Actuator system and lithographic apparatus

Patent metadata

Field	Value
Publication number	US-10338483-B2
Application number	US-201716070848-A
Country	US
Kind code	B2
Filing date	Jan 30, 2017
Priority date	Feb 25, 2016
Publication date	Jul 2, 2019
Grant date	Jul 2, 2019

Abstract

An actuator system configured to position an object, the actuator system includes a piezo actuator having an actuator contact surface. The piezo actuator is configured to exert a force via the actuator contact surface onto the object. The piezo actuator includes a transparent piezo material. The actuator system further has an optical position sensor configured to measure a position of the actuator contact surface. The optical position sensor is configured to transmit an optical beam through the transparent piezo material to the actuator contact surface. The optical position sensor may form an interferometer.

First claim

What is claimed is:

1. An actuator system configured to position an object, the actuator system comprising:
a piezo actuator comprising an actuator contact surface, wherein the piezo actuator is configured to exert a force via the actuator contact surface onto the object and the piezo actuator comprises a transparent piezo material;
an optical position sensor configured to measure a position of the actuator contact surface,
wherein the optical position sensor is configured to transmit an optical beam through the transparent piezo material to the actuator contact surface.

2. The actuator system according to claim 1 , wherein the transparent piezo material is LiNB0 3 .

3. The actuator system according to claim 1 , wherein a direction of transmission of the optical beam through the transparent piezo material corresponds to a direction of actuation of the piezo actuator.

4. The actuator system according to claim 1 , wherein the optical position sensor comprises an interferometer arranged to provide a measurement beam and a reference beam, wherein the optical beam comprises the measurement beam.

5. The actuator system according to claim 4 , wherein the transparent piezo material extends in a direction of actuation of the piezo actuator from a first piezo electric material surface to a second piezo electric material surface,
wherein the optical position sensor is configured to reflect the reference beam on the first piezo electric material surface, and
wherein the optical position sensor is configured to propagate the measurement beam from the first piezo electric material surface through the transparent piezo material to the second piezo electric material surface, and
wherein the optical position sensor is configured to reflect the measurement beam at the second piezo electric material surface back to the first piezo electric material surface.

6. The actuator system according to claim 5 , wherein the second piezo electric material surface comprises the actuator contact surface.

7. The actuator system according to claim 4 , further comprising a beam splitter,
wherein the transparent piezo material extends in a direction of actuation of the piezo actuator from a first piezo electric material surface to a second piezo electric material surface,
wherein the first piezo electric material surface is arranged facing the beam splitter,
wherein the optical position sensor is configured to transmit the measurement beam from the beam splitter via the first piezo electric material surface through the transparent piezo material and to reflect the measurement beam at the second piezo electric material surface.

8. The actuator system according to claim 4 , wherein the transparent piezo material extends in a direction of actuation of the piezo actuator from a first piezo electric material surface to a second piezo electric material surface, and
wherein the first piezo electric material surface and the second piezo electric material surface are oriented at an angle with respect to each other and each is arranged to reflect the measurement beam while the measurement beam propagates through the transparent piezo material.

9. The actuator system according to claim 4 , further comprising a second piezo actuator comprising transparent piezoelectric material,
wherein the reference beam extends through the transparent piezoelectric material of the second piezo actuator, and
wherein the second piezo actuator is comprised in a modulator configured to modulate the reference beam.

10. The actuator system according to claim 1 , wherein the piezo actuator comprises a shear piezo,
wherein the optical position sensor comprises an encoder grating, and
wherein the optical position sensor is configured to transmit the optical beam through the piezo actuator onto the encoder grating.

11. The actuator system according to claim 10 , wherein the piezo actuator comprises a first shear piezo actuator configured to provide a shear movement in a first direction of actuation, and a second shear piezo actuator configured to provide a shear movement in a second direction of actuation different from the first direction of actuation,
wherein the first direction of actuation and the second direction of actuation define a plane of actuation,
wherein the first shear piezo actuator and the second shear piezo actuator each comprise the transparent piezo material,
wherein the optical position sensor is configured to transmit the optical beam through the first shear piezo actuator and the second shear piezo actuator, and
wherein the encoder grating comprises a two dimensional grating extending parallel to the plane of actuation.

12. The actuator system according to claim 10 , wherein the optical position sensor is configured to measure the position of the actuator contact surface in a first direction of actuation, in a second direction of actuation and in a direction perpendicular to a plane of actuation.

13. The actuator system according to claim 1 , further comprising a measurement circuit to measure a force acting on the piezo actuator, the measurement circuit comprising:
an integrator circuit having a current input and configured to integrate a current flowing into the current input,
one electrical terminal of the piezo actuator being connected to the current input, and
another electrical terminal of the piezo actuator being connected to a reference signal.

14. A lithographic apparatus comprising the actuator system according to claim 1 .

15. The lithographic apparatus according to claim 14 , wherein the actuator system is comprised in at least one selected from: a patterning device pusher, a patterning device shifter, an e-pin and/or a position control actuator of an optical element of the lithographic apparatus.

16. A method comprising:
exerting a force via an actuator contact surface onto an object, wherein a piezo actuator comprises the actuator contact surface and the piezo actuator comprises a transparent piezo material; and
measuring a position of the actuator contact surface by transmitting an optical beam through the transparent piezo material to the actuator contact surface.

17. The method according to claim 16 , wherein a direction of transmission of the optical beam through the transparent piezo material corresponds to a direction of actuation of the piezo actuator.

18. The method according to claim 16 , wherein the measuring comprises using an interferometric technique involving a measurement beam and a reference beam, wherein the optical beam comprises the measurement beam.

19. The method according to claim 16 , wherein the actuator contact surface is in at least one selected from: a patterning device pusher of a lithographic apparatus, a patterning device shifter of a lithographic apparatus, an e-pin of a lithographic apparatus and/or a position control actuator of an optical element of the lithographic apparatus.

20. The method according to claim 16 , wherein the piezo actuator comprises a shear piezo,
wherein the measuring involves using an encoder grating, and
wherein the measuring comprises transmitting the optical beam through the piezo actuator onto the encoder grating.

Assignees

• Asml Netherlands Bv

Inventors

• Van Leeuwen Robbert Edgar
• Butler Hans

Classifications

• G03F7/70733

  Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask · CPC title

• G03F7/70775

  Position control, e.g. interferometers or encoders for determining the stage position · CPC title

• G03F7/70758 Primary

  Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving · CPC title

• H01L41/00

  Electricity · mapped topic

• H01L41/02

  Electricity · mapped topic