Method of manufacturing a part with an anti-counterfeit feature and a part marked for anti-counterfeiting

US10286719B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10286719-B2
Application numberUS-201515521807-A
CountryUS
Kind codeB2
Filing dateNov 4, 2015
Priority dateNov 5, 2014
Publication dateMay 14, 2019
Grant dateMay 14, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of manufacturing a part with an anti-counterfeit feature is provided. The method includes providing a part to be marked for anti-counterfeiting. The part is provided with a radiation impacting feature on or within the part. The radiation impacting feature is configured to at least one of (i) prevent accurate imaging of at least a portion of the part and (ii) provide unique authentication of the part.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a part with an anti-counterfeit feature, comprising: providing the part to be marked for anti-counterfeiting; and providing a radiation impacting feature on or within the part, wherein the radiation impacting feature is configured to (i) prevent accurate imaging of at least a portion of the part and (ii) provide unique authentication of the part. 2. The manufacturing method of claim 1 , wherein the radiation impacting feature is provided at least one of (i) on an external surface of the part, (ii) on an internal surface of the part, (iii) within a subsurface of the part, and (iv) within a material that forms a portion of the part. 3. The manufacturing method of claim 1 , wherein the radiation impacting feature comprises at least one of an embedded material, a fluorescent material, a micro-facet, a micro-structure, an emissive material, and a phosphorescent material. 4. The manufacturing method of claim 1 , wherein the step of providing the radiation impacting feature comprises at least one of cutting, polishing, machining, depositing material, embossing, stamping, and micro-stamping the part. 5. The manufacturing method of claim 1 , wherein the prevention of accurate imaging is provided by at least one of distortion, redirection, reflection, refraction, transmission, diffraction, and absorption of electromagnetic radiation directed at the radiation impacting feature. 6. The manufacturing method of claim 1 , wherein the radiation impacting feature forms a pattern. 7. The manufacturing method of claim 1 , wherein the radiation impacting feature is not visible to an unaided eye. 8. A part marked for anti-counterfeiting, comprising: a radiation impacting feature located on or within the part, wherein the radiation impacting feature is configured to (i) prevent accurate imaging of at least a portion of the part and (ii) provide unique authentication of the part. 9. The part of claim 8 , wherein the radiation impacting feature is located at least one of (i) on an external surface of the part, (ii) on an internal surface of the part, (iii) within a subsurface of the part, and (iv) within a material that forms a portion of the part. 10. The part of claim 8 , wherein the radiation impacting feature comprises at least one of an embedded material, a fluorescent material, a micro-facet, a micro-structure, an emissive material, and a phosphorescent material. 11. The part of claim 8 , wherein the radiation impacting feature is configured to at least one of distort, redirect, reflect, refract, transmit, diffract, and absorb electromagnetic radiation directed at the radiation impacting feature. 12. The part of claim 8 , wherein the radiation impacting feature defines a pattern. 13. The part of claim 8 , wherein the radiation impacting feature is not visible to an unaided eye.

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What does patent US10286719B2 cover?
A method of manufacturing a part with an anti-counterfeit feature is provided. The method includes providing a part to be marked for anti-counterfeiting. The part is provided with a radiation impacting feature on or within the part. The radiation impacting feature is configured to at least one of (i) prevent accurate imaging of at least a portion of the part and (ii) provide unique authenticati…
Who is the assignee on this patent?
Sikorsky Aircraft Corp
What technology area does this patent fall under?
Primary CPC classification B42D25/378. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 14 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).