Photosensitive resin composition, and film and printed circuit board using same

Patent metadata

Field	Value
Publication number	US-10329368-B2
Application number	US-201715484135-A
Country	US
Kind code	B2
Filing date	Apr 11, 2017
Priority date	Jun 16, 2016
Publication date	Jun 25, 2019
Grant date	Jun 25, 2019

Abstract

A non-reactive photosensitive resin composition storable at room temperature comprises a carboxylic acid-modified bisphenol epoxy (meth)acrylate, a photosensitive monomer, a photosensitive prepolymer, a photo-initiator, and a coloring agent. Each of the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer, and photosensitive prepolymer has a plurality of carbon-carbon double bonds, so that the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer may be polymerized to form a dense cross-linking network structure when the photosensitive resin composition is exposed to ultraviolet radiation. A film and a printed circuit board using the photosensitive resin composition are also provided.

First claim

What is claimed is:

1. A photosensitive resin composition comprising:
a carboxylic acid-modified bisphenol epoxy (meth)acrylate;
a photosensitive monomer;
a photosensitive prepolymer;
a photo-initiator; and
a coloring agent;
wherein each of the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer has carbon-carbon double bonds, a ratio of the number of the carbon-carbon double bonds in the carboxylic acid-modified bisphenol epoxy (meth)acrylate and the number of the carbon-carbon double bonds in the photosensitive monomer is substantially between 1:20 and 1:50, the carboxylic acid-modified bisphenol epoxy (meth)acrylate has a molar mass of about 15000 g/mol to about 35000 g/mol, the carboxylic acid-modified bisphenol epoxy (meth)acrylate has an acid value of about 70 mgKOH/g to about 130 mgKOH/g; and

wherein the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer polymerize to form a dense cross-linking network structure when the photosensitive resin composition is exposed to ultraviolet radiation.

2. The photosensitive resin composition of claim 1 , wherein the photosensitive resin composition has a surface energy of about 30 dyne to about 60 dyne.

3. The photosensitive resin composition of claim 1 , wherein the carboxylic acid-modified bisphenol epoxy (meth)acrylate is in an amount by weight of about 100 parts in the photosensitive resin composition, the photosensitive monomer is in an amount by weight of about 20 parts to about 80 parts in the photosensitive resin composition, the photosensitive prepolymer is in an amount by weight of about 10 parts to about 40 parts in the photosensitive resin composition, the photo-initiator is in an amount by weight of about 5 parts to about 15 parts in the photosensitive resin composition, the coloring agent is in an amount by weight of about 1 parts to about 5 parts in the photosensitive resin composition.

4. The photosensitive resin composition of claim 1 , wherein the photosensitive monomer is selected from a group consisting of propoxylated (3) trimethylolpropane triacrylate and dipentaerythritol hexaacrylate, or any combination thereof.

5. The photosensitive resin composition of claim 1 , wherein the photosensitive prepolymer is urethane (meth)acrylate.

6. The photosensitive resin composition of claim 1 , wherein the photo-initiator is selected from a group consisting of 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxy cyclohexyl phenyl ketone, Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide, 2-methyl-4′-(methylthio)-2-morpholinopropiophenone, phenyl bis(2,4,6-trimethylbenzoyl)-phosphine oxide, 2-Benzyl-2-(dimethylamino)-4′-morpholinobutyrophenone, 2,2-dimethoxy-2-phenylacetophenone, benzophenone, isopropyl thioxanthone, and carbazole oxime ester, or any combination thereof.

7. A film comprising:
at least one release film; and
a resin layer, at least one surface of the resin layer is attached to one surface of the at least one release film, the resin layer is made by a photosensitive resin composition, the photosensitive resin composition comprising:
a carboxylic acid-modified bisphenol epoxy (meth)acrylate;
a photosensitive monomer;
a photosensitive prepolymer;
a photo-initiator; and
a coloring agent;

wherein each of the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer has carbon-carbon double bonds, a ratio of the number of the carbon-carbon double bonds in the carboxylic acid-modified bisphenol epoxy (meth)acrylate and the number of the carbon-carbon double bonds in the photosensitive monomer is substantially between 1:20 and 1:50, the carboxylic acid-modified bisphenol epoxy (meth)acrylate has a molar mass of about 15000 g/mol to about 35000 g/mol, the carboxylic acid-modified bisphenol epoxy (meth)acrylate has an acid value of about 70 mgKOH/g to about 130 mgKOH/g; and
wherein the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer polymerize to form a dense cross-linking network structure when the photosensitive resin composition is exposed to ultraviolet radiation.

