Lenses, devices, systems and methods for refractive error
US-9759930-B2 · Sep 12, 2017 · US
US10352816B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10352816-B2 |
| Application number | US-201515526205-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 11, 2015 |
| Priority date | Nov 11, 2014 |
| Publication date | Jul 16, 2019 |
| Grant date | Jul 16, 2019 |
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A method for assessing the similarity between a power profile of a manufactured optic device and a nominal power profile upon which the power profile of the manufactured optic device is based. The method comprises measuring the power profile of manufactured optic device, identifying a region of interest from the measured power profile of manufactured optic device, and applying an offset to the measured power profile to substantially minimize a statistical quantifier for quantifying the similarity between the nominal power profile and the offset measured power profile. The method further comprises comparing the offset and the statistical quantifier to predefined quality control metrics, determining whether the measured power profile meets the predefined quality control metrics based, at least in part on the comparison. In exemplary embodiments, the method may further comprise determining whether to associate the manufactured optic device with another nominal power profile, if the measured power profile does not meet the predefined quality control metrics.
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What is claimed is: 1. A method for assessing the similarity between a power profile and/or a surface profile of a manufactured optic device, mold, and/or cavity and a corresponding nominal power profile and/or a nominal surface profile upon which the power profile and/or the surface profile of the manufactured optic device, mold, and/or cavity is based, the method comprising: measuring the power profile and/or the surface profile of manufactured optic device, mold, and/or cavity; identifying one or more regions of interest from the measured power profile and/or measured surface profile of manufactured optic device, mold, and/or cavity; determining at least one offset to the measured power profile and/or measured surface profile to substantially minimize a statistical quantifier for quantifying the similarity between the corresponding nominal power profile and/or surface profile and the offset measured power profile and/or offset measured surface profile; comparing the offset and the statistical quantifier to predefined quality control metrics; and determining whether the measured power profile meets the predefined quality control metrics based, at least in part on the comparison. 2. The method of claim 1 , further comprising determining whether to associate the manufactured optic device, mold, and/or cavity with another nominal power profile, power, and/or surface profile, if the measured power profile and/or measured surface profile does not meet the predefined quality control metrics. 3. The method of claim 1 , further comprising applying a scaling factor to the offset measured power profile and/or offset measured surface profile to substantially minimize a statistical quantifier for quantifying the similarity between the nominal power profile and/or nominal surface profile and the scaled and offset measured power profile and/or scaled and offset measured surface profile and comparing the scale factor, offset and the statistical quantifier to predefined quality control metrics. 4. The method of claim 1 , further comprising: applying an asphericity correction (or slope correction) to the scaled and offset measured power profile and/or scaled and offset measured surface profile to substantially minimize a statistical quantifier for quantifying the similarity between the nominal power profile and/or nominal surface profile and the corrected, scaled and offset measured power profile and/or corrected, scaled and offset measured surface profile; and comparing the rotation, scale factor, offset and the statistical quantifier to predefined quality control metrics. 5. The method of claim 1 , wherein the statistical quantifier is a sum of the squared differences calculated over the region of interest. 6. The method of claim 1 , wherein the method is performed during the manufacturing process of the manufactured optic device, mold, and/or cavity. 7. The method of claim 1 , wherein the method is performed in substantially real-time. 8. The method of claim 1 , wherein the optic device is manufactured on a high speed manufacturing line and the method is performed in substantially real-time. 9. The method of claim 1 , wherein the method reduces the output of the manufacturing line by less than 1%, 2%, 3%, 4%, 5%, 10%, or 15%. 10. The method of claim 1 , wherein power profile cannot be described with a single straight line or a single conic section and/or there is at least a ±0.25-0.30 diopter power variation from the mean power. 11. The method of claim 1 , wherein the nominal power profile and/or nominal surface profile has multiple peaks and/or troughs along the half chord. 12. The method of claim 1 , wherein the nominal power profile and/or nominal surface profile has at least 3, 4 or 5 peaks and/or troughs along the half chord. 13. The method of claim 1 , wherein the nominal power profile and/or nominal surface profile comprises at least two spherical aberration terms. 14. The method of claim 1 , wherein the nominal power profile and/or nominal surface profile comprises at least two spherical aberration terms and a defocus term. 15. The method of claim 1 , wherein the nominal power profile and/or nominal surface profile comprises at least three spherical aberration terms. 16. The method of claim 1 , wherein the nominal power profile and/or nominal surface profile comprises at least 4, 5, 6, 7 or 8 spherical aberration terms. 17. The method of claim 1 , wherein the nominal power profile and/or nominal surface profile is non-monotonic. 18. A system for assessing the similarity between a power profile and/or surface profile of a manufactured optic device, mold, and/or cavity and a corresponding nominal power profile and/or surface profile upon which the power profile and/or surface profile of the manufactured optic device, mold, and/or cavity is based, the system comprising: an input for receiving the power profile and/or surface profile of the manufactured optic device, mold, and/or cavity; and a processor configured to: identify at least one region of interest from the measured power profile and/or measured surface profile of manufactured optic device, mold, and/or cavity; determine at least one offset to the measured power profile and/or measured surface profile to substantially minimize a statistical quantifier for quantifying the similarity between the nominal power profile and/or nominal surface profile and the offset measured power profile and/or offset measured surface profile; compare the offset and the statistical quantifier to predefined quality control metrics; and determine whether the measured power profile meets the predefined quality control metrics based, at least in part on the comparison. 19. The system of claim 18 , wherein the processor is further configured to determine whether to associate the manufactured optic device, mold, and/or cavity with another nominal power profile, power, and/or surface profile, if the measured power profile and/or measured surface profile does not meet the predefined quality control metrics. 20. The system of claim 18 , wherein the processor is further configured to apply a scaling factor to the offset measured power profile and/or offset measured surface profile to substantially minimize a statistical quantifier for quantifying the similarity between the nominal power profile and/or nominal surface profile and the scaled and offset measured power profile and/or scaled and offset measured surface profile and compare the scale factor, the offset and the statistical quantifier to predefined quality control metrics. 21. The system of claim 18 , wherein the processor is further configured to: apply an asphericity correction (or slope correction) to the scaled and offset measured power profile and/or scaled and offset measured surface profile to substantially minimize a statistical quantifier for quantifying the similarity between the nominal power profile and/or nominal surface profile and the corrected, scaled and offset measured power profile and/or corrected, scaled and offset measured surface profile and compare the rotation, scale factor, offset and the statistical quantifier to predefined quality control metrics. 22. The system of claim 18 , wherein the statistical quantifier is a sum of the squared differences calculated over the region of interest. 23. The system of claim 18 , wherein the comparison is performed during the manufacturing process of the manufactured optic device, mold, and/or cavity.
by measuring refractive power · CPC title
by measuring geometrical properties or aberrations · CPC title
correcting chromatic aberrations (G02B27/0056, G02B27/4222, G02B27/4227 take precedence) · CPC title
Optical parts (characterised by the material G02B1/00) · CPC title
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