Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-10312115-B2
Application number	US-201514856941-A
Country	US
Kind code	B2
Filing date	Sep 17, 2015
Priority date	Sep 30, 2014
Publication date	Jun 4, 2019
Grant date	Jun 4, 2019

Abstract

A processing liquid is supplied from a supply tank to a processing liquid nozzle of a processing unit, and the processing liquid is supplied from the processing liquid nozzle to a substrate. The processing liquid used in the processing unit is collected and selectively supplied to first and second replenishment tanks. In a period in which the used processing liquid is supplied to the first replenishment tank, the supply tank is replenished with the processing liquid in the second replenishment tank, and the processing liquid in the first replenishment tank circulates while being heated by a heater. In a period in which the used processing liquid is supplied to the second replenishment tank, the supply tank is replenished with the processing liquid in the first replenishment tank and the processing liquid in the second replenishment tank circulates while being heated by the heater.

First claim

I claim:

1. A substrate processing apparatus comprising:
a processing unit including a processing liquid nozzle that supplies a processing liquid to a substrate;
a supply tank that supplies the processing liquid to the processing liquid nozzle;
a first replenishment tank and a second replenishment tank for replenishing the supply tank with the processing liquid;
a processing liquid collector connected to the processing unit to collect the processing liquid used in the processing unit and selectively supply the used processing liquid to the first and second replenishment tanks;
a processing liquid replenisher connected to the supply tank to selectively replenish the supply tank with the processing liquid from the first and second replenishment tanks;
a processing liquid circulator connected to the first and second replenishment tanks to selectively circulate the processing liquid in the first replenishment tank and the processing liquid in the second replenishment tank;
a heater that heats the processing liquid passing through the processing liquid circulator; and
a controller configured to control the processing liquid replenisher to replenish the supply tank with the processing liquid in the second replenishment tank, and control the processing liquid circulator to circulate the processing liquid in the first replenishment tank while being heated by the heater, in a period in which the used processing liquid collected by the processing liquid collector is supplied to the first replenishment tank, and control the processing liquid replenisher to replenish the supply tank with the processing liquid in the first replenishment tank, and control the processing liquid circulator to circulate the processing liquid in the second replenishment tank while being heated by the heater, in a period in which the used processing liquid collected by the processing liquid collector is supplied to the second replenishment tank.

2. The substrate processing apparatus according to claim 1 , further comprising a temperature regulator that regulates a temperature of the processing liquid passing through the processing liquid replenisher, wherein
the processing liquid replenisher includes a replenishment circulator connected to the first and second replenishment tanks to be on standby for replenishing the supply tank with the processing liquid while circulating the processing liquid in the first and second replenishment tanks through the temperature regulator, and
output of the temperature regulator is lower than output of the heater.

3. The substrate processing apparatus according to claim 2 , wherein
the replenishment circulator is connected to the first and second replenishment tanks to selectively circulate the processing liquid in the first replenishment tank and the processing liquid in the second replenishment tank.

4. The substrate processing apparatus according to claim 3 , wherein
the controller is configured to control the replenishment circulator to circulate the processing liquid in the first replenishment tank while a temperature of the processing liquid in the first replenishment tank is regulated by the temperature regulator, in a period in which the used processing liquid collected by the processing liquid collector is supplied to the second replenishment tank, and control the replenishment circulator to circulate the processing liquid in the second replenishment tank while a temperature of the processing liquid in the second replenishment tank is regulated by the temperature regulator, in a period in which the used processing liquid collected by the processing liquid collector is supplied to the first replenishment tank.

5. The substrate processing apparatus according to claim 2 , wherein
the processing unit includes a cup that is provided to surround the substrate and catches the used processing liquid,
the processing liquid collector includes
a first collection pipe connected to the cup of the processing unit,
second and third collection pipes respectively connected between the first collection pipe and each of the first and second replenishment tanks, and
first and second collection valves respectively inserted into the second and third collection pipes,
the processing liquid replenisher includes
a first replenishment pipe connected to the supply tank,
second and third replenishment pipes respectively connected between the first replenishment pipe and each of the first and second replenishment tanks, and
the first and second replenishment valves respectively inserted into the second and third replenishment pipes,
the processing liquid circulator includes
first and second circulation pipes connected to the first replenishment tank,
third and fourth circulation pipes connected to the second replenishment tank,
a fifth circulation pipe that is connected between the first circulation pipe and the second circulation pipe and is connected between the third circulation pipe and the fourth circulation pipe, and
first, second, third and fourth circulation valves respectively inserted into the first, second third and fourth circulation pipes, and
the controller opens the second replenishment valve, the first circulation valve and the second circulation valve and closes the first replenishment valve, the third circulation valve and the fourth circulation valve in opening the first collection valve and closing the second collection valve, and opens the first replenishment valve, the third circulation valve and the fourth circulation valve and closes the second replenishment valve, the first circulation valve and the second circulation valve in opening the second collection valve and closing the first collection valve.

6. The substrate processing apparatus according to claim 5 , wherein
the heater is inserted into the fifth circulation pipe of the processing liquid circulator.

7. The substrate processing apparatus according to claim 5 , wherein
the temperature regulator is inserted into the first replenishment pipe of the processing liquid replenisher.

8. The substrate processing apparatus according to claim 5 , wherein
the replenishment circulator includes
fourth and fifth replenishment pipes respectively connected between the first replenishment pipe and each of the first and second replenishment tanks, and
third and fourth replenishment valves respectively inserted into the fourth and fifth replenishment pipes, and
the controller opens the fourth replenishment valve and closes the third replenishment valve in opening the first collection valve and closing the second collection valve, and opens the third replenishment valve and closes the fourth replenishment valve in opening the second collection valve and closing the first collection valve.

9. The substrate processing apparatus according to claim 1 , further comprising each of first and second detection sensors that detects an amount of the processing liquid in each of the first and second replenishment tanks, wherein
the controller controls the processing liquid collector to switch between a period in which the used processing liquid is supplied to the first replenishment tank and a period in which the used processing liquid is supplied to the second replenishment tank based on the amount of the processing liquid detected by each of the first and second detection sensors.

10. The substrate processing apparatus according to claim 1 , further comprising a new liquid supply device that supplies the processing liquid to the supply tank, the first replenishment tank or the second replenishment tank.

Assignees

• Screen Holdings Co Ltd

Inventors

• Namba Toshimitsu

Classifications

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0424 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0404 Primary

  for general liquid treatment, e.g. etching followed by cleaning · CPC title

• H01L21/67115

  Electricity · mapped topic