Electromagnetic wave focusing device and optical apparatus including the same

US10317696B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10317696-B2
Application numberUS-201615379662-A
CountryUS
Kind codeB2
Filing dateDec 15, 2016
Priority dateJun 3, 2016
Publication dateJun 11, 2019
Grant dateJun 11, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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Electromagnetic wave focusing devices and optical apparatuses including the same are provided. An electromagnetic wave focusing device may include a plurality of material members located at different distances from a reference point. The intervals and/or widths of the material members may vary with distance from the reference point. For example, the intervals and/or widths of the material members may increase or decrease with distance from the reference point. The intervals and/or widths of the material members may be controlled to satisfy a spatial coherence condition with the electromagnetic wave.

First claim

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What is claimed is: 1. An electromagnetic wave focusing device comprising: a plurality of material members, wherein each of the plurality of material members at least partially surrounds a reference point and is located at a distance from the reference point different from distances at which all other of the plurality of material members are located, wherein the plurality of material members are arranged at non-uniform intervals, wherein the plurality of material members focus electromagnetic waves incident thereon and transmitted therethrough at a point in space, wherein each of the plurality of material members has a ring shape, and wherein the plurality of material members are arranged at different distances with respect to the reference point and satisfy: z i = j 1 , i 2 Y ⁢ ⁢ and Y = x i 2 z 1 wherein z i is a distance between an i-th surface and an (i−1)th surface of the material members, j 1,i is an i-th zero position of J 1 (x) which is a primary Bessel function, and x i is a material coefficient determined based on absorption and transmission properties of a medium, wherein the medium is a material member or a space between material members. 2. The electromagnetic wave focusing device of claim 1 , wherein a first pair of adjacent material members of the plurality of material members are disposed with a first interval therebetween; wherein a second pair of adjacent material members of the plurality of material members are disposed with a second interval therebetween, wherein the second interval is different from the first interval. 3. The electromagnetic wave focusing device of claim 1 , wherein the intervals increase with distance from the reference point. 4. The electromagnetic wave focusing device of claim 1 , wherein the intervals decrease with distance from the reference point. 5. The electromagnetic wave focusing device of claim 1 , wherein, for each of the plurality of material members, a width is defined as a distance between an inner circumference and an outer circumference, and at least a first width of a first one of the plurality of material members is different from a second width of a second one of the plurality of material members. 6. The electromagnetic wave focusing device of claim 5 , wherein widths of the plurality of material members vary with distance from the reference point. 7. The electromagnetic wave focusing device of claim 5 , wherein the intervals and widths of the plurality of material members sequentially increase or decrease with distance from the reference point. 8. The electromagnetic wave focusing device of claim 1 , wherein each of the plurality of material members comprises one of a dielectric material and a semiconductor material. 9. The electromagnetic wave focusing device of claim 1 , wherein each of the plurality of material members comprises one of Si, Ge, GaP, SiOx, SiNx, and an oxide semiconductor, and the oxide semiconductor comprises at least one of Zn, In, Ga, and Sn. 10. The electromagnetic wave focusing device of claim 1 , wherein a first thickness of a first one of the plurality of material members is different from a second thickness of a second one of the plurality of material members. 11. The electromagnetic wave focusing device of claim 1 , wherein the plurality of material members comprises a first material member and a second material member, at least the first material member has a multilayer structure, and a number of material layers constituting the first material member is different from a number of material layers constituting the second material member. 12. The electromagnetic wave focusing device of claim 1 , wherein thicknesses of the plurality of material members range from several tens of nanometers (nm) to several micrometers (μm). 13. The electromagnetic wave focusing device of claim 1 , wherein an entire width of the plurality of material members ranges from about 0.5 μm to about 50 μm. 14. The electromagnetic wave focusing device of claim 1 , wherein a numerical aperture (NA) of the electromagnetic wave focusing device is equal to or greater than 0.3. 15. The electromagnetic wave focusing device of claim 1 , wherein the electromagnetic wave focusing device is configured to output an output light having a full width at half maximum (FWHM) that is less than ½ of a wavelength of an incident light. 16. The electromagnetic wave focusing device of claim 1 , further comprising a transparent substrate, wherein the plurality of material members are provided on a surface of the transparent substrate. 17. An optical apparatus comprising the electromagnetic wave focusing device of claim 1 . 18. A microscope comprising: an objective lens unit arranged facing an object to be observed, the objective lens unit comprising the electromagnetic wave focusing device of claim 1 ; an electromagnetic wave source unit configured to irradiate electromagnetic waves toward the objective lens unit; and an image providing unit configured to display an image of the object obtained through the objective lens unit. 19. The microscope of claim 18 , having a resolving power that is less than ½ of a wavelength of the electromagnetic waves incident upon the electromagnetic wave focusing device. 20. The microscope of claim 18 , being configured to obtain an image of the object by scanning the object. 21. The electromagnetic wave focusing device of claim 1 , wherein: x i =√{square root over (2α 0 z i δT )}, wherein β 0 is an absorption coefficient of the medium, δ is a half width at half maximum of an absorption spectrum of the medium, and T is a time during which light passes through the medium. 22. An electromagnetic wave focusing device for focusing electromagnetic waves at a point in space, the electromagnetic wave focusing device comprising: a plurality of material members, wherein each of the plurality of material members at least partially surrounds a reference point and is located at a distance from the reference point different from distances at which all other of the plurality of material members are located, wherein intervals and widths of the plurality of material members vary to satisfy spatial coherence with the electromagnetic waves with distance from the r

Assignees

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Classifications

  • with pitch less than or comparable to the wavelength · CPC title

  • Diffractive Fresnel lenses; Zone plates; Kinoforms (G02B5/1842, G02B5/1847 take precedence; optical systems having diffractive correction means G02B27/0037; Fresnel lenses operating by refraction G02B3/08) · CPC title

  • made of crystals, e.g. rock-salt, semi-conductors (G02B1/08 takes precedence) · CPC title

  • G02B27/58Primary

    Optics for apodization or superresolution; Optical synthetic aperture systems · CPC title

  • Objectives · CPC title

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What does patent US10317696B2 cover?
Electromagnetic wave focusing devices and optical apparatuses including the same are provided. An electromagnetic wave focusing device may include a plurality of material members located at different distances from a reference point. The intervals and/or widths of the material members may vary with distance from the reference point. For example, the intervals and/or widths of the material membe…
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification G02B27/58. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 11 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).