane; and
unloading the second pellicle membrane from the load-lock.

20. The method according to claim 17 , further comprising:
transferring the second pellicle frame to a storage location of the tool subsequent to removing the second pellicle membrane; and
transferring a third pellicle frame from the storage location of the tool to a position in front of the first pellicle membrane prior to releasably mounting the third pellicle membrane.

Assignees

• Imec Vzw
• Imec USA Nanoelectronics Design Center

Inventors

• Jonckheere Rik
• Huyghebaert Cedric
• Gallagher Emily

Classifications

• G03F7/70975

  Assembly, maintenance, transport or storage of apparatus · CPC title

• G03F1/62 Primary

  Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

• G03F7/70983

  Optical system protection, e.g. pellicles or removable covers for protection of mask · CPC title

• G03F1/64 Primary

  characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title

• G03F7/70825

  Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title