Quantum dot film

Patent metadata

Field	Value
Publication number	US-10316245-B2
Application number	US-201414762173-A
Country	US
Kind code	B2
Filing date	Jan 16, 2014
Priority date	Jan 21, 2013
Publication date	Jun 11, 2019
Grant date	Jun 11, 2019

Abstract

A quantum dot film article includes a first barrier film, a second barrier film, and a quantum dot layer separating the first barrier from the second barrier film. The quantum dot layer includes quantum dots dispersed in a polymer material. The polymer material includes a methacrylate polymer, an epoxy polymer and a photoinitiator.

First claim

What is claimed is:

1. A quantum dot film article comprising:
a first barrier film;
a second barrier film; and
a quantum dot layer separating the first barrier film from the second barrier film, the quantum dot layer comprising quantum dots dispersed in a polymer material, the polymer material comprising a methacrylate polymer with a bisphenol-A, bisphenol-F or resorcinol backbone, an epoxy polymer and a photoinitiator.

2. A quantum dot film article according to claim 1 , wherein the methacrylate polymer comprises 5 to 25 wt % of the quantum dot layer.

3. A quantum dot film article according to claim 1 , wherein the methacrylate polymer comprises 10 to 20 wt % of the quantum dot layer.

4. A quantum dot film article according to claim 1 , wherein the epoxy polymer comprises 70 to 90 wt % of the quantum dot layer.

5. A quantum dot film article according to claim 1 , wherein the epoxy polymer comprises an epoxy amine polymer.

6. A quantum dot film article according to claim 1 , wherein the epoxy polymer has a refractive index of 1.48 to 1.60.

7. A quantum dot film article according to claim 1 , wherein the epoxy polymer contains scattering particles having an average size in a range from 1 to 10 micrometers.

8. A quantum dot film article according to claim 1 , wherein the methacrylate polymer is formed by radiation polymerization of di- or tri-functional methacrylate polymer precursors.

9. A quantum dot film article according to claim 1 , wherein the epoxy polymer is formed by thermal polymerization of difunctional amine and diepoxide.

10. A method of forming a quantum dot film article comprising:
coating a quantum dot material on a first barrier layer, the quantum dot material comprising:
quantum dots;
photoinitiator;
5 to 25% wt methacrylate polymer precursors with a bisphenol-A, bisphenol-F or resorcinol backbone; and
70 to 90 wt % epoxy polymer precursors;
the quantum dot material having a first viscosity at a first temperature; and
disposing a second barrier layer on the quantum dot material.

11. A method according to claim 10 , further comprising polymerizing the methacrylate polymer precursors to form a partially cured quantum dot material.

12. A method according to claim 11 , further comprising polymerizing the epoxy polymer precursors of the partially cured quantum dot material to form a cured quantum dot material.

13. A method according to claim 11 , wherein polymerizing the methacrylate polymer precursors comprises radiation polymerizing the methacrylate polymer precursors.

14. A method according to claim 12 , wherein polymerizing the epoxy polymer precursors comprises thermal polymerizing the epoxy polymer precursors.

15. A method according to claim 11 , wherein polymerizing the methacrylate polymer precursors forms a partially cured quantum dot material having a second viscosity at the first temperature being at least 10 times greater than the first viscosity.

16. A method according to claim 11 , wherein polymerizing the methacrylate polymer precursors forms a partially cured quantum dot material having a second viscosity at the first temperature being at least 20 times greater than the first viscosity.

17. A method according to claim 10 , wherein the first viscosity is less than 10000 centipoise.

18. A method according to claim 15 , wherein the second viscosity is greater than 100000 centipoise.

19. A method according to claim 10 , wherein the epoxy polymer precursors comprise difunctional amine and diepoxide.

20. A method according to claim 10 , wherein the methacrylate polymer precursors comprise di- or tri-functional methacrylate polymer precursors.

21. A quantum dot material comprising:
quantum dots;
photoinitiator;
5 to 25% wt methacrylate polymer precursors with a bisphenol-A, bisphenol-F or resorcinol backbone; and
70 to 90 wt % epoxy polymer precursors.

22. A quantum dot material according to claim 21 , wherein the methacrylate polymer precursors are UV curable methacrylate polymer precursors and the epoxy polymer precursors are thermally curable epoxy polymer precursors.

Assignees

• 3M Innovative Properties Co
• Nanosys Inc

Inventors

• Nelson Eric W
• Eckert Karissa L
• Kolb William Blake
• Nesvik Tyler D
• Tu Minghu

Classifications

• C09K11/025 Primary

  non-luminescent particle coatings or suspension media · CPC title

• Y10S977/892

  Liquid phase deposition · CPC title

• Y10T428/25

  Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles · CPC title

• Y10S977/774

  Exhibiting three-dimensional carrier confinement, e.g. quantum dots · CPC title

• B32B2551/00

  Optical elements · CPC title