System and method for miter and notch identification for pattern sew line generation

US10318657B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10318657-B2
Application numberUS-201615281259-A
CountryUS
Kind codeB2
Filing dateSep 30, 2016
Priority dateSep 30, 2016
Publication dateJun 11, 2019
Grant dateJun 11, 2019

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  5. First independent claim

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Abstract

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A system and method is provided that facilitates miter and notch identification for pattern sew line generation. A processor of the system may be configured to access a pattern data that defines a flat shape with cut lines corresponding to locations at which the shape is cut out of a material. Based on the pattern data, the processor may generate a computer-aided-design (CAD) model that includes a plurality of curves that define boundary edges of an object that corresponds to the shape defined by the pattern data. In addition, the processor may automatically identify portions of the boundary edges that correspond to alignment guides including at least one miter alignment guide, notch recess alignment guide, notch projection alignment guide, or combination thereof. Further, the processor may include at least one sew line in the CAD model that is parallel to and offset by the at least one seam allowance distance from at least one boundary edge towards the interior of the CAD model, without being offset by the at least one seam allowance distance from portions of the at least one boundary edge that include the identified alignment guides.

First claim

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What is claimed is: 1. A system for miter and notch identification for pattern sew line generation comprising: at least one processor configured to: access pattern data that defines a flat shape with cut lines corresponding to locations at which the shape is cut out of a material, wherein the pattern data does not specify sew lines offset from the cut lines on an interior portion of the shape; based on the pattern data, generate a computer-aided-design (CAD) model that includes a plurality of curves that define boundary edges of an object that corresponds to the shape defined by the pattern data; automatically identify portions of the boundary edges that correspond to alignment guides including at least one miter alignment guide, notch recess alignment guide, notch projection alignment guide, or combination thereof; after identification of the edges of the portions of the boundary edges that correspond to the alignment guides, place at least one sew line in the CAD model that is parallel to and offset by the at least one seam allowance distance from at least one boundary edge towards the interior of the CAD model, without being offset by the at least one seam allowance distance from portions of the at least one boundary edge that include the identified alignment guides. 2. The system according to claim 1 , wherein the processor is configured to automatically identify the alignment guides without basing the identification of the alignment guides on inputs through an input device that identify individual locations of alignment guides on the CAD model, wherein the at least one processor is configured to identify portions of the boundary edges of the CAD model that correspond to the at least one miter alignment guide, wherein the at least one processor is configured to identify portions of the boundary edge that correspond to at least one of the notch recess, notch projection, or combination thereof, wherein the at least one processor is configured to save the CAD model including the at least one sew line to at least one data store. 3. The system according to claim 2 , wherein the at least one processor is configured to cause the CAD model including the at least one sew line to be displayed through a display device. 4. The system according to claim 3 , wherein the at least one processor is configured to identify the notch recess or the notch projection alignment guide by determining that: the notch recess or the notch projection alignment guide is represented in the CAD model by two or three curves; the two or three curves are each in length less than twice the at least one seam allowance distance at the location of the notch; the two or three curves each have a minimum direction change of at least a first angle threshold from each other and from adjacent curves on the boundary edges connected directly to at least two of the two or three curves; and the adjacent curves on the boundary edges connected to at least two of the two or three curves extend along vectors that are coincident with each other or are at an angle with respect to each other that is less than a second angle threshold. 5. The system according to claim 4 , wherein the at least one processor is configured to identify a miter alignment guide by determining that both: the miter alignment guide is represented in the CAD model by a single curve having a length that is less than twice the seam allowance distance at the location of the miter alignment guide; and direction changes from the single curve of the miter alignment guide to adjacent curves on the boundary edges connected directly to each side of the single curve of the miter alignment guide are at least a third angle threshold. 6. The system according to claim 5 , wherein the first angle threshold is 20 degrees, wherein the second and third angle thresholds are 15 degrees. 7. The system according to claim 1 , wherein the pattern data includes at least one pattern file in either an AAMA or ASTM DXF format. 8. A method for miter and notch identification for pattern sew line generation comprising: through operation of at least one processor: accessing pattern data that defines a flat shape with cut lines corresponding to locations at which the shape is cut out of a material, wherein the pattern data does not specify sew lines offset from the cut lines on an interior portion of the shape; based on the pattern data, generating a computer-aided-design (CAD) model that includes a plurality of curves that define boundary edges of an object that corresponds to the shape defined by the pattern data; automatically identifying portions of the boundary edges that correspond to alignment guides including at least one miter alignment guide, notch recess alignment guide, notch projection alignment guide, or combination thereof; after identifying the portions of the boundary edges that correspond to the alignment guides, placing at least one sew line in the CAD model that is parallel to and offset by the at least one seam allowance distance from at least one boundary edge towards the interior of the CAD model, without being offset by the at least one seam allowance distance from portions of the at least one boundary edge that include the identified alignment guides. 9. The method according to claim 8 , wherein automatically identifying portions of the boundary edges that correspond to alignment guides is carried out without basing the identification of the alignment guides on inputs through an input device that identify individual locations of alignment guides on the CAD model, wherein automatically identifying portions of the boundary edges that correspond to alignment guides includes both: identifying portions of the boundary edges of the CAD model that correspond to the at least one miter alignment guide; and identify portions of the boundary edge that correspond to at least one of the notch recess, notch projection, or combination thereof, further comprising through operation of the at least one processor: saving the CAD model including the at least one sew line to at least one data store. 10. The method according to claim 9 , further comprising through operation of the at least one processor: causing the CAD model including the at least one sew line to be displayed through a display device. 11. The method according to claim 10 , wherein automatically identifying portions of the boundary edges that correspond to the notch recess or the notch projection alignment guide includes determining that: the notch recess or the notch projection alignment guide is represented in the CAD model by two or three curves; the two or three curves are each in length less than twice the at least one seam allowance distance at the location of the notch; the two or three curves each have a minimum direction change of at least a first angle threshold from each other and from adjacent curves on the boundary edges connected directly to at least two of the two or three curves; and the adjacent curves on the boundary edges connected to at least two of the two or three curves extend along vectors that are coincident with each other or are at an angle with respect to each other that is less than a second angle threshold. 12. The method according to claim 11 , wherein automatically identifying portions of the boundary edges that correspond to a miter alignment guide includes determining that both: the miter alignment guide is represented in the CAD model by a single curve having a length that is less than twice the seam allowance distance at the location of the miter alignment guide; and direction changes from the single curve of the miter alignment guide to adjacent c

Assignees

Inventors

Classifications

  • Computer-aided design [CAD] · CPC title

  • Cloth · CPC title

  • D05B19/02Primary

    Sewing machines having electronic memory or microprocessor control unit · CPC title

  • Physics · mapped topic

  • G06F17/50Primary

    Physics · mapped topic

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What does patent US10318657B2 cover?
A system and method is provided that facilitates miter and notch identification for pattern sew line generation. A processor of the system may be configured to access a pattern data that defines a flat shape with cut lines corresponding to locations at which the shape is cut out of a material. Based on the pattern data, the processor may generate a computer-aided-design (CAD) model that include…
Who is the assignee on this patent?
Siemens Product Lifecycle Man Software Inc
What technology area does this patent fall under?
Primary CPC classification D05B19/02. Mapped technology areas include Textiles & Paper.
When was this patent published?
Publication date Tue Jun 11 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).