8. The film of claim 7 , wherein the photosensitive resin composition has a surface energy of about 30 dyne to about 60 dyne.

9. The film of claim 7 , wherein the carboxylic acid-modified bisphenol epoxy (meth)acrylate is in an amount by weight of about 100 parts in the photosensitive resin composition, the photosensitive monomer is in an amount by weight of about 20 parts to about 80 parts in the photosensitive resin composition, the photosensitive prepolymer is in an amount by weight of about 10 parts to about 40 parts in the photosensitive resin composition, the photo-initiator is in an amount by weight of about 5 parts to about 15 parts in the photosensitive resin composition, the coloring agent is in an amount by weight of about 1 parts to about 5 parts in the photosensitive resin composition.

10. The film of claim 7 , wherein the photosensitive monomer is selected from a group consisting of propoxylated (3) trimethylolpropane triacrylate and dipentaerythritol hexaacrylate, or any combination thereof.

11. The film of claim 7 , wherein the photosensitive prepolymer is urethane (meth)acrylate.

12. The film of claim 7 , wherein the photo-initiator is selected from a group consisting of 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxy cyclohexyl phenyl ketone, Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide, 2-methyl-4′-(methylthio)-2-morpholinopropiophenone, phenyl bis(2,4,6-trimethylbenzoyl)-phosphine oxide, 2-Benzyl-2-(dimethylamino)-4′-morpholinobutyrophenone, 2,2-dimethoxy-2-phenylacetophenone, benzophenone, isopropyl thioxanthone, and carbazole oxime ester, or any combination thereof.

13. A printed circuit board comprising:
a circuit substrate; and
an insulating layer attached to at least one surface of the circuit substrate, the insulating layer is made by sticking a resin layer to at least one surface of the circuit substrate, and exposing the resin layer to ultraviolet radiation, the resin layer is made by a photosensitive resin composition, the photosensitive resin composition comprising:
a carboxylic acid-modified bisphenol epoxy (meth)acrylate;
a photosensitive monomer;
a photosensitive prepolymer;
a photo-initiator; and
a coloring agent;

wherein each of the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer has carbon-carbon double bonds, a ratio of the number of the carbon-carbon double bonds in the carboxylic acid-modified bisphenol epoxy (meth)acrylate and the number of the carbon-carbon double bonds in the photosensitive monomer is substantially between 1:20 and 1:50, the carboxylic acid-modified bisphenol epoxy (meth)acrylate has a molar mass of about 15000 g/mol to about 35000 g/mol, the carboxylic acid-modified bisphenol epoxy (meth)acrylate has an acid value of about 70 mgKOH/g to about 130 mgKOH/g; and
wherein the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer polymerize to form a dense cross-linking network structure when the photosensitive resin composition is exposed to ultraviolet radiation.

14. The printed circuit board of claim 13 , wherein the photosensitive resin composition has a surface energy of about 30 dyne to about 60 dyne.

15. The printed circuit board of claim 13 , wherein the carboxylic acid-modified bisphenol epoxy (meth)acrylate is in an amount by weight of about 100 parts in the photosensi

Assignees

• Zhen Ding Tech Co Ltd

Inventors

• Hsu Mao-Feng
• Yen Chen-Feng
• Hsiang Shou-Jui
• Hsiao Yen-Chin

Classifications

• C08F2/48

  by ultraviolet or visible light · CPC title

• H05K3/064

  Photoresists · CPC title

• H05K3/287

  Photosensitive compositions · CPC title

• H05K2203/056

  Using an artwork, i.e. a photomask for exposing photosensitive layers · CPC title

• G03F7/029

  Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur · CPC title