Fine particles, particle group, anti-counterfeiting ink, anti-counterfeiting toner, anti-counterfeiting sheet, and anti-counterfeiting medium
US-9223235-B2 · Dec 29, 2015 · US
US10286719B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10286719-B2 |
| Application number | US-201515521807-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 4, 2015 |
| Priority date | Nov 5, 2014 |
| Publication date | May 14, 2019 |
| Grant date | May 14, 2019 |
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A method of manufacturing a part with an anti-counterfeit feature is provided. The method includes providing a part to be marked for anti-counterfeiting. The part is provided with a radiation impacting feature on or within the part. The radiation impacting feature is configured to at least one of (i) prevent accurate imaging of at least a portion of the part and (ii) provide unique authentication of the part.
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a part with an anti-counterfeit feature, comprising: providing the part to be marked for anti-counterfeiting; and providing a radiation impacting feature on or within the part, wherein the radiation impacting feature is configured to (i) prevent accurate imaging of at least a portion of the part and (ii) provide unique authentication of the part. 2. The manufacturing method of claim 1 , wherein the radiation impacting feature is provided at least one of (i) on an external surface of the part, (ii) on an internal surface of the part, (iii) within a subsurface of the part, and (iv) within a material that forms a portion of the part. 3. The manufacturing method of claim 1 , wherein the radiation impacting feature comprises at least one of an embedded material, a fluorescent material, a micro-facet, a micro-structure, an emissive material, and a phosphorescent material. 4. The manufacturing method of claim 1 , wherein the step of providing the radiation impacting feature comprises at least one of cutting, polishing, machining, depositing material, embossing, stamping, and micro-stamping the part. 5. The manufacturing method of claim 1 , wherein the prevention of accurate imaging is provided by at least one of distortion, redirection, reflection, refraction, transmission, diffraction, and absorption of electromagnetic radiation directed at the radiation impacting feature. 6. The manufacturing method of claim 1 , wherein the radiation impacting feature forms a pattern. 7. The manufacturing method of claim 1 , wherein the radiation impacting feature is not visible to an unaided eye. 8. A part marked for anti-counterfeiting, comprising: a radiation impacting feature located on or within the part, wherein the radiation impacting feature is configured to (i) prevent accurate imaging of at least a portion of the part and (ii) provide unique authentication of the part. 9. The part of claim 8 , wherein the radiation impacting feature is located at least one of (i) on an external surface of the part, (ii) on an internal surface of the part, (iii) within a subsurface of the part, and (iv) within a material that forms a portion of the part. 10. The part of claim 8 , wherein the radiation impacting feature comprises at least one of an embedded material, a fluorescent material, a micro-facet, a micro-structure, an emissive material, and a phosphorescent material. 11. The part of claim 8 , wherein the radiation impacting feature is configured to at least one of distort, redirect, reflect, refract, transmit, diffract, and absorb electromagnetic radiation directed at the radiation impacting feature. 12. The part of claim 8 , wherein the radiation impacting feature defines a pattern. 13. The part of claim 8 , wherein the radiation impacting feature is not visible to an unaided eye.
comprising special materials · CPC title
Marking · CPC title
characterized by the fabrication or manufacturing method · CPC title
Reliefs · CPC title
Special inks · CPC title
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