Visible diode laser systems, apparatus and methods of use

US10323460B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10323460-B2
Application numberUS-201715821411-A
CountryUS
Kind codeB2
Filing dateNov 22, 2017
Priority dateDec 11, 2015
Publication dateJun 18, 2019
Grant dateJun 18, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Systems, apparatus and methods for performing laser operations in boreholes and other remote locations, such operations including laser drilling of a borehole in the earth. Systems, apparatus and methods for generating and delivering high power laser energy below the surface of the earth and within a borehole. Laser operations using such downhole generated laser beams.

First claim

Opening claim text (preview).

What is claimed: 1. A high power laser source for generating high power beams in situ in a borehole, the laser source comprising: a. a downhole assembly having an outer housing, the outer housing defining a first cavity, a length and an axis; b. a cooling assembly in thermal contact with the first cavity: c. a semiconductor laser module assembly located in the first cavity, the semiconductor laser module assembly comprising: an outer wall defining a second cavity; d. a plurality of laser units located in the second cavity, each laser unit in thermal contact with the cooling assembly; each laser unit comprising a plurality of diode lasers; e. the laser diodes configured in the laser units, wherein the laser diodes are capable of generating a plurality of initial laser beamlets, wherein the initial laser beamlets from the laser units have substantially parallel beamlet paths and a spacing between the beamlet paths; f. the laser units configured in the second cavity, whereby the substantially parallel beamlet paths are directed toward a beam transformation system; g. the beam transformation system containing optics, wherein the beamlet paths are directed in a direction substantially parallel to the axis, and wherein the spacing between the beamlet paths is reduced; and, h. a focusing optics package, wherein an operation laser beam is formed. 2. The laser source of claim 1 , wherein the laser beamlets from each laser unit have a total power of greater than 10W, a wavelength from about 400 nm to about 900 nm, and an M 2 of less than 100. 3. The laser source of claim 2 , wherein the operational beam has a power of greater than 5 kW and an M 2 of less than 50. 4. The laser source of claim 2 , wherein the operational beam has a power of greater than 10 kW and an M 2 of less than 20. 5. The laser source of claim 2 , wherein the operational beam has a power of greater than 10 kW and an M 2 of less than 20, and a wavelength from about 400 nm to about 500 nm. 6. The laser source of claim 2 , wherein the operational beam has a power of greater than 10 kW and an M 2 of less than 20, and a wavelength from about 500 nm to about 600 nm. 7. The laser source of claim 1 , wherein the laser beamlets have a power of greater than 0.25 W, a wavelength from about 400 nm to about 900 nm, and an M 2 of less than 50. 8. The laser source of claim 7 , wherein the operational beam has a power of greater than 5 kW and an M 2 of less than 20. 9. The laser source of claim 1 , wherein the initial beamlet paths are substantially normal to the axis. 10. The laser source of claim 1 comprising a source of electrical power, wherein the electrical power source lowers an incoming voltage and increases an current to provide a transformed electrical power to the laser units. 11. The laser source of claim 7 comprising a source of electrical power, wherein the electrical power source lowers an incoming voltage and increases a current to provide a transformed electrical power supply to the laser units; wherein the incoming voltage is from about 400V to 1,000V and the incoming current is from about 40 A to 100 A; and the transformed electrical power supply has a voltage of from about 80V to 300V and a current of from about 80 A to 300 A. 12. A system for generating a high power operational laser beam in situ in a borehole, the system comprising: a. a mobile field unit, the mobile field unit comprising a control unit, a cooling system, conveyance structure, the conveyance structure having a proximal end and a distal end; b. the conveyance structure comprising a line structure, a cooling fluid delivery line, and an electrical power line; c. a downhole assembly in mechanical, fluid and electrical association with the distal end of the conveyance structure, whereby electrical power and cooling fluid can be supplied to the downhole assembly; d. the downhole assembly having an outer housing, the outer housing defining a first cavity, a length and an axis; e. a cooling assembly located in the first cavity, the cooling assembly having a cooling fluid flow channel, the fluid flow channel in fluid communication with the conveyance structure fluid delivery line; f. a semiconductor laser module assembly located in the first cavity, the semiconductor laser module assembly comprising: an outer wall defining a second cavity; g. a plurality of laser units located in the second cavity, each laser unit in thermal contact with the cooling assembly; each laser unit comprising a plurality of diode lasers; h. the laser diodes configured in the laser units, wherein the laser diodes are capable of generating a plurality of initial laser beamlets, wherein the initial laser beamlets from the laser units have substantially parallel beamlet paths and a spacing between the beamlet paths; i. the laser laser units configured in the second cavity, whereby the substantially parallel beamlet paths are directed toward a beam transformation system; j. the beam transformation system containing optics, wherein the beamlet paths are directed in a direction substantially parallel to the axis, and wherein the spacing between the beamlet paths is reduced; and, k. a focusing optics package, wherein an operation laser beam is formed. 13. The laser source of claim 12 , wherein the laser beamlets from each laser unit have a total power of greater than 10 W, a wavelength from about 400 nm to about 900 nm, and an M 2 of less than 100. 14. The laser source of claim 12 , wherein the operational beam has a power of greater than 10 kW and an M 2 of less than 20, and a wavelength from about 400 nm to about 500 nm. 15. The laser source of claim 12 , wherein the operational beam has a power of greater than 10 kW and an M 2 of less than 20, and a wavelength from about 500 nm to about 600 nm. 16. The laser systems of claim 12 , wherein the cooling system comprises an aqueous coolant, and has the capability to flow the coolant at a flow rate of at least about 2 gpm.

Assignees

Inventors

Classifications

  • Devices involving movement of the laser head in at least one axial direction · CPC title

  • by boring · CPC title

  • Fibre head, e.g. fibre probe termination (optical details of light guide terminations G02B6/241; reshaping of light guides G02B6/2552; optical details of coupling light into or out of fibre end G02B6/262) · CPC title

  • Array arrangements, e.g. constituted by discrete laser diodes or laser bar (H01S5/42 takes precedence) · CPC title

  • Liquid cooling, e.g. a liquid cools a mount of the laser · CPC title

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What does patent US10323460B2 cover?
Systems, apparatus and methods for performing laser operations in boreholes and other remote locations, such operations including laser drilling of a borehole in the earth. Systems, apparatus and methods for generating and delivering high power laser energy below the surface of the earth and within a borehole. Laser operations using such downhole generated laser beams.
Who is the assignee on this patent?
Foro Energy Inc
What technology area does this patent fall under?
Primary CPC classification E21B7/15. Mapped technology areas include Fixed Constructions.
When was this patent published?
Publication date Tue Jun 18 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).