Tunable surfactants in dampening fluids for digital offset ink printing applications

US10328688B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10328688-B2
Application numberUS-201715496709-A
CountryUS
Kind codeB2
Filing dateApr 25, 2017
Priority dateApr 27, 2011
Publication dateJun 25, 2019
Grant dateJun 25, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A dampening fluid useful in offset ink printing applications contains water and a surfactant whose structure can be altered. The alteration in structure aids in reducing accumulation of the surfactant on the surface of an imaging member. The surfactant can be decomposed, switched between cis-trans states, or polymerizable with ink that is subsequently placed on the surface.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; after an ink transfer from the imaging member and before a subsequent latent image forming step on the imaging member, exposing the imaging member to light or heat to alter the structure of the surfactant across the imaging member; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment. 2. The method of claim 1 , wherein the cis-trans isomer is an azobenzene compound. 3. The method of claim 1 , wherein the cis-trans isomer is an azobenzene compound having the structure of Formula (III): wherein R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 are independently selected from hydrogen, hydroxyl, carboxylic acid, amino, thiol, cyano, nitro, halogen, vinyl, alkoxy, trialkylammoniumalkoxy, sulfonic acid, phosphonate ester, aldehyde, amide, urea, carbamate, carbonate, alkyl, polyoxyalkylene, and ester; and wherein R 1 is different from R 4 . 4. The method of claim 1 , wherein the cis-trans isomer is an azobenzene compound having the structure of Formula (III-a): wherein R1 is selected from hydroxyl, amino, cyano, nitro, halogen, vinyl, alkoxy, sulfonic acid, aldehyde, and ester. 5. The method of claim 1 , wherein the cis-trans isomer is an azobenzene compound having the structure of Formula (III-b): wherein R b is alkyl having 2 to 6 carbon atoms; and p is an integer from 1 to 10. 6. The method of claim 1 , wherein the cis-trans isomer is an azobenzene compound having the structure of Formula (III-c): 7. The method of claim 6 , wherein Formula (III-c) includes a nonpolar alkyl sidechain and a polar trialkylammoniumalkoxy sidechain. 8. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; exposing the imaging member to light or heat to alter the structure of the surfactant; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment, the cis-trans isomer including an azobenzene compound having the structure of Formula (III): wherein R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 are independently selected from hydrogen, carboxylic acid, amino, thiol, cyano, nitro, halogen, vinyl, alkoxy, trialkylammoniumalkoxy, sulfonic acid, phosphate ester, aldehyde, amide, urea, carbonate, carbonate, alkyl, polyoxyalkylene, and ester; and wherein R 1 is different from R 4 . 9. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; exposing the imaging member to light or heat to alter the structure of the surfactant; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment, the cis-trans isomer including an azobenzene compound having the structure of Formula (III-a): wherein R1 is selected from hydroxyl, amino, cyano, nitro, halogen, vinyl, alkoxy, sulfonic acid, aldehyde, and ester. 10. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; exposing the imaging member to light or heat to alter the structure of the surfactant; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment, the cis-trans isomer including an azobenzene compound having the structure of Formula (III-b): wherein R b is alkyl having 2 to 6 carbon atoms; and p is an integer from 1 to 10. 11. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; exposing the imaging member to light or heat to alter the structure of the surfactant; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment, the cis-trans isomer including an azobenzene compound having the structure of Formula (III-c): 12. The method of claim 11 , wherein Formula (III-c) includes a nonpolar alkyl sidechain and a polar trialkylammoniumalkoxy sidechain. 13. The method of claim 1 , wherein the exposing the imaging member to light or heat to alter the structure of the surfactant across the imaging member includes exposing entire cross-process lines on the imaging member to light or heat. 14. The method of claim 1 , wherein the exposing the imaging member to light or heat to alter the structure of the surfactant across the imaging member includes exposing entire cross-process lines on the imaging member to light or heat at both imaged and non-imaged areas of the imaging member.

Assignees

Inventors

Classifications

  • the liquid having chemical or dissolving effect · CPC title

  • Means enabling or facilitating exchange of tubular printing or impression members, e.g. printing sleeves, blankets · CPC title

  • Damping; Neutralising or similar differentiation treatments for lithographic printing formes; {Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development (treatment of materials containing silver salts G03F7/063; developers per se for processing photosensitive materials G03F7/32)} · CPC title

  • for forme cylinders · CPC title

  • B41F35/06Primary

    for offset cylinders · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10328688B2 cover?
A dampening fluid useful in offset ink printing applications contains water and a surfactant whose structure can be altered. The alteration in structure aids in reducing accumulation of the surfactant on the surface of an imaging member. The surfactant can be decomposed, switched between cis-trans states, or polymerizable with ink that is subsequently placed on the surface.
Who is the assignee on this patent?
Xerox Corp, Palo Alto Res Ct Inc, Palo Alto Res Corporation
What technology area does this patent fall under?
Primary CPC classification B41F35/06. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 25 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).