Block copolymers having a polydimethylsiloxane block

US10301434B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10301434-B2
Application numberUS-201414759821-A
CountryUS
Kind codeB2
Filing dateJan 17, 2014
Priority dateJan 18, 2013
Publication dateMay 28, 2019
Grant dateMay 28, 2019

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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The present invention relates to novel block copolymers of general formula (I). The invention further relates to a method for producing such block copolymers and to the use of such block copolymers, particularly as additives in liquid coating-agent compositions. A{X—[O—C(O)NH—Y—NH—C(O)—O-M-B]k}n (I). In formula (I), the variables have the following meanings: n is a number in the range from 1 to 40 or 2 to 40, particularly 1 to 10 or 2 to 10 and especially 2 to 5; k is 1 or 2; A is a poly(dimethylsiloxane) block; B is a polymer block constructed of ethylenically unsaturated monomers, which optionally comprises a terminal group different from hydrogen; X is a bivalent or trivalent group having 2 to 20 C atoms, which is saturated or unsaturated and which optionally bears 1, 2, 3, or 4 substituents selected from among OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and halogen; Y is a bivalent hydrocarbon group having 2 to 20 C atoms, which is saturated or unsaturated, and M is a chemical bond or C2-C10 alkylene, which can be interrupted by one or two groups not directly adjacent, selected from among O, C(═O)O, and (C═O)NH and which optionally bears 1, 2, 3, or 4 substituents selected from among OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and phenyl.

