Substrate Processing Method, Apparatus, and System
US-2024363405-A1 · Oct 31, 2024 · US
US10329662B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10329662-B2 |
| Application number | US-201415123019-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 3, 2014 |
| Priority date | Mar 3, 2014 |
| Publication date | Jun 25, 2019 |
| Grant date | Jun 25, 2019 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
An apparatus and method for protecting an interior of a hollow body, where an inlet and exhaust manifold include a port assembly attachable to an opening of the hollow body is provided. The interior of the hollow body is exposed to sequential self-saturating surface reactions by sequential inlet of reactive gases via the port assembly and the opening into the interior of the hollow body, and excess gases is pumped via the opening and the port assembly out from the hollow body.
Opening claim text (preview).
The invention claimed is: 1. A method of protecting an interior of a hollow body, the method comprising: providing an inlet and exhaust manifold comprising a port assembly attachable to an opening of the hollow body; exposing the interior of the hollow body to sequential self-saturating surface reactions by sequential inlet of reactive gases via said port assembly and said opening into the interior of the hollow body; removing excess gases via said opening and said port assembly out from the hollow body; guiding inactive purge gas into an intermediate space between the hollow body and a surrounding chamber wall; and pumping said inactive purge gas out from the intermediate space. 2. The method of claim 1 , comprising attaching said port assembly to said opening of the hollow body. 3. The method of claim 1 , comprising pumping reaction residue and purge gas from the interior of the hollow body by a vacuum pump attached to an exhaust side of the inlet and exhaust manifold. 4. The method of claim 1 , wherein a gas discharge point within the hollow body is arranged at a different level than a gas exhaust point. 5. The method of claim 1 , wherein the hollow body is used as a reaction vessel sealed by a sealing part comprised by the port assembly. 6. The method of claim 5 , wherein said sealing part comprises a tapered thread detachably attachable to said opening of the hollow body. 7. The method of claim 5 , wherein said port assembly comprises a fitting part attachable to the sealing part allowing the sealing part to twist to tighten against said opening of the hollow body. 8. The method of claim 1 , wherein the inlet and exhaust manifold comprises one or more in-feed lines with their controlling elements controlled by a computer-implemented control system. 9. An apparatus for protecting an interior of a hollow body, comprising: an inlet and exhaust manifold comprising a port assembly attachable to an opening of the hollow body, the apparatus being configured to expose the interior of the hollow body to sequential self-saturating surface reactions by sequential inlet of reactive gases via said port assembly and said opening into the interior of the hollow body; a pump configured to remove excess gases via said opening and said port assembly out from the hollow body; and a chamber surrounding the hollow body and an inactive gas in-feed line configured to guide inactive purge gas into an intermediate space between the hollow body and a surrounding chamber wall. 10. The apparatus of claim 9 , wherein a gas discharge point provided by the inlet and exhaust manifold is arranged at a different level than a gas exhaust point provided by the inlet and exhaust manifold. 11. The apparatus of claim 9 , wherein the inlet and exhaust manifold comprises precursor vapor and purge gas in-feed lines and their controlling elements. 12. The apparatus of claim 9 , wherein the inlet and exhaust manifold comprises a hollow body-specific port assembly configured to attach the inlet and exhaust manifold into said opening of the hollow body thereby forming a fluid communication path between the inlet and exhaust manifold and the interior of the hollow body. 13. The apparatus of claim 9 , wherein the port assembly comprises a sealing part attachable to the opening of the hollow body. 14. The apparatus of claim 13 , wherein the sealing part comprises a tapered thread. 15. The apparatus of claim 9 , wherein the apparatus is mobile.
applied in non-semiconductor technology · CPC title
Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title
Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title
characterized by the apparatus · CPC title
by purging residual gases from the reaction chamber or gas lines · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.