Light-field microscopy with phase masking

Patent metadata

Field	Value
Publication number	US-10317597-B2
Application number	US-201514828259-A
Country	US
Kind code	B2
Filing date	Aug 17, 2015
Priority date	Aug 26, 2014
Publication date	Jun 11, 2019
Grant date	Jun 11, 2019

Abstract

Various aspects of the present disclosure are directed toward optics and imaging. As may be implemented with one or more embodiments, an apparatus includes one or more phase masks that operate with an objective lens and a microlens array to alter a phase characteristic of light travelling in a path from a specimen, through the objective lens and microlens array and to a photosensor array. Using this approach, the specimen can be imaged with spatial resolution characteristics provided via the altered phase characteristic, which can facilitate construction of an image with enhanced resolution.

First claim

What is claimed is:

1. An apparatus comprising:
an objective lens;
a microlens element;
a phase mask component configured and arranged to alter a phase characteristic of light travelling in a path through the objective lens and the microlens element, wherein the phase mask component is separate from the microlens element and also located along the path; and
at least one optical element including photosensors configured and arranged to detect light rays received from a specimen via the objective lens, phase mask component and microlens element, and to provide an output indicative of an image of the specimen with spatial resolution characteristics provided via the altered phase characteristic wherein the photosensors are configured and arranged to detect light rays received at different angles from the specimen via the objective lens and microlens array, the light rays detected by respective sets of the photosensors representing aliased views of the specimen and further including a processor circuit configured and arranged with the photosensors to reconstruct a deconvolved volume image of the specimen by combining the aliased views detected by the sets of photosensors based upon overlapping light rays from the different angles in the volume and based upon characteristics of the phase mask component.

2. The apparatus of claim 1 , wherein the phase mask component includes a first phase mask located at a back focal plane of the objective lens, and a second phase mask at a native image plane of the apparatus.

3. The apparatus of claim 2 , wherein the first phase mask is configured and arranged with the microlens element to set a size of a point spread function (PSF) at a native image plane sampled by the microlens element, and the second phase mask is configured and arranged to shape the PSF at a plane in which the at least one optical element lies.

4. The apparatus of claim 2 , wherein the second phase mask includes an array of phase masks.

5. The apparatus of claim 1 , wherein the phase mask component is configured and arranged to alter the phase characteristic in a PSF of a light field provided by the light rays detected at the at least one optical element.

6. An apparatus comprising:
an objective lens;
a microlens element;
a phase mask component configured and arranged to alter a phase characteristic of light travelling in a path through the objective lens and the microlens element;
at least one optical element including photosensors configured and arranged to detect light rays received from a specimen via the objective lens, phase mask component and microlens element, and to provide an output indicative of an image of the specimen with spatial resolution characteristics provided via the altered phase characteristic;
wherein the photosensors are configured and arranged to detect light rays received at different angles from the specimen via the objective lens and microlens array, the light rays detected by respective sets of the photosensors representing aliased views of the specimen; and
further including a processor circuit configured and arranged with the photosensors to reconstruct a deconvolved volume image of the specimen by combining the aliased views detected by the sets of photosensors based upon overlapping light rays from the different angles in the volume and based upon characteristics of the phase mask component.

7. The apparatus of claim 6 , wherein
the phase mask component is configured and arranged to alter the phase characteristic by altering an intensity distribution in a PSF of a light field provided by the light rays detected at the at least one optical element, and
the processor circuit is configured and arranged to reconstruct the deconvolved volume image of the specimen based upon characteristics of the phase mask component by reconstructing the deconvolved volume image based upon the altered intensity distribution.

8. The apparatus of claim 1 , wherein the phase mask component includes a phase mask located at a back focal plane of the objective lens and configured and arranged to provide a PSF at a native image plane that:
has the same size for all positions of a point source in a volume of the specimen, and
exhibits different shapes for different depths of the point source in the volume.

9. The apparatus of claim 1 , wherein the phase mask component is configured and arranged with the at least one optical element to shape a point spread function attributable to objects imaged via the apparatus.

10. The apparatus of claim 1 , further including a processor circuit configured and arranged to process the output of the at least one optical element, to provide a two-dimensional or three-dimensional image of the specimen, based on the altered phase characteristic.

11. The apparatus of claim 1 , wherein the phase mask component is configured and arranged to alter the phase characteristic by altering an intensity distribution in a PSF of a light field provided by the light rays detected at the at least one optical element.

12. The apparatus of claim 1 , wherein the microlens element includes a microlens array.

13. The apparatus of claim 1 , wherein the at least one optical element includes a photosensor array.

14. The apparatus of claim 1 , wherein each of the microlens element and the phase mask component are integrated in a single optical element, and the phase mask component is configured and arranged to provide a phase function that is different from a phase function provided by the microlens element.

15. A method comprising:
using a phase mask component, altering a phase characteristic of light rays travelling in a path from a specimen through an objective lens and a microlens element, wherein the phase mask component is separate from the microlens element and also located along the path;
using at least one optical element including photosensors, detecting the light rays received from the specimen via the objective lens, phase mask component and microlens element; and
via the detected light rays and the photosensors, providing an output indicative of an image of the specimen with spatial resolution characteristics provided via the altered phase characteristic wherein altering the phase characteristic includes altering an intensity distribution in a PSF of a light field provided by the light rays; wherein detecting the light rays includes detecting light rays received at different angles from the specimen via the objective lens and microlens array, the light rays representing aliased views of the specimen; and further including reconstructing a deconvolved volume image of the specimen by combining the aliased views based upon overlapping light rays from the different angles and based upon the altered intensity distribution.

16. The method of claim 15 , wherein altering the phase characteristic includes
using an objective phase mask to control the size of a point spread function (PSF) at a native image plane that is sampled by the microlens element, and
using microlens phase masks to shape the PSF at a plane in which the photosensors lie, therein resolving high frequency light over a wide range of depths.

17. The method of claim 15 , wherein altering the phase characteristic includes altering the phase characteristic with an objective phase mask located between the objective lens and the microlens element, and further altering the phase characteristic with a microlens phase mask at a plane in which the photosensors lie.

18. A method comprising:
using a phase mask component, altering a phase characteristic of light rays travelli

Assignees

• Univ Leland Stanford Junior

Inventors

• Cohen Noy
• Levoy Marc S
• Broxton Michael J
• Grosenick Logan
• Yang Samuel
• Andalman Aaron
• Disseroth Karl A
• Horowitz Mark A

Classifications

• G02B5/3083 Primary

  Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001) · CPC title

• G02B3/0006

  Arrays (G02B3/02, G02B5/188 take precedence) · CPC title

• G02B21/0056

  based on optical coherence, e.g. phase-contrast arrangements, interference arrangements · CPC title

• G02B27/0075

  with means for altering, e.g. increasing, the depth of field or depth of focus · CPC title