High purity cobalt chloride and manufacturing method therefor

US10337109B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10337109-B2
Application numberUS-201414906774-A
CountryUS
Kind codeB2
Filing dateSep 5, 2014
Priority dateDec 2, 2013
Publication dateJul 2, 2019
Grant dateJul 2, 2019

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Abstract

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Provided is high purity cobalt chloride having a purity of 5N (99.999%) or higher, and a manufacturing method of the high purity cobalt chloride via electrolysis, wherein cobalt having a purity of 5N or higher is used as an anode, a diluted hydrochloric acid bath having a pH of 1.5 to 3.0 is used as an electrolytic solution, the cobalt anode and a cathode plate are partitioned with an anion exchange membrane, and electrodeposition of the cobalt onto the cathode plate is thereby inhibited. An object of this invention is to provide a manufacturing method capable of providing high purity cobalt chloride at a higher purity and at a lower production cost than conventional methods. Under circumstances where demands for cobalt chloride may increase, cobalt chloride needs to be manufactured at high volume and at low cost, and the present invention offers a technique capable of satisfying the foregoing requirements.

First claim

Opening claim text (preview).

The invention claimed is: 1. A manufacturing method of high purity cobalt chloride having a purity of 5N or higher, excluding gas components of O, C, N, H, S, and P, and a content of Tl as an impurity element of 1 ppm or less via electrolysis, wherein cobalt having a purity of 5N (99.999%) or higher excluding gas components of O, C, N, H, S, and P is used as an anode, a diluted hydrochloric acid bath having a pH of 1.5 to 3.0 is used as an electrolytic solution, the cobalt anode and a cathode plate are partitioned with an anion exchange membrane, cobalt is eluted from the cobalt anode into the diluted hydrochloric acid bath during the electrolysis, and electrodeposition of the cobalt in the hydrochloric acid bath onto the cathode plate is thereby inhibited by the anion exchange membrane. 2. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 1 , wherein the cobalt, and chlorine in the electrolytic solution, are subject to electrosynthesis, and so as to adjust a concentration of diluted hydrochloric acid within the electrolytic solution, which decreases during progress of the electrosynthesis, a new diluted hydrochloric acid solution is added to the electrolytic solution for use in the electrosynthesis, or a catholyte circulation tank is provided separately from the electrolytic solution for use in the electrosynthesis, a new diluted hydrochloric acid solution is filled in the catholyte circulation tank and circulated and supplied to the electrolytic solution, and the electrosynthesis is performed while adjusting a pH value of the electrolytic solution to 1.5 to 3.0. 3. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 2 , wherein a Ti plate is used as the cathode plate. 4. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 3 , wherein a cobalt chloride solution is produced by the electrosynthesis, the cobalt chloride solution is evaporated to produce a concentrated cobalt chloride solution, and thereafter the concentrated cobalt chloride solution is removed, filtered and separated to produce cobalt chloride which is subsequently dried. 5. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 4 , wherein, upon evaporating the cobalt chloride solution to produce the concentrated cobalt chloride solution, evaporation of the cobalt chloride solution is ended when a weight of the cobalt chloride solution reaches 80 to 95% of a weight of the cobalt chloride solution at a start of the evaporation. 6. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 2 , wherein a cobalt chloride solution is produced by the electrosynthesis, the cobalt chloride solution is evaporated to produce a concentrated cobalt chloride solution, and thereafter the concentrated cobalt chloride solution is removed, filtered and separated to produce cobalt chloride which is subsequently dried. 7. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 6 , wherein, upon evaporating the cobalt chloride solution to produce the concentrated cobalt chloride solution, evaporation of the cobalt chloride solution is ended when a weight of the cobalt chloride solution reaches 80 to 95% of a weight of the cobalt chloride solution at a start of the evaporation. 8. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 1 , wherein a Ti plate is used as the cathode plate. 9. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 8 , wherein a cobalt chloride solution is produced in the electrolytic solution by electrosynthesis, the cobalt chloride solution is evaporated to produce a concentrated cobalt chloride solution, and thereafter the concentrated cobalt chloride solution is removed, filtered and separated to produce cobalt chloride which is subsequently dried. 10. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 9 , wherein, upon evaporating the cobalt chloride solution to produce the concentrated cobalt chloride solution, evaporation of the cobalt chloride solution is ended when a weight of the cobalt chloride solution reaches 80 to 95% of a weight of the cobalt chloride solution at a start of the evaporation. 11. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 1 , wherein a cobalt chloride solution is produced in the electrolytic solution by electrosynthesis, the cobalt chloride solution is evaporated to produce a concentrated cobalt chloride solution, and thereafter the concentrated cobalt chloride solution is removed, filtered and separated to produce cobalt chloride which is subsequently dried. 12. The manufacturing method of high purity cobalt chloride via electrolysis according to claim 11 , wherein, upon evaporating the cobalt chloride solution to produce the concentrated cobalt chloride solution, evaporation of the cobalt chloride solution is ended when a weight of the cobalt chloride solution reaches 80 to 95% of a weight of the cobalt chloride solution at a start of the evaporation. 13. High purity cobalt chloride, wherein purity of the high purity cobalt chloride is 5N or higher excluding gas components of O, C, N, H, S, and P, and content of Tl as an impurity element is 1 ppm or less.

Assignees

Inventors

Classifications

  • Chlorides; Oxychlorides · CPC title

  • Chemistry & Metallurgy · mapped topic

  • C25B1/26Primary

    Chlorine; Compounds thereof (by simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine C25B1/34) · CPC title

  • Compositional purity · CPC title

  • characterised by the material · CPC title

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What does patent US10337109B2 cover?
Provided is high purity cobalt chloride having a purity of 5N (99.999%) or higher, and a manufacturing method of the high purity cobalt chloride via electrolysis, wherein cobalt having a purity of 5N or higher is used as an anode, a diluted hydrochloric acid bath having a pH of 1.5 to 3.0 is used as an electrolytic solution, the cobalt anode and a cathode plate are partitioned with an anion exc…
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp, Jx Nippon Minig & Metals Corp
What technology area does this patent fall under?
Primary CPC classification C25B1/26. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 02 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).