Laser processing apparatus and laser processing method

US10329641B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10329641-B2
Application numberUS-201514940474-A
CountryUS
Kind codeB2
Filing dateNov 13, 2015
Priority dateNov 17, 2014
Publication dateJun 25, 2019
Grant dateJun 25, 2019

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

One embodiment of the laser processing apparatus is for surface treatment by supplying liquid to a surface of the target member and irradiating pulsed laser light to the surface of the target member via the liquid. The apparatus includes a laser oscillator and a liquid supply. The laser oscillator irradiates the laser light to the surface through the liquid via an optical window. The liquid supply is configured to supply the liquid to the surface of the target member via a flow path passing on an outer surface of the optical window. When the liquid is in contact with a laser light emission surface of the optical window, the laser light emission surface transmits the laser light. When the liquid is not in contact with the laser light emission surface, the laser light emission surface reflects the laser light.

First claim

Opening claim text (preview).

What is claimed is: 1. A laser processing apparatus for surface treatment of a target member by supplying liquid to a surface of the target member and irradiating pulsed laser light to the surface via the liquid, the apparatus comprising: an optical window; a laser oscillator configured to irradiate the laser light to the surface through the liquid through the optical window; and a liquid supply configured to supply the liquid to the surface through a flow path passing on an outer surface of the optical window; and a beam dump to which the laser light reflected by the laser light emission surface is guided, wherein when the liquid is in contact with a laser light emission surface of the optical window, the laser light emission surface transmits the laser light, and when the liquid is not in contact with the laser light emission surface, the laser light emission surface reflects the laser light. 2. The laser processing apparatus according to claim 1 , wherein the beam dump includes an energy detector configured to measure energy of the laser light. 3. A laser processing apparatus for surface treatment of a target member by supplying liquid to a surface of the target member and irradiating pulsed laser light to the surface via the liquid, the apparatus comprising: an optical window; a laser oscillator configured to irradiate the laser light to the surface through the liquid through the optical window; a liquid supply configured to supply the liquid to the surface through a flow path passing on an outer surface of the optical window, a laser light sampler configured to sample part of the laser light, the sampler being disposed on an optical path; and a sampling laser light energy detector configured to measure energy of the sampled laser light, wherein when the liquid is in contact with a laser light emission surface of the optical window, the laser light emission surface transmits the laser light, and when the liquid is not in contact with the laser light emission surface, the laser light emission surface reflects the laser light. 4. The laser processing apparatus according to claim 1 , wherein the optical window is an optical component having a conical shape, and the laser light emission surface includes a conical surface of the optical component having the conical shape. 5. A laser processing method for surface treatment of a target member in a gaseous atmosphere by supplying liquid to a surface of the target member and irradiating pulsed laser light to the surface via the liquid, the method comprising: preparing a laser oscillator configured to irradiate the laser light to the surface through the liquid via an optical window and a liquid supply configured to supply the liquid to the surface via a flow path passing on an outer surface of the optical window, and a beam dump to which the laser light reflected by the laser light emission surface is guided; and changing an optical path of the laser light from a first optical path to a second optical path due to a difference in refractive index between the liquid and the gaseous atmosphere, wherein when the liquid is supplied to an outer side of the optical window from the liquid supply, the laser light passes through the first optical path to reach the surface, and when the liquid is not supplied to the outer side of the optical window from the liquid supply, the laser light passes through the second optical path not to reach the surface. 6. The laser processing apparatus according to claim 3 , wherein the optical window is an optical component having a conical shape, and the laser light emission surface includes a conical surface of the optical component having the conical shape.

Assignees

Inventors

Classifications

  • using absorbing layers on the workpiece, e.g. for marking or protecting purposes · CPC title

  • Shaping the laser beam, e.g. by masks or multi-focusing · CPC title

  • inside the workpiece · CPC title

  • by shaping pulses · CPC title

  • the fluid stream containing a liquid · CPC title

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Frequently asked questions

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What does patent US10329641B2 cover?
One embodiment of the laser processing apparatus is for surface treatment by supplying liquid to a surface of the target member and irradiating pulsed laser light to the surface of the target member via the liquid. The apparatus includes a laser oscillator and a liquid supply. The laser oscillator irradiates the laser light to the surface through the liquid via an optical window. The liquid sup…
Who is the assignee on this patent?
Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification C21D10/005. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 25 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).