First claim

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The invention claimed is: 1. A block copolymer of the general formula I A{X—[O—C(O)NH—Y—NH—C(O)—O-M-B] k } n   (I) in which n is a number in the range from 2 to 40; k is 1 or 2; A is a poly(dimethylsiloxane) block; B is a polymer block which comprises polymerized units of one or more ethylenically unsaturated monomers and which optionally has an end group other than hydrogen; X is a divalent or trivalent radical having 2 to 20 C atoms, which is saturated or unsaturated and which optionally carries 1, 2, 3, or 4 substituents selected from OH, COOH, CONH 2 , C 1 -C 4 alkoxy, C 1 -C 4 alkoxycarbonyl, and halogen; Y is a divalent hydrocarbon radical having 2 to 20 C atoms, which is saturated or unsaturated, M is a chemical bond or C 2 -C 10 alkylene which may be interrupted by one or two groups that are not directly adjacent and that are selected from O, C(═O)O, and (C═O)NH, and which optionally carries 1, 2, 3, or 4 substituents selected from OH, COOH, CONH 2 , C 1 -C 4 alkoxy, C 1 -C 4 alkoxycarbonyl, and phenyl, wherein A is the only poly(dimethylsiloxane) block in the block copolymer, the polymer block B has a number-average molecular weight in the range from 1000 to 50 000 g/mol, and the polymer block B comprises, to an extent of at least 50 wt. % based on B, polymerized units of one or more monoethylenically unsaturated monomers selected from the group consisting of esters of acrylic acid with C 1 -C 20 alkanols, esters of methacrylic acid with C 1 -C 20 alkanols, esters of acrylic acid with C 5 -C 20 cycloalkanols, esters of methacrylic acid with C 5 -C 20 -cycloalkanols, esters of acrylic acid with polyethermonools, and esters of methacrylic acid with polyethermonools. 2. The block copolymer according to claim 1 , wherein the polydimethylsiloxane block A has a number-average molecular weight in the range from 200 to 20 000 g/mol. 3. The block copolymer according to claim 1 , having a number-average molecular weight in the range from 1500 to 200 000 g/mol. 4. The block copolymer according to claim 1 , wherein the polydimethylsiloxane block A makes up 0.1 to 70 wt. %, based on the total mass of the block copolymer. 5. The block copolymer according to claim 1 , wherein the polymer block B has a terminal group of the formula Z in which # denotes the attachment to a C atom of the polymer block B, R 1 and R 2 independently of one another are C 1 -C 20 alkyl which optionally carries a substituent selected from C 1 -C 4 alkoxy and C 1 -C 4 alkoxy-C 1 -C 4 alkoxy, or R 1 and R 2 together are linear C 2 -C 10 alkylene or linear C 2 -C 10 alkenylene in which optionally one or two CH 2 groups may have been replaced by O, C═O, or NR x , where linear C 2 -C 10 alkylene and linear C 2 -C 10 alkenylene are unsubstituted or have 1, 2, 3, or 4 substituents from the group C 1 -C 4 alkyl, C 1 -C 4 alkoxy, C 1 -C 4 alkoxy-C 1 -C 4 alkoxy, COOH, and CONH 2 , and R x is C 1 -C 4 alkyl or C 1 -C 4 alkoxy; R 3 , R 4 , R 5 , and R 6 independently of one another are C 1 -C 4 alkyl. 6. The block copolymer according to claim 1 , wherein n is on average 2 to 10. 7. The block copolymer according to claim 1 , wherein X is C 2 -C 10 alkylene or C 2 -C 10 alkenylene which are unsubstituted or have 1 or 2 substituents from the group OH, C 1 -C 4 alkoxy, COOH, and C 1 -C 4 alkoxycarbonyl, the C 2 -C 10 alkylene being optionally interrupted by 1, 2, 3, or 4 nonadjacent oxygen atoms. 8. The block copolymer according to claim 1 , wherein Y is C 2 -C 10 alkylene, C 2 -C 10 alkenylene, C 5 -C 10 cycloalkylene, which optionally has 1, 2, or 3 methyl groups, phenylene, which optionally has 1, 2, or 3 methyl groups, or a group Q-R-(Q) q , in which q is 0 or 1, Q is C 5 -C 10 cycloalkylene, which optionally has 1, 2, or 3 methyl groups, or phenylene, which optionally has 1, 2, or 3 methyl groups, and R is C 1 -C 10 alkylene. 9. The block copolymer according to claim 1 , obtainable by a process which comprises the following steps: i) providing an OH-functionalized poly(dimethylsiloxane) of the formula A[X(—OH) k ] n , ii) providing an OH-functionalized polymer B-M-OH which is composed of ethylenically unsaturated monomers; iii) reacting the OH-functionalized polymer B-M-OH which is composed of ethylenically unsaturated monomers with a diisocyanate of the formula II O═C═N—Y—N═C═O  (II)  to give an isocyanate-functionalized polymer of the formula III: O═C═N—Y—NH—C(O)—O-M-B  (III)  wherein n is a number in the range from 2 to 40; k is 1 or 2; A is a poly(dimethylsiloxane) block; X is a divalent or trivalent radical having 2 to 20 C atoms, which is saturated or unsaturated and which optionally carries 1, 2, 3, or 4 substituents selected from OH, COOH, CONH 2 , C 1 -C 4 alkoxy, C 1 -C 4 alkoxycarbonyl, and halogen; B is a polymer block which comprises polymerized units of one or more ethylenically unsaturated monomers and which optionally has an end group other than hydrogen; Y is a divalent hydrocarbon radical having 2 to 20 C atoms, which is saturated or unsaturated, M is a chemical bond or C2-C10 alkylene which may be interrupted by one or two groups that are not directly adjacent and that are selected from O, C(═O)O, and (C═O)NH, and which optionally carries 1, 2, 3, or 4 substituents selected from OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and phenyl; iv) reacting the isocyanate-functionalized polymer of the formula III with the OH-functionalized poly(dimethylsiloxane) of the formula A[X(—OH) k ] n provided in step i), wherein the polymer block B has a number-average molecular weight in the range from 1000 to 50 000 g/mol, and the polymer block B comprises, to an extent of at least 50 wt. % based on B, polymerized units of one or more monoethylenically unsaturated monomers selected from the group consisting of esters of acrylic acid with C 1 -C 20 alkanols, esters of methacrylic acid with C 1 -C 20 alkanols, esters of acrylic acid with C 5 -C 20 cycloalkanols, esters of methacrylic acid with C 5 -C 20 -cycloalkanols, esters of acrylic acid with polyethermonools, and esters of methacrylic acid with polyethermonools. 10. A process for preparing a block copolymer according to claim 1 , which comprises the following steps: i) providing an OH-functionalized poly(dimethylsiloxane) of the formula A[X(—OH) k ] n , ii) providing an OH-functionalized polymer B-M-OH which comprises polymerized units of one or more ethylenically unsaturated monomers; iii) reacting the OH-functionalized poly(dimethylsiloxane) of the formula A[X(—OH) k ] n , provided in step i), with a diisocyanate of the formula II O═C═N—Y—N═C═O  (II)  to give an isocyanate-functionalized polydimethylsiloxane of the formula IV: [(O═C═N—Y—NH—C(O)—O) k —X] n -A  (IV)  wherein n is a number in the range from 2 to 40; k is 1 or 2; A is a poly(dimethylsiloxane) block; X is a divalent or trivalent radical having 2 to 20 C atoms, which is saturated or unsaturated and which optionally carries 1, 2, 3, or 4 substituents selected from OH, COOH, CONH 2 , C 1 -C 4 alkoxy, C 1 -C 4 alkoxycarbonyl, and halogen; B is a polymer block which comprises polymerized units of one or more ethylenically unsaturated monomers and which optionally has an end group other than hydrogen; Y is a divalent hydrocarbon radical having 2 to 20 C atoms, which is saturated or unsaturated, M is a chemical bond or C2-C10 alkylene which may be interrupted by one or two groups that are not directly adjacent and that are selected from O, C(═O)O, and (C═O)NH, and which optionally car

Assignees

Inventors

Classifications

  • Block or graft copolymers containing polysiloxane sequences (obtained by polymerising a compound having a carbon-to-carbon double bond on to a polysiloxane C09D151/08, C09D153/00) · CPC title

  • on to polysiloxanes · CPC title

  • Block- or graft-copolymers containing polysiloxane sequences (obtained by polymerising a compound having a carbon-to-carbon double bond on to a polysiloxane C08L51/08, C08L53/00) · CPC title

  • Polyurethanes · CPC title

  • C08G77/442Primary

    containing vinyl polymer sequences · CPC title

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What does patent US10301434B2 cover?
The present invention relates to novel block copolymers of general formula (I). The invention further relates to a method for producing such block copolymers and to the use of such block copolymers, particularly as additives in liquid coating-agent compositions. A{X—[O—C(O)NH—Y—NH—C(O)—O-M-B]k}n (I). In formula (I), the variables have the following meanings: n is a number in the range from 1 to…
Who is the assignee on this patent?
Basf Se
What technology area does this patent fall under?
Primary CPC classification C08G77/442. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 28 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).