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Nitrogen-containing ligands and their use in atomic layer deposition methods
US10315995B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10315995-B2 |
| Application number | US-201715407369-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 17, 2017 |
| Priority date | Oct 29, 2010 |
| Publication date | Jun 11, 2019 |
| Grant date | Jun 11, 2019 |
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- Title
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Abstract
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Methods for deposition of elemental metal films on surfaces using metal coordination complexes comprising nitrogen-containing ligands are provided. Also provided are nitrogen-containing ligands useful in the methods of the invention and metal coordination complexes comprising these ligands.
First claim
Opening claim text (preview).
What is claimed is: 1. A metal coordinating ligand having a formula wherein each R is independently hydrogen, C 1-6 alkyl, acyl, aldehyde, keto or C 2-4 alkenyl, provided that at least one of R 1 , R 2 , R 3 and R 4 is not methyl. 2. A metal coordination complex which has a formula wherein each R is independently hydrogen, C 1-6 alkyl, acyl, aldehyde, keto or C 2-4 alkenyl, L is one or more neutral, anionic or mixed ligands, and M is a transition metal ion or a boron group ion, provided that at least one of R 1 , R 2 , R 3 and R 4 is not methyl. 3. The metal coordination complex of claim 2 , wherein the transition metal ion or the boron group ion is selected from the group consisting of aluminum, titanium, tungsten, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, palladium, platinum, rhodium, iridium, silver, gold, hafnium, manganese, ruthenium and copper. 4. An apparatus comprising: a deposition chamber; and the metal coordination complex of claim 2 . 5. The apparatus of claim 4 , wherein the metal coordination complex is in the vapor phase.
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Classifications
having amino groups bound to two or three six-membered aromatic rings · CPC title
without C-boron linkages · CPC title
Compounds containing elements of Groups 1 or 11 of the Periodic Table · CPC title
Radicals substituted by nitrogen atoms not forming part of a nitro radical · CPC title
compounds without a metal-carbon linkage · CPC title
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Frequently asked questions
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- What does patent US10315995B2 cover?
- Methods for deposition of elemental metal films on surfaces using metal coordination complexes comprising nitrogen-containing ligands are provided. Also provided are nitrogen-containing ligands useful in the methods of the invention and metal coordination complexes comprising these ligands.
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification C07D213/38. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jun 11 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).